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Class Information
Number: 438/771
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation > Using electromagnetic or wave energy
Description: Processes wherein the oxidation is conducted using irradiation of electromagnetic or wave energy.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622396 |
Method of producing a semiconductor device |
Nov. 24, 2009 |
| 7622338 |
Method for manufacturing semiconductor device |
Nov. 24, 2009 |
| 7605084 |
Method of gap-filling using amplitude modulation radio frequency power |
Oct. 20, 2009 |
| 7566482 |
SOI by oxidation of porous silicon |
Jul. 28, 2009 |
| 7550384 |
Semiconductor device and method for forming pattern in the same |
Jun. 23, 2009 |
| 7541295 |
Method of manufacturing semiconductor device |
Jun. 2, 2009 |
| 7491656 |
Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film |
Feb. 17, 2009 |
| 7446023 |
High-density plasma hydrogenation |
Nov. 4, 2008 |
| 7429369 |
Silicon nanoparticle nanotubes and method for making the same |
Sep. 30, 2008 |
| 7413998 |
Biased pulse DC reactive sputtering of oxide films |
Aug. 19, 2008 |
| 7381657 |
Biased pulse DC reactive sputtering of oxide films |
Jun. 3, 2008 |
| 7371697 |
Ion-assisted oxidation methods and the resulting structures |
May. 13, 2008 |
| 7326652 |
Atomic layer deposition using photo-enhanced bond reconfiguration |
Feb. 5, 2008 |
| 7291566 |
Barrier layer for a processing element and a method of forming the same |
Nov. 6, 2007 |
| 7288490 |
Increased alignment in carbon nanotube growth |
Oct. 30, 2007 |
| 7238629 |
Deposition method, method of manufacturing semiconductor device, and semiconductor device |
Jul. 3, 2007 |
| 7232724 |
Radical oxidation for bitline oxide of SONOS |
Jun. 19, 2007 |
| 7232772 |
Substrate processing method |
Jun. 19, 2007 |
| 7229931 |
Oxygen plasma treatment for enhanced HDP-CVD gapfill |
Jun. 12, 2007 |
| 7183143 |
Method for forming nitrided tunnel oxide layer |
Feb. 27, 2007 |
| 7129175 |
Method of manufacturing semiconductor device |
Oct. 31, 2006 |
| 7129187 |
Low-temperature plasma-enhanced chemical vapor deposition of silicon-nitrogen-containing films |
Oct. 31, 2006 |
| 7122487 |
Method for forming an oxide with improved oxygen bonding |
Oct. 17, 2006 |
| 7119033 |
Ion-assisted oxidation methods and the resulting structures |
Oct. 10, 2006 |
| 7112541 |
In-situ oxide capping after CVD low k deposition |
Sep. 26, 2006 |
| 7102141 |
Flash lamp annealing apparatus to generate electromagnetic radiation having selective wavelengths |
Sep. 5, 2006 |
| 7098147 |
Semiconductor memory device and method for manufacturing semiconductor device |
Aug. 29, 2006 |
| 7091129 |
Atomic layer deposition using photo-enhanced bond reconfiguration |
Aug. 15, 2006 |
| 7087536 |
Silicon oxide gapfill deposition using liquid precursors |
Aug. 8, 2006 |
| 7045447 |
Semiconductor device producing method and semiconductor device producing apparatus including forming an oxide layer and changing the impedance or potential to form an oxynitride |
May. 16, 2006 |
| 7037861 |
Method and apparatus for oxidizing nitrides |
May. 2, 2006 |
| 7030038 |
Low temperature method for forming a thin, uniform oxide |
Apr. 18, 2006 |
| 7008878 |
Plasma treatment and etching process for ultra-thin dielectric films |
Mar. 7, 2006 |
| 6998355 |
Flash memory device and a fabrication process thereof, method of forming a dielectric film |
Feb. 14, 2006 |
| 6995097 |
Method for thermal nitridation and oxidation of semiconductor surface |
Feb. 7, 2006 |
| 6987277 |
Systems and method for picking and placing of nanoscale objects utilizing differences in chemical and physical binding forces |
Jan. 17, 2006 |
| 6930062 |
Methods of forming an oxide layer in a transistor having a recessed gate |
Aug. 16, 2005 |
| 6927164 |
Method of fabricating semiconductor device and semiconductor device |
Aug. 9, 2005 |
| 6916739 |
Structural element and process for its production including bonding through an amorphous hard layer |
Jul. 12, 2005 |
| 6914012 |
Article comprising an oxide layer on a GaAs-based semiconductor structure and method of forming same |
Jul. 5, 2005 |
| 6914016 |
HDP-CVD deposition process for filling high aspect ratio gaps |
Jul. 5, 2005 |
| 6887725 |
Micro electron gun of quantum size effect type and flat display using such electron guns as well as methods of their manufacture |
May. 3, 2005 |
| 6869892 |
Method of oxidizing work pieces and oxidation system |
Mar. 22, 2005 |
| 6861104 |
Method of enhancing adhesion strength of BSG film to silicon nitride film |
Mar. 1, 2005 |
| 6846752 |
Methods and devices for the suppression of copper hillock formation |
Jan. 25, 2005 |
| 6838380 |
Fabrication of high resistivity structures using focused ion beams |
Jan. 4, 2005 |
| 6800512 |
Method of forming insulating film and method of fabricating semiconductor device |
Oct. 5, 2004 |
| 6777347 |
Method to produce porous oxide including forming a precoating oxide and a thermal oxide |
Aug. 17, 2004 |
| 6770538 |
Ion-assisted oxidation methods and the resulting structures |
Aug. 3, 2004 |
| 6767847 |
Method of forming a silicon nitride-silicon dioxide gate stack |
Jul. 27, 2004 |
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