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Class Information
Number: 438/783
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate > Insulative material having impurity (e.g., for altering physical characteristics, etc.)
Description: Processes wherein the deposited insulative material contains one or more impurities (e.g., for altering a physical characteristic such as etchability, for serving as a diffusion source for adjacent semiconductive regions of the substrate, etc.).

Sub-classes under this class:

Class Number Class Name Patents
438/784 Introduction simultaneous with deposition 299

Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8691609 Gas sensor materials and methods for preparation thereof Apr. 8, 2014
8669131 Methods and materials for forming gas sensor structures Mar. 11, 2014
8669148 Method for manufacturing semiconductor device Mar. 11, 2014
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8642426 Semiconductor device and production method therefor Feb. 4, 2014
8586487 Low temperature plasma enhanced chemical vapor deposition of conformal silicon carbon nitride and silicon nitride films Nov. 19, 2013
8569185 Method of fabricating gate electrode using a treated hard mask Oct. 29, 2013
8569186 Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device Oct. 29, 2013
8563421 Method of fabricating semiconductor device Oct. 22, 2013
8563443 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Oct. 22, 2013
8546236 High performance dielectric stack for DRAM capacitor Oct. 1, 2013
8546274 Interlayer dielectric material in a semiconductor device comprising stressed layers with an intermediate buffer material Oct. 1, 2013
8541283 High performance dielectric stack for DRAM capacitor Sep. 24, 2013
8530289 Method for manufacturing semiconductor device Sep. 10, 2013
8513143 Semiconductor structure and method of manufacturing Aug. 20, 2013
8507894 Control and readout of electron or hole spin Aug. 13, 2013
8502286 Etch stop layers and methods of forming the same Aug. 6, 2013
8492852 Interface structure for channel mobility improvement in high-k metal gate stack Jul. 23, 2013
8481372 JFET device structures and methods for fabricating the same Jul. 9, 2013
8476141 High performance dielectric stack for DRAM capacitor Jul. 2, 2013
8440579 Re-establishing surface characteristics of sensitive low-k dielectrics in microstructure device by using an in situ surface modification May. 14, 2013
8440521 Method of manufacturing a semiconductor device May. 14, 2013
8415227 High performance dielectric stack for DRAM capacitor Apr. 9, 2013
8362571 High compressive stress carbon liners for MOS devices Jan. 29, 2013
8349744 Double deposition of a stress-inducing layer in an interlayer dielectric with intermediate stress relaxation in a semiconductor device Jan. 8, 2013
8349746 Microelectronic structure including a low k dielectric and a method of controlling carbon distribution in the structure Jan. 8, 2013
8350246 Structure of porous low-k layer and interconnect structure Jan. 8, 2013
8338314 Technique for reducing topography-related irregularities during the patterning of a dielectric material in a contact level of closely spaced transistors Dec. 25, 2012
8338211 Systems and methods for charging solar cell layers Dec. 25, 2012
8329596 Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device Dec. 11, 2012
8329531 Strain memorization in strained SOI substrates of semiconductor devices Dec. 11, 2012
8329599 Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogen Dec. 11, 2012
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8298876 Methods for normalizing strain in semiconductor devices and strain normalized semiconductor devices Oct. 30, 2012
8293659 Method for fabricating dielectric layer with improved insulating properties Oct. 23, 2012
8293660 Method of manufacturing semiconductor device Oct. 23, 2012
8288295 Manufacturing method of semiconductor device and semiconductor device produced therewith Oct. 16, 2012
8283265 Method to enhance charge trapping Oct. 9, 2012
8252653 Method of forming a non-volatile memory having a silicon nitride charge trap layer Aug. 28, 2012
8252689 Chemical-mechanical planarization method and method for fabricating metal gate in gate-last process Aug. 28, 2012
8237216 Apparatus having a lanthanum-metal oxide semiconductor device Aug. 7, 2012
8192805 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices Jun. 5, 2012
8168547 Manufacturing method of semiconductor device May. 1, 2012
8163654 Method for fabricating fine pattern in semiconductor device Apr. 24, 2012
8153537 Method for fabricating semiconductor devices using stress engineering Apr. 10, 2012
8143174 Post-deposition treatment to enhance properties of Si-O-C low K films Mar. 27, 2012
8138103 Plasma CVD method, method for forming silicon nitride film and method for manufacturing semiconductor device Mar. 20, 2012
8129264 Method of fabricating a semiconductor device Mar. 6, 2012
8119541 Modulation of stress in stress film through ion implantation and its application in stress memorization technique Feb. 21, 2012
8105962 Method and a semiconductor device comprising a protection layer for reducing stress relaxation in a dual stress liner approach Jan. 31, 2012

1 2 3 4 5 6 7 8 9 10

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