| Patent Number |
Title Of Patent |
Date Issued |
| 7605095 |
Heat processing method and apparatus for semiconductor process |
Oct. 20, 2009 |
| 7541246 |
Method of manufacturing semiconductor device |
Jun. 2, 2009 |
| 7531464 |
Semiconductive device fabricated using a substantially disassociated chlorohydrocarbon |
May. 12, 2009 |
| 7524742 |
Structure of metal interconnect and fabrication method thereof |
Apr. 28, 2009 |
| 7358171 |
Method to chemically remove metal impurities from polycide gate sidewalls |
Apr. 15, 2008 |
| 7326655 |
Method of forming an oxide layer |
Feb. 5, 2008 |
| 7304002 |
Method of oxidizing member to be treated |
Dec. 4, 2007 |
| 7256143 |
Semiconductor device having self-aligned contact plug and method for fabricating the same |
Aug. 14, 2007 |
| 7235498 |
Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 |
Jun. 26, 2007 |
| 7196021 |
HDP-CVD deposition process for filling high aspect ratio gaps |
Mar. 27, 2007 |
| 7183143 |
Method for forming nitrided tunnel oxide layer |
Feb. 27, 2007 |
| 7169714 |
Method and structure for graded gate oxides on vertical and non-planar surfaces |
Jan. 30, 2007 |
| 7148103 |
Multilevel poly-Si tiling for semiconductor circuit manufacture |
Dec. 12, 2006 |
| 7132362 |
Semiconductor device with contacts having uniform contact resistance and method for manufacturing the same |
Nov. 7, 2006 |
| 7129187 |
Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films |
Oct. 31, 2006 |
| 7119033 |
Ion-assisted oxidation methods and the resulting structures |
Oct. 10, 2006 |
| 7087536 |
Silicon oxide gapfill deposition using liquid precursors |
Aug. 8, 2006 |
| 6992370 |
Memory cell structure having nitride layer with reduced charge loss and method for fabricating same |
Jan. 31, 2006 |
| 6949478 |
Oxide film forming method |
Sep. 27, 2005 |
| 6933248 |
Method for transistor gate dielectric layer with uniform nitrogen concentration |
Aug. 23, 2005 |
| 6927121 |
Method for manufacturing ferroelectric random access memory capacitor |
Aug. 9, 2005 |
| 6914016 |
HDP-CVD deposition process for filling high aspect ratio gaps |
Jul. 5, 2005 |
| 6887797 |
Apparatus and method for forming an oxynitride insulating layer on a semiconductor wafer |
May. 3, 2005 |
| 6864125 |
Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 |
Mar. 8, 2005 |
| RE38674 |
Process for forming a thin oxide layer |
Dec. 21, 2004 |
| 6808993 |
Ultra-thin gate dielectrics |
Oct. 26, 2004 |
| 6770538 |
Ion-assisted oxidation methods and the resulting structures |
Aug. 3, 2004 |
| 6740601 |
HDP-CVD deposition process for filling high aspect ratio gaps |
May. 25, 2004 |
| 6723662 |
Methods of forming gate oxide films in integrated circuit devices using wet or dry oxidization processes with reduced chloride |
Apr. 20, 2004 |
| 6645884 |
Method of forming a silicon nitride layer on a substrate |
Nov. 11, 2003 |
| 6638877 |
Ultra-thin SiO2using N2O as the oxidant |
Oct. 28, 2003 |
| 6624038 |
Capacitor electrode having uneven surface formed by using hemispherical grained silicon |
Sep. 23, 2003 |
| 6610614 |
Method for uniform nitridization of ultra-thin silicon dioxide layers in transistor gates |
Aug. 26, 2003 |
| 6607946 |
Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 |
Aug. 19, 2003 |
| 6596650 |
Method for fabricating semiconductor integrated circuit device |
Jul. 22, 2003 |
| 6586346 |
Method of forming an oxide film |
Jul. 1, 2003 |
| 6569780 |
Method for fabricating semiconductor integrated circuit device |
May. 27, 2003 |
| 6541393 |
Method for fabricating semiconductor device |
Apr. 1, 2003 |
| 6514879 |
Method and apparatus for dry/catalytic-wet steam oxidation of silicon |
Feb. 4, 2003 |
| 6448651 |
Semiconductor device having a multi-level metallization and its fabricating method |
Sep. 10, 2002 |
| 6444593 |
Surface treatment of low-K SiOF to prevent metal interaction |
Sep. 3, 2002 |
| 6436196 |
Apparatus and method for forming an oxynitride insulating layer on a semiconductor wafer |
Aug. 20, 2002 |
| 6407008 |
Method of forming an oxide layer |
Jun. 18, 2002 |
| 6387827 |
Method for growing thin silicon oxides on a silicon substrate using chlorine precursors |
May. 14, 2002 |
| 6387823 |
Method and apparatus for controlling deposition process using residual gas analysis |
May. 14, 2002 |
| 6380103 |
Rapid thermal etch and rapid thermal oxidation |
Apr. 30, 2002 |
| 6372667 |
Method of manufacturing a capacitor for semiconductor memory devices |
Apr. 16, 2002 |
| 6368949 |
Post-spacer etch surface treatment for improved silicide formation |
Apr. 9, 2002 |
| 6362114 |
Semiconductor processing methods of forming an oxynitride film on a silicon substrate |
Mar. 26, 2002 |
| 6355581 |
Gas-phase additives for an enhancement of lateral etch component during high density plasma film deposition to improve film gap-fill capability |
Mar. 12, 2002 |
