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Class Information
Number: 438/773
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > In atmosphere containing water vapor (i.e., wet oxidation)
Description: Processes wherein the oxidation is carried out in an atmosphere containing water in vaporous form.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8662886 System for improved pressure control in horizontal diffusion furnace scavenger system for controlling oxide growth Mar. 4, 2014
8623728 Method for forming high germanium concentration SiGe stressor Jan. 7, 2014
8592325 Insulating layers on different semiconductor materials Nov. 26, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8470187 Method of depositing film with tailored comformality Jun. 25, 2013
8455293 Method for processing solar cell substrates Jun. 4, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8367557 Method of forming an insulation film having low impurity concentrations Feb. 5, 2013
8298963 Semiconductor device and manufacturing method of the same Oct. 30, 2012
8263501 Silicon dioxide film fabricating process Sep. 11, 2012
8252701 Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus Aug. 28, 2012
8153502 Methods for filling trenches in a semiconductor material Apr. 10, 2012
8097531 Methods of manufacturing charge trap type memory devices Jan. 17, 2012
8043911 Methods of forming semiconductor constructions Oct. 25, 2011
8039403 Thin film transistor, method of manufacturing same, display device, method of modifying an oxide film, method of forming an oxide film, semiconductor device, method of manufacturing semiconduc Oct. 18, 2011
8026184 Semiconductor device and method of manufacturing the same Sep. 27, 2011
8021989 Method for high topography patterning Sep. 20, 2011
7989359 Semiconductor module manufacturing method, semiconductor module, and mobile device Aug. 2, 2011
7985695 Forming silicon oxide film from RF plasma of oxidizing gas Jul. 26, 2011
7968425 Isolation regions Jun. 28, 2011
7951728 Method of improving oxide growth rate of selective oxidation processes May. 31, 2011
7919372 Method for forming oxide on ONO structure Apr. 5, 2011
7888233 Flowable film dielectric gap fill process Feb. 15, 2011
7879400 Substrate processing apparatus, method of manufacturing a semiconductor device, and method of forming a thin film on metal surface Feb. 1, 2011
7851383 Method and system for forming a controllable gate oxide Dec. 14, 2010
7825035 Semiconductor manufacturing method Nov. 2, 2010
7811874 Method for manufacturing silicon carbide semiconductor device, and silicon carbide semiconductor device Oct. 12, 2010
7799690 Method for fabricating semiconductor integrated circuit device Sep. 21, 2010
7795159 Charge trap layer for a charge trap semiconductor memory device and method of manufacturing the same Sep. 14, 2010
7795158 Oxidation method and apparatus for semiconductor process Sep. 14, 2010
7674724 Oxidizing method and oxidizing unit for object to be processed Mar. 9, 2010
7670954 Method of manufacturing semiconductor device Mar. 2, 2010
7659206 Removal of silicon oxycarbide from substrates Feb. 9, 2010
7659214 Method for growing an oxynitride film on a substrate Feb. 9, 2010
7632718 Semiconductor power component with a vertical current path through a semiconductor power chip Dec. 15, 2009
7622338 Method for manufacturing semiconductor device Nov. 24, 2009
7598184 Plasma composition for selective high-k etch Oct. 6, 2009
7553459 Apparatus and reactor for generating and feeding high purity moisture Jun. 30, 2009
7550353 Method of forming semiconductor device Jun. 23, 2009
7541297 Method and system for improving dielectric film quality for void free gap fill Jun. 2, 2009
7534731 Method for growing a thin oxynitride film on a substrate May. 19, 2009
7442655 Selective oxidation methods and transistor fabrication methods Oct. 28, 2008
7435690 Method of preparing a silicon dioxide layer by high temperature oxidation on a substrate having, at least on the surface, germanium or a silicon-germanium alloy Oct. 14, 2008
7429514 Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device Sep. 30, 2008
7410912 Methods of manufacturing metal oxide nanowires Aug. 12, 2008
7371697 Ion-assisted oxidation methods and the resulting structures May. 13, 2008
7338869 Semiconductor device and its manufacturing method Mar. 4, 2008
RE40113 Method for fabricating gate oxide Feb. 26, 2008
7326655 Method of forming an oxide layer Feb. 5, 2008
7312139 Method of fabricating nitrogen-containing gate dielectric layer and semiconductor device Dec. 25, 2007

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