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Class Information
Number: 438/772
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > Using electromagnetic or wave energy > Microwave gas energizing
Description: Processes wherein the irradiation is of microwave frequency.

Patents under this class:
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Patent Number Title Of Patent Date Issued
8609519 Combinatorial approach for screening of ALD film stacks Dec. 17, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8513137 Plasma processing apparatus and plasma processing method Aug. 20, 2013
8503189 Pb-free solder-connected structure and electronic device Aug. 6, 2013
8486792 Film forming method of silicon oxide film, silicon oxide film, semiconductor device, and manufacturing method of semiconductor device Jul. 16, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8273641 Plasma deposition of amorphous semiconductors at microwave frequencies Sep. 25, 2012
8236706 Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures Aug. 7, 2012
8153502 Methods for filling trenches in a semiconductor material Apr. 10, 2012
8148275 Method for forming dielectric films Apr. 3, 2012
8119538 Oxide formation in a plasma process Feb. 21, 2012
8105958 Semiconductor device manufacturing method and plasma oxidation treatment method Jan. 31, 2012
8048782 Plasma deposition of amorphous semiconductors at microwave frequencies Nov. 1, 2011
8043979 Plasma oxidizing method, storage medium, and plasma processing apparatus Oct. 25, 2011
8021969 Semiconductor device and method for fabricating the same Sep. 20, 2011
7989364 Plasma oxidation processing method Aug. 2, 2011
7972973 Method for forming silicon oxide film, plasma processing apparatus and storage medium Jul. 5, 2011
7928018 Plasma processing method and method for manufacturing an electronic device Apr. 19, 2011
7910495 Plasma oxidizing method, plasma processing apparatus, and storage medium Mar. 22, 2011
7906440 Semiconductor device manufacturing method and plasma oxidation method Mar. 15, 2011
7888217 Method for fabricating a gate dielectric of a field effect transistor Feb. 15, 2011
7855153 Method for manufacturing semiconductor device Dec. 21, 2010
7718547 Semiconductor device and method for manufacturing the same May. 18, 2010
7691725 Method for manufacturing semiconductor device Apr. 6, 2010
7622396 Method of producing a semiconductor device Nov. 24, 2009
7521354 Low k interlevel dielectric layer fabrication methods Apr. 21, 2009
7517814 Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently Apr. 14, 2009
7465674 Manufacturing method of semiconductor device Dec. 16, 2008
7465677 Semiconductor device and method for manufacturing the same Dec. 16, 2008
7238629 Deposition method, method of manufacturing semiconductor device, and semiconductor device Jul. 3, 2007
7232772 Substrate processing method Jun. 19, 2007
7199022 Manufacturing method of semiconductor device Apr. 3, 2007
7183143 Method for forming nitrided tunnel oxide layer Feb. 27, 2007
7129187 Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films Oct. 31, 2006
7125754 Semiconductor device and its manufacturing method Oct. 24, 2006
7122488 High density plasma process for the formation of silicon dioxide on silicon carbide substrates Oct. 17, 2006
7115530 Top surface roughness reduction of high-k dielectric materials using plasma based processes Oct. 3, 2006
7098147 Semiconductor memory device and method for manufacturing semiconductor device Aug. 29, 2006
7087271 Method for preparing low dielectric films Aug. 8, 2006
7037861 Method and apparatus for oxidizing nitrides May. 2, 2006
6987056 Method of forming gates in semiconductor devices Jan. 17, 2006
6967130 Method of forming dual gate insulator layers for CMOS applications Nov. 22, 2005
6927121 Method for manufacturing ferroelectric random access memory capacitor Aug. 9, 2005
6777346 Planarization using plasma oxidized amorphous silicon Aug. 17, 2004
6713383 Semiconductor device manufacturing method Mar. 30, 2004
6689675 Method for making a semiconductor device having a high-k gate dielectric Feb. 10, 2004
6551947 Method of forming a high quality gate oxide at low temperatures Apr. 22, 2003
6534421 Method to fabricate thin insulating film Mar. 18, 2003
6500735 Semiconductor device and method of manufacturing the same Dec. 31, 2002

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