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Class Information
Number: 438/774
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > In atmosphere containing halogen
Description: Processes wherein the oxidation is carried out in an atmosphere containing a halogen.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8664012 Combined silicon oxide etch and contamination removal process Mar. 4, 2014
8551818 Method of manufacturing electronic device and display Oct. 8, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8455293 Method for processing solar cell substrates Jun. 4, 2013
8422266 Quantum dot optical devices with enhanced gain and sensitivity and methods of making same Apr. 16, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8367561 Method in depositing metal oxide materials Feb. 5, 2013
8318608 Method of fabricating a nonvolatile charge trap memory device Nov. 27, 2012
8284587 Quantum dot optical devices with enhanced gain and sensitivity and methods of making same Oct. 9, 2012
8283261 Radical oxidation process for fabricating a nonvolatile charge trap memory device Oct. 9, 2012
8252701 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Aug. 28, 2012
8102693 Quantum dot optical devices with enhanced gain and sensitivity and methods of making same Jan. 24, 2012
7972968 High density plasma gapfill deposition-etch-deposition process etchant Jul. 5, 2011
7943459 Semiconductor device and method of manufacturing the semiconductor device May. 17, 2011
7884031 Semiconductor device Feb. 8, 2011
7838831 Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method Nov. 23, 2010
7838333 Electronic device package and method of manufacturing the same Nov. 23, 2010
7825036 Method of synthesizing silicon wires Nov. 2, 2010
7816279 Semiconductor device and method for manufacturing the same Oct. 19, 2010
7799639 Methods of fabricating non-volatile memory devices including a chlorine cured tunnel oxide layer Sep. 21, 2010
7773404 Quantum dot optical devices with enhanced gain and sensitivity and methods of making same Aug. 10, 2010
7718510 Laser processing method and semiconductor chip May. 18, 2010
7704893 Semiconductor device, method for manufacturing semiconductor device and gas for plasma CVD Apr. 27, 2010
7678678 Method to chemically remove metal impurities from polycide gate sidewalls Mar. 16, 2010
7662727 Method for manufacturing semiconductor device background Feb. 16, 2010
7632707 Electronic device package and method of manufacturing the same Dec. 15, 2009
7605095 Heat processing method and apparatus for semiconductor process Oct. 20, 2009
7541246 Method of manufacturing semiconductor device Jun. 2, 2009
7531464 Semiconductive device fabricated using a substantially disassociated chlorohydrocarbon May. 12, 2009
7524742 Structure of metal interconnect and fabrication method thereof Apr. 28, 2009
7358171 Method to chemically remove metal impurities from polycide gate sidewalls Apr. 15, 2008
7326655 Method of forming an oxide layer Feb. 5, 2008
7304002 Method of oxidizing member to be treated Dec. 4, 2007
7256143 Semiconductor device having self-aligned contact plug and method for fabricating the same Aug. 14, 2007
7235498 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 Jun. 26, 2007
7196021 HDP-CVD deposition process for filling high aspect ratio gaps Mar. 27, 2007
7183143 Method for forming nitrided tunnel oxide layer Feb. 27, 2007
7169714 Method and structure for graded gate oxides on vertical and non-planar surfaces Jan. 30, 2007
7148103 Multilevel poly-Si tiling for semiconductor circuit manufacture Dec. 12, 2006
7132362 Semiconductor device with contacts having uniform contact resistance and method for manufacturing the same Nov. 7, 2006
7129187 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films Oct. 31, 2006
7119033 Ion-assisted oxidation methods and the resulting structures Oct. 10, 2006
7087536 Silicon oxide gapfill deposition using liquid precursors Aug. 8, 2006
6992370 Memory cell structure having nitride layer with reduced charge loss and method for fabricating same Jan. 31, 2006
6949478 Oxide film forming method Sep. 27, 2005
6933248 Method for transistor gate dielectric layer with uniform nitrogen concentration Aug. 23, 2005
6927121 Method for manufacturing ferroelectric random access memory capacitor Aug. 9, 2005
6914016 HDP-CVD deposition process for filling high aspect ratio gaps Jul. 5, 2005
6887797 Apparatus and method for forming an oxynitride insulating layer on a semiconductor wafer May. 3, 2005
6864125 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 Mar. 8, 2005

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