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Class Information
Number: 438/777
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Nitridation > Using electromagnetic or wave energy > Microwave gas energizing
Description: Processes wherein the irradiation is of microwave frequency.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8609519 Combinatorial approach for screening of ALD film stacks Dec. 17, 2013
8580670 Migration and plasma enhanced chemical vapor deposition Nov. 12, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8513137 Plasma processing apparatus and plasma processing method Aug. 20, 2013
8273641 Plasma deposition of amorphous semiconductors at microwave frequencies Sep. 25, 2012
8252666 Semiconductor device and method of forming through hole vias in die extension region around periphery of die Aug. 28, 2012
8216900 Nonvolatile memory device, method of manufacturing the nonvolatile memory device, and method of manufacturing flat panel display device provided with the nonvolatile memory device Jul. 10, 2012
8097959 Semiconductor device including first and second carriers Jan. 17, 2012
8048782 Plasma deposition of amorphous semiconductors at microwave frequencies Nov. 1, 2011
8008216 Nitrogen profile in high-K dielectrics using ultrathin disposable capping layers Aug. 30, 2011
7989281 Method for manufacturing dual gate in semiconductor device Aug. 2, 2011
7968470 Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus Jun. 28, 2011
7928018 Plasma processing method and method for manufacturing an electronic device Apr. 19, 2011
7910494 Thermal processing furnace, gas delivery system therefor, and methods for delivering a process gas thereto Mar. 22, 2011
7906362 Assembling two substrates by molecular adhesion Mar. 15, 2011
7855153 Method for manufacturing semiconductor device Dec. 21, 2010
7795158 Oxidation method and apparatus for semiconductor process Sep. 14, 2010
7718484 Method of forming a dielectic film that contains silicon, oxygen and nitrogen and method of fabricating a semiconductor device that uses such a dielectric film May. 18, 2010
7691725 Method for manufacturing semiconductor device Apr. 6, 2010
7682973 Method of forming a carbon nanotube structure and method of manufacturing field emission device using the method of forming a carbon nanotube structure Mar. 23, 2010
7678672 Carbon nanotube fabrication from crystallography oriented catalyst Mar. 16, 2010
7671398 Nano memory, light, energy, antenna and strand-based systems and methods Mar. 2, 2010
7645647 Thin film transistor and method of fabricating the same Jan. 12, 2010
7560396 Material for electronic device and process for producing the same Jul. 14, 2009
7534731 Method for growing a thin oxynitride film on a substrate May. 19, 2009
7517751 Substrate treating method Apr. 14, 2009
7517814 Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently Apr. 14, 2009
7498271 Nitrogen based plasma process for metal gate MOS device Mar. 3, 2009
7485516 Method of ion implantation of nitrogen into semiconductor substrate prior to oxidation for offset spacer formation Feb. 3, 2009
7465677 Semiconductor device and method for manufacturing the same Dec. 16, 2008
7462565 Method of manufacturing semiconductor device Dec. 9, 2008
7439121 Dielectric film and method of forming it, semiconductor device, non-volatile semiconductor memory device, and production method for semiconductor device Oct. 21, 2008
7427572 Method and apparatus for forming silicon nitride film Sep. 23, 2008
7345001 Gate dielectric having a flat nitrogen profile and method of manufacture therefor Mar. 18, 2008
7226874 Substrate processing method Jun. 5, 2007
7205216 Modification of electrical properties for semiconductor wafers Apr. 17, 2007
7183143 Method for forming nitrided tunnel oxide layer Feb. 27, 2007
7176094 Ultra-thin gate oxide through post decoupled plasma nitridation anneal Feb. 13, 2007
7135416 Method of manufacturing semiconductor device Nov. 14, 2006
7129187 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films Oct. 31, 2006
7115530 Top surface roughness reduction of high-k dielectric materials using plasma based processes Oct. 3, 2006
7098147 Semiconductor memory device and method for manufacturing semiconductor device Aug. 29, 2006
7091136 Method of forming semiconductor compound film for fabrication of electronic device and film produced by same Aug. 15, 2006
7067414 Low k interlevel dielectric layer fabrication methods Jun. 27, 2006
7067415 Low k interlevel dielectric layer fabrication methods Jun. 27, 2006
7056381 Fabrication method of semiconductor device Jun. 6, 2006
7056836 Manufacturing method for a semiconductor device Jun. 6, 2006
7033958 Semiconductor device and process for producing the same Apr. 25, 2006
7005389 Methods for forming a thin film on an integrated circuit device by sequentially providing energies to activate the reactants Feb. 28, 2006
6967130 Method of forming dual gate insulator layers for CMOS applications Nov. 22, 2005

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