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Class Information
Number: 438/784
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Insulative material having impurity (e.g., for altering physical characteristics, etc.) > Introduction simultaneous with deposition
Description: Processes wherein the impurity is introduced into the insulative material concurrently with the deposition step.










Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8685815 Hafnium tantalum titanium oxide films Apr. 1, 2014
8657959 Apparatus for atomic layer deposition on a moving substrate Feb. 25, 2014
8658490 Passivating point defects in high-K gate dielectric layers during gate stack formation Feb. 25, 2014
8637413 Nonvolatile resistive memory element with a passivated switching layer Jan. 28, 2014
8617989 Liner property improvement Dec. 31, 2013
8603900 Reducing surface recombination and enhancing light trapping in solar cells Dec. 10, 2013
8564104 Passivation layer structure of semiconductor device and method for forming the same Oct. 22, 2013
8530361 Process for producing silicon and oxide films from organoaminosilane precursors Sep. 10, 2013
8524616 Method of nonstoichiometric CVD dielectric film surface passivation for film roughness control Sep. 3, 2013
8405167 Hafnium tantalum titanium oxide films Mar. 26, 2013
8389421 Film formation method and film formation apparatus Mar. 5, 2013
8354341 Method for forming an interconnect structure Jan. 15, 2013
8309424 Methods of forming electrically insulative materials, methods of forming low k dielectric regions, and methods of forming semiconductor constructions Nov. 13, 2012
8080483 Double gyroid structure nanoporous films and nanowire networks Dec. 20, 2011
8043981 Dual frequency low temperature oxidation of a semiconductor device Oct. 25, 2011
8021991 Technique to radiation-harden trench refill oxides Sep. 20, 2011
7994070 Low-temperature dielectric film formation by chemical vapor deposition Aug. 9, 2011
7981791 Thin films Jul. 19, 2011
7972898 Process for making doped zinc oxide Jul. 5, 2011
7959733 Film formation apparatus and method for semiconductor process Jun. 14, 2011
7955993 Oxygen plasma reduction to eliminate precursor overflow in BPTEOS film deposition Jun. 7, 2011
7947611 Method of improving initiation layer for low-k dielectric film by digital liquid flow meter May. 24, 2011
7927964 Methods of forming electrically insulative materials, methods of forming low k dielectric regions, and methods of forming semiconductor constructions Apr. 19, 2011
7923385 Methods for producing low stress porous and CDO low-K dielectric materials using precursors with organic functional groups Apr. 12, 2011
7902087 Organic electroluminescent display device and method of preparing the same Mar. 8, 2011
7902073 Glue layer for hydrofluorocarbon etch Mar. 8, 2011
7863201 Methods of forming field effect transistors having silicided source/drain contacts with low contact resistance Jan. 4, 2011
7858525 Fluorine-free precursors and methods for the deposition of conformal conductive films for nanointerconnect seed and fill Dec. 28, 2010
7799668 Formation of uniform silicate gate dielectrics Sep. 21, 2010
7790632 Methods of forming a phosphorus doped silicon dioxide-comprising layer Sep. 7, 2010
7737055 Systems and methods for manipulating liquid films on semiconductor substrates Jun. 15, 2010
7723771 Zirconium oxide based capacitor and process to manufacture the same May. 25, 2010
7709377 Thin film including multi components and method of forming the same May. 4, 2010
7678710 Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system Mar. 16, 2010
7658860 Metal pattern and process for producing the same Feb. 9, 2010
7645710 Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system Jan. 12, 2010
7622400 Method for improving mechanical properties of low dielectric constant materials Nov. 24, 2009
7585789 Method for forming porous insulation film Sep. 8, 2009
7579271 Method for forming low dielectric constant fluorine-doped layers Aug. 25, 2009
7504343 Semiconductor device and method for manufacturing the same Mar. 17, 2009
7470454 Non-thermal process for forming porous low dielectric constant films Dec. 30, 2008
RE40507 Method of forming pre-metal dielectric film on a semiconductor substrate including first layer of undoped oxide of high ozone:TEOS volume ratio and second layer of low ozone doped BPSG Sep. 16, 2008
7419919 Method of manufacturing semiconductor device Sep. 2, 2008
7410916 Method of improving initiation layer for low-k dielectric film by digital liquid flow meter Aug. 12, 2008
7396779 Electronic apparatus, silicon-on-insulator integrated circuits, and fabrication methods Jul. 8, 2008
7368384 Film formation apparatus and method of using the same May. 6, 2008
7297640 Method for reducing argon diffusion from high density plasma films Nov. 20, 2007
7273822 Methods and apparatus for forming thin films for semiconductor devices Sep. 25, 2007
7253084 Deposition from liquid sources Aug. 7, 2007
7253121 Method for forming IMD films Aug. 7, 2007

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