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Class Information
Number: 438/778
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate
Description: Processes wherein an insulative coating is formed upon the semiconductor substrate solely by the deposition of externally supplied material.










Sub-classes under this class:

Class Number Class Name Patents
438/779 Compound semiconductor substrate 170
438/780 Depositing organic material (e.g., polymer, etc.) 1,327
438/783 Insulative material having impurity (e.g., for altering physical characteristics, etc.) 486
438/785 Insulative material is compound of refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof) 909
438/791 Silicon nitride formation 578
438/787 Silicon oxide formation 1,006
438/786 Tertiary silicon containing compound formation (e.g., oxynitride formation, etc.) 458
438/782 With substrate handling during coating (e.g., immersion, spinning, etc.) 610


Patents under this class:

Patent Number Title Of Patent Date Issued
8524613 Densely-packed films of lanthanide oxide nanoparticles via electrophoretic deposition Sep. 3, 2013
8524612 Plasma-activated deposition of conformal films Sep. 3, 2013
8513809 Semiconductor device Aug. 20, 2013
8513143 Semiconductor structure and method of manufacturing Aug. 20, 2013
8501633 Forming substrate structure by filling recesses with deposition material Aug. 6, 2013
8501607 FinFET alignment structures using a double trench flow Aug. 6, 2013
8497190 Process for treating a semiconductor-on-insulator structure Jul. 30, 2013
8492852 Interface structure for channel mobility improvement in high-k metal gate stack Jul. 23, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8481430 Method of manufacturing semiconductor device Jul. 9, 2013
8481372 JFET device structures and methods for fabricating the same Jul. 9, 2013
8476743 C-rich carbon boron nitride dielectric films for use in electronic devices Jul. 2, 2013
8476108 Method and apparatus for manufacturing semiconductor device Jul. 2, 2013
8475666 Method for making toughening agent materials Jul. 2, 2013
8470693 Method for manufacturing quantum dot Jun. 25, 2013
8470659 Method for reducing interfacial layer thickness for high-k and metal gate stack Jun. 25, 2013
8470187 Method of depositing film with tailored comformality Jun. 25, 2013
RE44303 Passivation layer for a circuit device and method of manufacture Jun. 18, 2013
8461060 Method and apparatus providing air-gap insulation between adjacent conductors using nanoparticles Jun. 11, 2013
8461059 Batch CVD method and apparatus for semiconductor process Jun. 11, 2013
8461058 Organic layer deposition apparatus, and method of manufacturing organic light-emitting display apparatus using the same Jun. 11, 2013
8460987 Method for obtaining a layer of AlN having substantially vertical sides Jun. 11, 2013
8455978 Semiconductor circuit structure and method of making the same Jun. 4, 2013
8455366 Use of an organic planarizing mask for cutting a plurality of gate lines Jun. 4, 2013
8450219 Method of fabricating Al2O3 thin film layer May. 28, 2013
8431472 Semiconductor device fabrication using gate substitution Apr. 30, 2013
8421086 Silicon carbide semiconductor device and method of manufacturing the same Apr. 16, 2013
8399366 Method of depositing highly conformal amorphous carbon films over raised features Mar. 19, 2013
8399346 Scratch-resistant coatings for protecting front-side circuitry during backside processing Mar. 19, 2013
8394725 Systems and methods for forming metal oxide layers Mar. 12, 2013
8394689 Semiconductor memory device with stacked gate including charge storage layer and control gate and method of manufacturing the same Mar. 12, 2013
8383525 Plasma-enhanced deposition process for forming a metal oxide thin film and related structures Feb. 26, 2013
8378410 Semiconductor device and method of manufacturing the same Feb. 19, 2013
8377818 Aftertreatment method for amorphous carbon film Feb. 19, 2013
8372760 Method and system for using ion implantation for treating a low-k dielectric film Feb. 12, 2013
8367924 Buried insulator isolation for solar cell contacts Feb. 5, 2013
8367559 Method of manufacturing a semiconductor device Feb. 5, 2013
8367558 Method for tuning the work function of a metal gate of the PMOS device Feb. 5, 2013
8367556 Use of an organic planarizing mask for cutting a plurality of gate lines Feb. 5, 2013
8362571 High compressive stress carbon liners for MOS devices Jan. 29, 2013
8361910 Pretreatment processes within a batch ALD reactor Jan. 29, 2013
8357989 Semiconductor device and method for manufacturing the same Jan. 22, 2013
8357608 Multi component dielectric layer Jan. 22, 2013
8349746 Microelectronic structure including a low k dielectric and a method of controlling carbon distribution in the structure Jan. 8, 2013
8349722 Silicon oxycarbide, growth method of silicon oxycarbide layer, semiconductor device and manufacture method for semiconductor device Jan. 8, 2013
8349629 Semiconductor light-emitting element and method of manufacturing same Jan. 8, 2013
8343880 Process for preparing a dielectric interlayer film containing silicon beta zeolite Jan. 1, 2013
8338313 Method for nondestructive lift-off of GaN from sapphire substrate utilizing a solid-state laser Dec. 25, 2012
8338283 Method and apparatus for applying thin liquid coatings Dec. 25, 2012
8336487 Film forming apparatus Dec. 25, 2012











 
 
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