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Class Information
Number: 438/778
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate
Description: Processes wherein an insulative coating is formed upon the semiconductor substrate solely by the deposition of externally supplied material.

Sub-classes under this class:

Class Number Class Name Patents
438/779 Compound semiconductor substrate 170
438/780 Depositing organic material (e.g., polymer, etc.) 1,327
438/783 Insulative material having impurity (e.g., for altering physical characteristics, etc.) 486
438/785 Insulative material is compound of refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof) 909
438/791 Silicon nitride formation 578
438/787 Silicon oxide formation 1,006
438/786 Tertiary silicon containing compound formation (e.g., oxynitride formation, etc.) 458
438/782 With substrate handling during coating (e.g., immersion, spinning, etc.) 610

Patents under this class:
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Patent Number Title Of Patent Date Issued
6927180 Reducing line to line capacitance using oriented dielectric films Aug. 9, 2005
6924186 Method of forming a memory device and semiconductor device Aug. 2, 2005
6924231 Single wafer processing method and system for processing semiconductor Aug. 2, 2005
6921621 Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device Jul. 26, 2005
6921684 Method of sorting carbon nanotubes including protecting metallic nanotubes and removing the semiconducting nanotubes Jul. 26, 2005
6921727 Method for modifying dielectric characteristics of dielectric layers Jul. 26, 2005
6919270 Method of manufacturing silicon carbide film Jul. 19, 2005
6919283 Fabrication of pure and modified Ta2O5 thin film with enhanced properties for microwave communication, dynamic random access memory and integrated electronic applications Jul. 19, 2005
6916668 Methods for providing a magnetic shield for an integrated circuit having magnetoresistive memory cells Jul. 12, 2005
6916708 Method of forming a floating gate for a stacked gate flash memory device Jul. 12, 2005
6913999 Semiconductor device with components embedded in backside diamond layer Jul. 5, 2005
6911362 Methods for forming electronic devices including capacitor structures Jun. 28, 2005
6911403 Methods of reducing plasma-induced damage for advanced plasma CVD dielectrics Jun. 28, 2005
6908866 Epitaxial and polycrystalline growth of Si1-x-yGexCy and Si1-yCy alloy layers on Si by UHV-CVD Jun. 21, 2005
6905909 Ultra low dielectric constant thin film Jun. 14, 2005
6905940 Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill Jun. 14, 2005
6905956 Multi-layer dielectric and method of forming same Jun. 14, 2005
6903001 Techniques to create low K ILD for BEOL Jun. 7, 2005
6903029 Method of reducing thick film stress of spin-on dielectric and the resulting sandwich dielectric structure Jun. 7, 2005
6899857 Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique May. 31, 2005
6900134 Method for forming openings in a substrate using bottom antireflective coatings May. 31, 2005
6900144 Film-forming surface reforming method and semiconductor device manufacturing method May. 31, 2005
6896861 Silicon oxide layer reduced in dangling bonds through treatment with hypofluorous acid, process for growing silicon oxide layer and method for deactivating dangling bonds therein May. 24, 2005
6897163 Method for depositing a low dielectric constant film May. 24, 2005
6893805 Substrate processing apparatus and substrate processing method May. 17, 2005
6893891 Process for fabricating a semiconductor diffraction grating using a sacrificial layer May. 17, 2005
6893904 Stereolithographic methods of fabricating semiconductor devices having protective layers thereon through which contact pads are exposed May. 17, 2005
6893945 Method for manufacturing gallium nitride group compound semiconductor May. 17, 2005
6893977 Method of manufacturing a semiconductor device May. 17, 2005
6893982 Method for forming a thin film, methods for forming a gate electrode and transistor using the same, and a gate electrode manufactured using the same May. 17, 2005
6893983 Method for depositing a very high phosphorus doped silicon oxide film May. 17, 2005
6890776 Silicon oxide film evaluation method and semiconductor device fabrication method May. 10, 2005
6887774 Conductor layer nitridation May. 3, 2005
6887799 Indium oxide conductive film May. 3, 2005
6887800 Method for making a semiconductor device with a high-k gate dielectric and metal layers that meet at a P/N junction May. 3, 2005
6884475 Chemical vapor deposition method for depositing a high k dielectric film Apr. 26, 2005
6881677 Method for making a micro-fluid ejection device Apr. 19, 2005
6881681 Film deposition on a semiconductor wafer Apr. 19, 2005
6878415 Methods for chemical formation of thin film layers using short-time thermal processes Apr. 12, 2005
6875466 Substrate processing method and substrate processing apparatus Apr. 5, 2005
6875640 Stereolithographic methods for forming a protective layer on a semiconductor device substrate and substrates including protective layers so formed Apr. 5, 2005
6875704 Method for forming pattern using printing process Apr. 5, 2005
6875708 Method of producing diamond film and diamond film produced thereby Apr. 5, 2005
6876063 Method of improving adhesion of cap oxide to nanoporous silica for integrated circuit fabrication Apr. 5, 2005
6872418 Film forming method Mar. 29, 2005
6872633 Deposition and sputter etch approach to extend the gap fill capability of HDP CVD process to .ltoreq.0.10 microns Mar. 29, 2005
6872645 Methods of positioning and/or orienting nanostructures Mar. 29, 2005
6868888 Thin film forming apparatus, film supplier, film cassette, transport mechanism and transport method Mar. 22, 2005
6869893 Laminate low K film Mar. 22, 2005

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