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Class Information
Number: 438/775
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Nitridation
Description: Processes wherein the external agent supplies nitrogen which reacts with the silicon substrate region to form a compound therewith.










Sub-classes under this class:

Class Number Class Name Patents
438/776 Using electromagnetic or wave energy 141


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8646407 Film formation apparatus for semiconductor process and method for using the same Feb. 11, 2014
8642374 Image sensor with reduced noise by blocking nitridation using photoresist Feb. 4, 2014
8557717 Method for manufacturing a semiconductor device Oct. 15, 2013
8546273 Methods and apparatus for forming nitrogen-containing layers Oct. 1, 2013
8546920 Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) Oct. 1, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8507922 Silicon carbide substrate, semiconductor device, and SOI wafer Aug. 13, 2013
8497190 Process for treating a semiconductor-on-insulator structure Jul. 30, 2013
8481433 Methods and apparatus for forming nitrogen-containing layers Jul. 9, 2013
8455293 Method for processing solar cell substrates Jun. 4, 2013
8440566 Method for forming an aluminum nitride thin film May. 14, 2013
8440526 Method of fabricating memory May. 14, 2013
8420407 Growth method of Fe.sub.3N material Apr. 16, 2013
8410003 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Apr. 2, 2013
8357608 Multi component dielectric layer Jan. 22, 2013
8343618 Silicon wafer and method of manufacturing the same Jan. 1, 2013
8329536 Method for manufacturing semiconductor device with silicon nitride charge trapping film having varying hydrogen concentration Dec. 11, 2012
8330157 Manufacturing method of semiconductor device and semiconductor device Dec. 11, 2012
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8304352 Method of manufacturing a semiconductor device Nov. 6, 2012
8288293 Integrated circuit fabrication using sidewall nitridation processes Oct. 16, 2012
8288826 Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) Oct. 16, 2012
8263501 Silicon dioxide film fabricating process Sep. 11, 2012
8258065 Passive elements, articles, packages, semiconductor composites, and methods of manufacturing same Sep. 4, 2012
8247331 Method for forming insulating film and method for manufacturing semiconductor device Aug. 21, 2012
8216889 Thin film transistor and method of fabricating the same Jul. 10, 2012
8183165 Plasma processing method May. 22, 2012
8183164 Method for preferential growth of semiconducting vertically aligned single walled carbon nanotubes May. 22, 2012
8178446 Strained metal nitride films and method of forming May. 15, 2012
8173531 Structure and method to improve threshold voltage of MOSFETS including a high K dielectric May. 8, 2012
8158535 Method for forming insulating film and method for manufacturing semiconductor device Apr. 17, 2012
8148275 Method for forming dielectric films Apr. 3, 2012
8115196 High performance SiGe:C HBT with phosphorous atomic layer doping Feb. 14, 2012
8110482 Miscut semipolar optoelectronic device Feb. 7, 2012
8110458 Fabrication of germanium nanowire transistors Feb. 7, 2012
8105959 Method for manufacturing a semiconductor device having a nitrogen-containing gate insulating film Jan. 31, 2012
8097517 Method for manufacturing semiconductor device with improved short channel effect of a PMOS and stabilized current of a NMOS Jan. 17, 2012
8088694 Method for forming a multiple layer passivation film and a device incorporating the same Jan. 3, 2012
8067809 Semiconductor storage device including a gate insulating film with a favorable nitrogen concentration profile and method for manufacturing the same Nov. 29, 2011
8053373 Semiconductor-on-insulator(SOI) structures including gradient nitrided buried oxide (BOX) Nov. 8, 2011
8053374 Method of manufacturing a metal wiring structure Nov. 8, 2011
8043916 Method of fabricating semiconductor device having multiple gate insulating layer Oct. 25, 2011
8030198 Semiconductor device and manufacturing method thereof Oct. 4, 2011
8022383 Two-terminal resistance switching element with silicon, and semiconductor device Sep. 20, 2011
8017470 Method of forming a structure over a semiconductor substrate Sep. 13, 2011
8008214 Method of forming an insulation structure and method of manufacturing a semiconductor device using the same Aug. 30, 2011
8008216 Nitrogen profile in high-K dielectrics using ultrathin disposable capping layers Aug. 30, 2011
8008154 Methods of forming impurity containing insulating films and flash memory devices including the same Aug. 30, 2011
7989291 Anisotropic stress generation by stress-generating liners having a sublithographic width Aug. 2, 2011
7981808 Method of forming a gate dielectric by in-situ plasma Jul. 19, 2011

1 2 3 4 5 6 7 8 9 10










 
 
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