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Class Information
Number: 438/771
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > Using electromagnetic or wave energy
Description: Processes wherein the oxidation is conducted using irradiation of electromagnetic or wave energy.










Sub-classes under this class:

Class Number Class Name Patents
438/772 Microwave gas energizing 65


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8703410 Substrate having a mark formed on a surface thereof by a CO.sub.2 laser beam Apr. 22, 2014
8671878 Profile and CD uniformity control by plasma oxidation treatment Mar. 18, 2014
8642487 Film deposition method and film deposition apparatus Feb. 4, 2014
8609519 Combinatorial approach for screening of ALD film stacks Dec. 17, 2013
8557715 Marking CO.sub.2 laser-transparent materials by using absorption-material-assisted laser processing Oct. 15, 2013
8547085 Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber Oct. 1, 2013
8546201 Method of crystallizing silicon layer and method of forming a thin film transistor using the same Oct. 1, 2013
8503189 Pb-free solder-connected structure and electronic device Aug. 6, 2013
8497218 Silicon carbide semiconductor device and method for producing the same Jul. 30, 2013
8492291 Formation of gate dielectrics with uniform nitrogen distribution Jul. 23, 2013
8492292 Methods of forming oxide layers on substrates Jul. 23, 2013
8465990 Manufacturing method of magneto-resistance effect element Jun. 18, 2013
8435906 Methods for forming conformal oxide layers on semiconductor devices May. 7, 2013
8420541 Method for increasing adhesion between polysilazane and silicon nitride Apr. 16, 2013
8404601 Method of manufacturing a semiconductor device Mar. 26, 2013
8404602 Plasma oxidation method and plasma oxidation apparatus Mar. 26, 2013
8389420 Method and apparatus for forming silicon oxide film Mar. 5, 2013
8389412 Finishing method for a silicon on insulator substrate Mar. 5, 2013
8372761 Plasma oxidation processing method, plasma processing apparatus and storage medium Feb. 12, 2013
8318552 Method for forming gate structures Nov. 27, 2012
8318586 Nitrogen-plasma surface treatment in a direct bonding method Nov. 27, 2012
8298949 Profile and CD uniformity control by plasma oxidation treatment Oct. 30, 2012
8268731 Semiconductor device producing method, substrate producing method and substrate processing apparatus Sep. 18, 2012
8236706 Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures Aug. 7, 2012
8236707 Method of manufacturing a semiconductor device Aug. 7, 2012
8202805 Substrate processing method Jun. 19, 2012
8193101 Substrate processing apparatus and semiconductor device manufacturing method for forming film Jun. 5, 2012
8168548 UV-assisted dielectric formation for devices with strained germanium-containing layers May. 1, 2012
8129284 Heat treatment method and heat treatment apparatus for heating substrate by light irradiation Mar. 6, 2012
8043981 Dual frequency low temperature oxidation of a semiconductor device Oct. 25, 2011
8043979 Plasma oxidizing method, storage medium, and plasma processing apparatus Oct. 25, 2011
8038834 Method and system for controlling radical distribution Oct. 18, 2011
8026187 Method of forming silicon oxide film and method of production of semiconductor memory device using this method Sep. 27, 2011
7985695 Forming silicon oxide film from RF plasma of oxidizing gas Jul. 26, 2011
7977254 Method of forming a gate insulator in group III-V nitride semiconductor devices Jul. 12, 2011
7928018 Plasma processing method and method for manufacturing an electronic device Apr. 19, 2011
7927981 Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film Apr. 19, 2011
7927982 Apparatus for mass-producing silicon-based thin film and method for mass-producing silicon-based thin film Apr. 19, 2011
7910495 Plasma oxidizing method, plasma processing apparatus, and storage medium Mar. 22, 2011
7863077 Image sensor and method for manufacturing the same Jan. 4, 2011
7858525 Fluorine-free precursors and methods for the deposition of conformal conductive films for nanointerconnect seed and fill Dec. 28, 2010
7834332 Thin film pattern forming device and method Nov. 16, 2010
7825018 Plasma oxidation method and method for manufacturing semiconductor device Nov. 2, 2010
7820534 Method of manufacturing silicon carbide semiconductor device Oct. 26, 2010
7811945 Selective plasma processing method Oct. 12, 2010
7786021 High-density plasma multilayer gate oxide Aug. 31, 2010
7767538 Method for manufacturing semiconductor device Aug. 3, 2010
7755064 Resist pattern processing equipment and resist pattern processing method Jul. 13, 2010
7723205 Semiconductor device, manufacturing method thereof, liquid crystal display device, RFID tag, light emitting device, and electronic device May. 25, 2010
7718231 Thin buried oxides by low-dose oxygen implantation into modified silicon May. 18, 2010

1 2 3 4










 
 
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