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Class Information
Number: 438/778
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate
Description: Processes wherein an insulative coating is formed upon the semiconductor substrate solely by the deposition of externally supplied material.










Sub-classes under this class:

Class Number Class Name Patents
438/779 Compound semiconductor substrate 170
438/780 Depositing organic material (e.g., polymer, etc.) 1,327
438/783 Insulative material having impurity (e.g., for altering physical characteristics, etc.) 486
438/785 Insulative material is compound of refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof) 909
438/791 Silicon nitride formation 578
438/787 Silicon oxide formation 1,006
438/786 Tertiary silicon containing compound formation (e.g., oxynitride formation, etc.) 458
438/782 With substrate handling during coating (e.g., immersion, spinning, etc.) 610


Patents under this class:
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Patent Number Title Of Patent Date Issued
6759349 Stabilization of Si photoanodes in aqueous electrolytes through surface alkylation Jul. 6, 2004
6756293 Combined gate cap or digit line and spacer deposition using HDP Jun. 29, 2004
6756319 Silica microstructure and fabrication method thereof Jun. 29, 2004
6756321 Method for forming a capping layer over a low-k dielectric with improved adhesion and reduced dielectric constant Jun. 29, 2004
6756324 Low temperature processes for making electronic device structures Jun. 29, 2004
6753268 Reduced particulate etching Jun. 22, 2004
6753269 Method for low k dielectric deposition Jun. 22, 2004
6750127 Method for fabricating a semiconductor device using amorphous carbon having improved etch resistance Jun. 15, 2004
6750157 Nonvolatile memory cell with a nitridated oxide layer Jun. 15, 2004
6746931 Capacitor for semiconductor memory device and method of manufacturing the same Jun. 8, 2004
6746969 Method of manufacturing semiconductor device Jun. 8, 2004
6746970 Method of forming a fluorocarbon polymer film on a substrate using a passivation layer Jun. 8, 2004
6743738 Dopant precursors and processes Jun. 1, 2004
6743739 Fabrication method for semiconductor integrated devices Jun. 1, 2004
6740977 Insulating layers in semiconductor devices having a multi-layer nanolaminate structure of SiNx thin film and BN thin film and methods for forming the same May. 25, 2004
6737294 Method of reducing surface leakage currents of a thin-film transistor substrate May. 18, 2004
6737333 Semiconductor device isolation structure and method of forming May. 18, 2004
6737338 Pattern forming method for a display device May. 18, 2004
6737342 Composite spacer scheme with low overlapped parasitic capacitance May. 18, 2004
6737363 Method of manufacturing semiconductor device May. 18, 2004
6737364 Method for fabricating crystalline-dielectric thin films and devices formed using same May. 18, 2004
6737365 Forming a porous dielectric layer May. 18, 2004
6733955 Methods for forming self-planarized dielectric layer for shallow trench isolation May. 11, 2004
6734532 Back side coating of semiconductor wafers May. 11, 2004
6734533 Electron-beam treated CDO films May. 11, 2004
6730538 Fabricating electronic devices using actinide oxide semiconductor materials May. 4, 2004
6730616 Versatile plasma processing system for producing oxidation resistant barriers May. 4, 2004
6730802 Silicon carbide precursor May. 4, 2004
6720620 Material and method for manufacturing semiconductor on insulator substrates and devices Apr. 13, 2004
6716324 Method of forming transparent, conductive film, method of compensating defective region of semiconductor layer, photovoltaic element, and method of producing photovoltaic element Apr. 6, 2004
6716647 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions runs Apr. 6, 2004
6713364 Method for forming an insulator having a low dielectric constant on a semiconductor substrate Mar. 30, 2004
6713399 Carbon-conductive ink resistor printed circuit board and its fabrication method Mar. 30, 2004
6709928 Semiconductor device having silicon-rich layer and method of manufacturing such a device Mar. 23, 2004
6709968 Microelectronic device with package with conductive elements and associated method of manufacture Mar. 23, 2004
6709990 Method for fabrication of a high capacitance interpoly dielectric Mar. 23, 2004
6706644 Thermal nitrogen distribution method to improve uniformity of highly doped ultra-thin gate capacitors Mar. 16, 2004
6706645 Method of manufacturing a semiconductor device Mar. 16, 2004
6706647 Method of and apparatus for manufacturing semiconductors Mar. 16, 2004
6703287 Production method for shallow trench insulation Mar. 9, 2004
6699784 Method for depositing a low k dielectric film (K>3.5) for hard mask application Mar. 2, 2004
6699797 Method of fabrication of low dielectric constant porous metal silicate films Mar. 2, 2004
6693046 Method of manufacturing semiconductor device having multilevel wiring Feb. 17, 2004
6693049 Method for filling fine hole Feb. 17, 2004
6686272 Anti-reflective coatings for use at 248 nm and 193 nm Feb. 3, 2004
6680251 Methods of chemical vapor depositing ruthenium by varying chemical vapor deposition parameters Jan. 20, 2004
6677251 Method for forming a hydrophilic surface on low-k dielectric insulating layers for improved adhesion Jan. 13, 2004
6673725 Semiconductor device and method of manufacturing the same Jan. 6, 2004
6669858 Integrated low k dielectrics and etch stops Dec. 30, 2003
6667246 Wet-etching method and method for manufacturing semiconductor device Dec. 23, 2003

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