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Class Information
Number: 438/778
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Insulative material deposited upon semiconductive substrate
Description: Processes wherein an insulative coating is formed upon the semiconductor substrate solely by the deposition of externally supplied material.
Sub-classes under this class:
| Class Number |
Class Name |
Patents |
| 438/779 |
Compound semiconductor substrate |
127 |
| 438/780 |
Depositing organic material (e.g., polymer, etc.) |
1,010 |
| 438/783 |
Insulative material having impurity (e.g., for altering physical characteristics, etc.) |
376 |
| 438/785 |
Insulative material is compound of refractory group metal (i.e., titanium (ti), zirconium (zr), hafnium (hf), vanadium (v), niobium (nb), tantalum (ta), chromium (cr), molybdenum (mo), tungsten (w), or alloy thereof) |
678 |
| 438/791 |
Silicon nitride formation |
442 |
| 438/787 |
Silicon oxide formation |
813 |
| 438/786 |
Tertiary silicon containing compound formation (e.g., oxynitride formation, etc.) |
355 |
| 438/782 |
With substrate handling during coating (e.g., immersion, spinning, etc.) |
519 |
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618902 |
Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer |
Nov. 17, 2009 |
| 7618900 |
Semiconductor device and method of fabricating semiconductor device |
Nov. 17, 2009 |
| 7615491 |
Defectivity and process control of electroless deposition in microelectronics applications |
Nov. 10, 2009 |
| 7615490 |
Method for fabricating landing plug of semiconductor device |
Nov. 10, 2009 |
| 7615386 |
Thick oxide film for wafer backside prior to metalization loop |
Nov. 10, 2009 |
| 7611988 |
Defectivity and process control of electroless deposition in microelectronics applications |
Nov. 3, 2009 |
| 7611987 |
Defectivity and process control of electroless deposition in microelectronics applications |
Nov. 3, 2009 |
| 7611615 |
Process for manufacturing a metal electrode |
Nov. 3, 2009 |
| 7605095 |
Heat processing method and apparatus for semiconductor process |
Oct. 20, 2009 |
| 7601649 |
Zirconium-doped tantalum oxide films |
Oct. 13, 2009 |
| 7601608 |
Memory array buried digit line |
Oct. 13, 2009 |
| 7601567 |
Method of preparing organic thin film transistor, organic thin film transistor, and organic light-emitting display device including the organic thin film transistor |
Oct. 13, 2009 |
| 7598183 |
Bi-layer capping of low-K dielectric films |
Oct. 6, 2009 |
| 7595270 |
Passivated stoichiometric metal nitride films |
Sep. 29, 2009 |
| 7592270 |
Modulation of stress in stress film through ion implantation and its application in stress memorization technique |
Sep. 22, 2009 |
| 7592268 |
Method for fabricating semiconductor device |
Sep. 22, 2009 |
| 7592267 |
Method for manufacturing semiconductor silicon substrate and apparatus for manufacturing the same |
Sep. 22, 2009 |
| 7589028 |
Hydroxyl bond removal and film densification method for oxide films using microwave post treatment |
Sep. 15, 2009 |
| 7588988 |
Method of forming apparatus having oxide films formed using atomic layer deposition |
Sep. 15, 2009 |
| 7582969 |
Hermetic interconnect structure and method of manufacture |
Sep. 1, 2009 |
| 7582561 |
Method of selectively depositing materials on a substrate using a supercritical fluid |
Sep. 1, 2009 |
| 7582540 |
Method for manufacturing SOI wafer |
Sep. 1, 2009 |
| 7579051 |
Method for manufacturing an electron emitter |
Aug. 25, 2009 |
| 7576016 |
Process for manufacturing semiconductor device |
Aug. 18, 2009 |
| 7576015 |
Methods for manufacturing alignment layer, active device array substrate and color filter substrate |
Aug. 18, 2009 |
| 7576014 |
Semiconductor device and manufacturing method thereof |
Aug. 18, 2009 |
| 7572709 |
Method, apparatus, and system for low temperature deposition and irradiation annealing of thin film capacitor |
Aug. 11, 2009 |
| 7570411 |
Optical limiter having trimetallic nitride endohedral metallofullerence films |
Aug. 4, 2009 |
| 7563728 |
Methods of modifying interlayer adhesion |
Jul. 21, 2009 |
| 7563727 |
Low-k dielectric layer formed from aluminosilicate precursors |
Jul. 21, 2009 |
| 7563628 |
Fabrication of optical waveguide devices |
Jul. 21, 2009 |
| 7560395 |
Atomic layer deposited hafnium tantalum oxide dielectrics |
Jul. 14, 2009 |
| 7560307 |
Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same |
Jul. 14, 2009 |
| 7557048 |
Methods of forming semiconductor constructions |
Jul. 7, 2009 |
| 7557047 |
Method of forming a layer of material using an atomic layer deposition process |
Jul. 7, 2009 |
| 7556970 |
Method of repairing damaged film having low dielectric constant, semiconductor device fabricating system and storage medium |
Jul. 7, 2009 |
| 7553749 |
Method of hiding transparent electrodes on a transparent substrate |
Jun. 30, 2009 |
| 7553720 |
Non-volatile memory device and fabrication method thereof |
Jun. 30, 2009 |
| 7550356 |
Method of fabricating strained-silicon transistors |
Jun. 23, 2009 |
| RE40748 |
Process for producing semiconductor device |
Jun. 16, 2009 |
| 7544625 |
Silicon oxide thin-films with embedded nanocrystalline silicon |
Jun. 9, 2009 |
| 7541297 |
Method and system for improving dielectric film quality for void free gap fill |
Jun. 2, 2009 |
| 7541296 |
Method for forming insulating film, method for forming multilayer structure and method for manufacturing semiconductor device |
Jun. 2, 2009 |
| 7541226 |
Manufacturing process of thin film transistor |
Jun. 2, 2009 |
| 7528077 |
Semiconductor device and method for manufacturing the same |
May. 5, 2009 |
| 7524775 |
Method for producing a dielectric layer for an electronic component |
Apr. 28, 2009 |
| 7524735 |
Flowable film dielectric gap fill process |
Apr. 28, 2009 |
| 7521379 |
Deposition and densification process for titanium nitride barrier layers |
Apr. 21, 2009 |
| 7521376 |
Method of forming a semiconductor structure using a non-oxygen chalcogen passivation treatment |
Apr. 21, 2009 |
| 7514709 |
Organo-silsesquioxane polymers for forming low-k dielectrics |
Apr. 7, 2009 |
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