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Class Information
Number: 438/773
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > In atmosphere containing water vapor (i.e., wet oxidation)
Description: Processes wherein the oxidation is carried out in an atmosphere containing water in vaporous form.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7598184 |
Plasma composition for selective high-k etch |
Oct. 6, 2009 |
| 7553459 |
Apparatus and reactor for generating and feeding high purity moisture |
Jun. 30, 2009 |
| 7550353 |
Method of forming semiconductor device |
Jun. 23, 2009 |
| 7541297 |
Method and system for improving dielectric film quality for void free gap fill |
Jun. 2, 2009 |
| 7534731 |
Method for growing a thin oxynitride film on a substrate |
May. 19, 2009 |
| 7442655 |
Selective oxidation methods and transistor fabrication methods |
Oct. 28, 2008 |
| 7435690 |
Method of preparing a silicon dioxide layer by high temperature oxidation on a substrate having, at least on the surface, germanium or a silicon-germanium alloy |
Oct. 14, 2008 |
| 7429514 |
Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device |
Sep. 30, 2008 |
| 7410912 |
Methods of manufacturing metal oxide nanowires |
Aug. 12, 2008 |
| 7371697 |
Ion-assisted oxidation methods and the resulting structures |
May. 13, 2008 |
| 7338869 |
Semiconductor device and its manufacturing method |
Mar. 4, 2008 |
| RE40113 |
Method for fabricating gate oxide |
Feb. 26, 2008 |
| 7326655 |
Method of forming an oxide layer |
Feb. 5, 2008 |
| 7312139 |
Method of fabricating nitrogen-containing gate dielectric layer and semiconductor device |
Dec. 25, 2007 |
| 7304003 |
Oxidizing method and oxidizing unit for object to be processed |
Dec. 4, 2007 |
| 7300833 |
Process for producing semiconductor integrated circuit device |
Nov. 27, 2007 |
| 7273819 |
Method and apparatus for processing semiconductor substrates |
Sep. 25, 2007 |
| 7268205 |
Medical devices and applications of polyhydroxyalkanoate polymers |
Sep. 11, 2007 |
| 7256143 |
Semiconductor device having self-aligned contact plug and method for fabricating the same |
Aug. 14, 2007 |
| 7250376 |
Method for fabricating semiconductor integrated circuit device |
Jul. 31, 2007 |
| 7235497 |
Selective oxidation methods and transistor fabrication methods |
Jun. 26, 2007 |
| 7235498 |
Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 |
Jun. 26, 2007 |
| 7211523 |
Method for forming field oxide |
May. 1, 2007 |
| 7199022 |
Manufacturing method of semiconductor device |
Apr. 3, 2007 |
| 7186632 |
Method of fabricating a semiconductor device having a decreased concentration of phosphorus impurities in polysilicon |
Mar. 6, 2007 |
| 7183143 |
Method for forming nitrided tunnel oxide layer |
Feb. 27, 2007 |
| 7179883 |
Medical devices and applications of polyhydroxyalkanoate polymers |
Feb. 20, 2007 |
| 7153785 |
Method of producing annealed wafer and annealed wafer |
Dec. 26, 2006 |
| 7151060 |
Device and method for thermally treating semiconductor wafers |
Dec. 19, 2006 |
| 7148103 |
Multilevel poly-Si tiling for semiconductor circuit manufacture |
Dec. 12, 2006 |
| 7144826 |
Method and apparatus for the production of process gas that includes water vapor and hydrogen formed by burning oxygen in a hydrogen-rich environment |
Dec. 5, 2006 |
| 7144766 |
Method of manufacturing semiconductor integrated circuit device having polymetal gate electrode |
Dec. 5, 2006 |
| 7125811 |
Oxidation method for semiconductor process |
Oct. 24, 2006 |
| 7122469 |
Fabrication process of a semiconductor integrated circuit device |
Oct. 17, 2006 |
| 7119033 |
Ion-assisted oxidation methods and the resulting structures |
Oct. 10, 2006 |
| 7109131 |
System and method for hydrogen-rich selective oxidation |
Sep. 19, 2006 |
| 7094637 |
Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates |
Aug. 22, 2006 |
| 7078354 |
Method of manufacturing semiconductor device having oxide films with different thickness |
Jul. 18, 2006 |
| 7071120 |
Method for producing water for use in manufacturing semiconductors |
Jul. 4, 2006 |
| 7071538 |
One stack with steam oxide for charge retention |
Jul. 4, 2006 |
| 7053007 |
Method for fabricating semiconductor integrated circuit device |
May. 30, 2006 |
| 7049187 |
Manufacturing method of polymetal gate electrode |
May. 23, 2006 |
| 7015111 |
Use of selective oxidation to form asymmetrical oxide features during the manufacture of a semiconductor device |
Mar. 21, 2006 |
| 7008880 |
Method for fabricating semiconductor integrated circuit device |
Mar. 7, 2006 |
| 7001851 |
Steam oxidation method |
Feb. 21, 2006 |
| 6998326 |
Method for manufacturing shallow trench isolation in semiconductor device |
Feb. 14, 2006 |
| 6987069 |
Fabrication process of a semiconductor integrated circuit device |
Jan. 17, 2006 |
| 6962881 |
Method for fabricating semiconductor integrated circuit device |
Nov. 8, 2005 |
| 6962880 |
Method for fabricating semiconductor integrated circuit device |
Nov. 8, 2005 |
| 6936550 |
Semiconductor integrated circuit device and method for manufacturing the same |
Aug. 30, 2005 |
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