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Class Information
Number: 438/772
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > Using electromagnetic or wave energy > Microwave gas energizing
Description: Processes wherein the irradiation is of microwave frequency.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622396 |
Method of producing a semiconductor device |
Nov. 24, 2009 |
| 7521354 |
Low k interlevel dielectric layer fabrication methods |
Apr. 21, 2009 |
| 7517814 |
Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently |
Apr. 14, 2009 |
| 7465677 |
Semiconductor device and method for manufacturing the same |
Dec. 16, 2008 |
| 7465674 |
Manufacturing method of semiconductor device |
Dec. 16, 2008 |
| 7238629 |
Deposition method, method of manufacturing semiconductor device, and semiconductor device |
Jul. 3, 2007 |
| 7232772 |
Substrate processing method |
Jun. 19, 2007 |
| 7199022 |
Manufacturing method of semiconductor device |
Apr. 3, 2007 |
| 7183143 |
Method for forming nitrided tunnel oxide layer |
Feb. 27, 2007 |
| 7129187 |
Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films |
Oct. 31, 2006 |
| 7125754 |
Semiconductor device and its manufacturing method |
Oct. 24, 2006 |
| 7122488 |
High density plasma process for the formation of silicon dioxide on silicon carbide substrates |
Oct. 17, 2006 |
| 7115530 |
Top surface roughness reduction of high-k dielectric materials using plasma based processes |
Oct. 3, 2006 |
| 7098147 |
Semiconductor memory device and method for manufacturing semiconductor device |
Aug. 29, 2006 |
| 7087271 |
Method for preparing low dielectric films |
Aug. 8, 2006 |
| 7037861 |
Method and apparatus for oxidizing nitrides |
May. 2, 2006 |
| 6987056 |
Method of forming gates in semiconductor devices |
Jan. 17, 2006 |
| 6967130 |
Method of forming dual gate insulator layers for CMOS applications |
Nov. 22, 2005 |
| 6927121 |
Method for manufacturing ferroelectric random access memory capacitor |
Aug. 9, 2005 |
| 6777346 |
Planarization using plasma oxidized amorphous silicon |
Aug. 17, 2004 |
| 6713383 |
Semiconductor device manufacturing method |
Mar. 30, 2004 |
| 6689675 |
Method for making a semiconductor device having a high-k gate dielectric |
Feb. 10, 2004 |
| 6551947 |
Method of forming a high quality gate oxide at low temperatures |
Apr. 22, 2003 |
| 6534421 |
Method to fabricate thin insulating film |
Mar. 18, 2003 |
| 6500735 |
Semiconductor device and method of manufacturing the same |
Dec. 31, 2002 |
| 6498082 |
Method of forming a polysilicon layer |
Dec. 24, 2002 |
| 6417115 |
Treatment of dielectric materials |
Jul. 9, 2002 |
| 6376276 |
Method of preparing diamond semiconductor |
Apr. 23, 2002 |
| 6331494 |
Deposition of low dielectric constant thin film without use of an oxidizer |
Dec. 18, 2001 |
| 6287889 |
Diamond thin film or the like, method for forming and modifying the thin film, and method for processing the thin film |
Sep. 11, 2001 |
| 6284674 |
Plasma processing device and a method of plasma process |
Sep. 4, 2001 |
| 6274513 |
Method of oxidizing a nitride film on a conductive substrate |
Aug. 14, 2001 |
| 6265327 |
Method for forming an insulating film on semiconductor substrate surface and apparatus for carrying out the method |
Jul. 24, 2001 |
| 6197647 |
Method of forming ultra-thin oxides with low temperature oxidation |
Mar. 6, 2001 |
| 6051483 |
Formation of ultra-shallow semiconductor junction using microwave annealing |
Apr. 18, 2000 |
| 5877057 |
Method of forming ultra-thin oxides with low temperature oxidation |
Mar. 2, 1999 |
| 5700699 |
Method for fabricating a polycrystal silicon thin film transistor |
Dec. 23, 1997 |
| 5443863 |
Low-temperature oxidation at surfaces using ozone decomposition products formed by microwave discharge |
Aug. 22, 1995 |
| 5238849 |
Method of fabricating semiconductor device |
Aug. 24, 1993 |
| 4490183 |
Method of reactivating implanted dopants and oxidation semiconductor wafers by microwaves |
Dec. 25, 1984 |
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