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Class Information
Number: 438/785
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Insulative material is compound of refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof)
Description: Processes for forming an insulative compound using one of the refractory group elements (i.e., titanium (Ti), zirconium (Zr), hafnium (Hf), vanadium (V), niobium (Nb), tantalum (Ta), chromium (Cr), molybdenum (Mo), or tungsten (W)).










Patents under this class:
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Patent Number Title Of Patent Date Issued
8691609 Gas sensor materials and methods for preparation thereof Apr. 8, 2014
8691708 Method of manufacturing semiconductor device and substrate processing apparatus Apr. 8, 2014
8691710 Group IV metal complexes for metal-containing film deposition Apr. 8, 2014
8685787 Manufacturing method of semiconductor device Apr. 1, 2014
8685815 Hafnium tantalum titanium oxide films Apr. 1, 2014
8685866 Method of manufacturing semiconductor device and substrate processing apparatus Apr. 1, 2014
8679988 Plasma processing of metal oxide films for resistive memory device applications Mar. 25, 2014
8679952 Method of manufacturing silicon carbide epitaxial wafer Mar. 25, 2014
8679913 Method for Sr--Ti--O-based film formation Mar. 25, 2014
8669131 Methods and materials for forming gas sensor structures Mar. 11, 2014
8658501 Method and apparatus for flatband voltage tuning of high-k field effect transistors Feb. 25, 2014
8658546 Solution composition for forming oxide thin film and electronic device including the oxide thin film Feb. 25, 2014
8652957 High-K gate dielectric oxide Feb. 18, 2014
8633119 Methods for manufacturing high dielectric constant films Jan. 21, 2014
8633534 Transistor channel mobility using alternate gate dielectric materials Jan. 21, 2014
8623671 ALD processing techniques for forming non-volatile resistive switching memories Jan. 7, 2014
8623750 Heat treatment method for promoting crystallization of high dielectric constant film Jan. 7, 2014
8623770 Method for sidewall spacer line doubling using atomic layer deposition of a titanium oxide Jan. 7, 2014
8609553 Methods of forming rutile titanium dioxide and associated methods of forming semiconductor structures Dec. 17, 2013
8580671 Method of manufacturing semiconductor device and substrate processing apparatus Nov. 12, 2013
8563444 ALD of metal silicate films Oct. 22, 2013
8557713 Semiconductor devices and method of forming the same Oct. 15, 2013
8558295 Nonvolatile memory cell and method of manufacturing the same Oct. 15, 2013
8546276 Deposition of group IV metal-containing films at high temperature Oct. 1, 2013
8546275 Atomic layer deposition of hafnium and zirconium oxides for memory applications Oct. 1, 2013
8541276 Methods of forming an insulating metal oxide Sep. 24, 2013
8541283 High performance dielectric stack for DRAM capacitor Sep. 24, 2013
8535998 Method for fabricating a gate structure Sep. 17, 2013
8536656 Self-aligned contacts for high k/metal gate process flow Sep. 17, 2013
8530322 Method of forming stacked metal oxide layers Sep. 10, 2013
8525274 Semiconductor device and method of manufacturing the same Sep. 3, 2013
8524617 Methods for manufacturing dielectric films Sep. 3, 2013
8524613 Densely-packed films of lanthanide oxide nanoparticles via electrophoretic deposition Sep. 3, 2013
8524591 Maintaining integrity of a high-K gate stack by passivation using an oxygen plasma Sep. 3, 2013
8524618 Hafnium tantalum oxide dielectrics Sep. 3, 2013
8507389 Methods for forming dielectric layers Aug. 13, 2013
8501268 Methods of forming material over a substrate and methods of forming capacitors Aug. 6, 2013
8501523 Depositing titanium silicon nitride films for forming phase change memories Aug. 6, 2013
8492852 Interface structure for channel mobility improvement in high-k metal gate stack Jul. 23, 2013
8492258 Method of manufacturing semiconductor device and substrate processing apparatus Jul. 23, 2013
8481338 ALD processing techniques for forming non-volatile resistive-switching memories Jul. 9, 2013
8476108 Method and apparatus for manufacturing semiconductor device Jul. 2, 2013
8461059 Batch CVD method and apparatus for semiconductor process Jun. 11, 2013
8450774 High performance power switch May. 28, 2013
8450220 Substrate processing apparatus , method of manufacturing semiconductor device, and method of manufacturing substrate May. 28, 2013
8435886 Method and system for binding halide-based contaminants May. 7, 2013
8435428 Methods for forming a ruthenium-based film on a substrate May. 7, 2013
8431495 Stencil mask profile Apr. 30, 2013
8420552 Method of manufacturing a semiconductor device Apr. 16, 2013
8420519 Methods for fabricating integrated circuits with controlled P-channel threshold voltage Apr. 16, 2013

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