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Class Information
Number: 438/770
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation
Description: Processes wherein the external agent supplies oxygen which reacts with the silicon substrate region to form a compound therewith.










Sub-classes under this class:

Class Number Class Name Patents
438/774 In atmosphere containing halogen 132
438/773 In atmosphere containing water vapor (i.e., wet oxidation) 224
438/771 Using electromagnetic or wave energy 192


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16

Patent Number Title Of Patent Date Issued
6864125 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 Mar. 8, 2005
6864191 Hydrogen barrier layer and method for fabricating semiconductor device having the same Mar. 8, 2005
6855994 Multiple-thickness gate oxide formed by oxygen implantation Feb. 15, 2005
6855642 Method for fabricating semiconductor integrated circuit device Feb. 15, 2005
6855606 Semiconductor nano-rod devices Feb. 15, 2005
6852645 High temperature interface layer growth for high-k gate dielectric Feb. 8, 2005
6849512 Thin gate dielectric for a CMOS transistor and method of fabrication thereof Feb. 1, 2005
6849545 System and method to form a composite film stack utilizing sequential deposition techniques Feb. 1, 2005
6846743 Method for vapor deposition of a metal compound film Jan. 25, 2005
6841432 Semiconductor device and process for fabricating the same Jan. 11, 2005
6838397 Silicon nitride film, and semiconductor device and method of manufacturing the same Jan. 4, 2005
6838394 Flash memory device and a fabrication process thereof, method of forming a dielectric film Jan. 4, 2005
6835625 Method for fabricating semiconductor device Dec. 28, 2004
6835672 Selective oxidation for semiconductor device fabrication Dec. 28, 2004
6833329 Methods of forming oxide regions over semiconductor substrates Dec. 21, 2004
6831020 Method for fabricating semiconductor device Dec. 14, 2004
6825114 Selective stress-inducing implant and resulting pattern distortion in amorphous carbon patterning Nov. 30, 2004
6825133 Use of fluorine implantation to form a charge balanced nitrided gate dielectric layer Nov. 30, 2004
6818525 Semiconductor device and method of providing regions of low substrate capacitance Nov. 16, 2004
6818567 Method for selectively oxidizing a silicon wafer Nov. 16, 2004
6815315 Method for electrochemical oxidation Nov. 9, 2004
6812158 Modular growth of multiple gate oxides Nov. 2, 2004
6808984 Method for forming a contact opening Oct. 26, 2004
6806199 Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace Oct. 19, 2004
6800538 Semiconductor device fabrication method and semiconductor fabrication control method Oct. 5, 2004
6794314 Method of forming ultrathin oxide layer Sep. 21, 2004
6794313 Oxidation process to improve polysilicon sidewall roughness Sep. 21, 2004
6784115 Method of simultaneously implementing differential gate oxide thickness using fluorine bearing impurities Aug. 31, 2004
6780697 Method of manufacturing lateral double-diffused metal oxide semiconductor device Aug. 24, 2004
6780765 Integrated circuit trenched features and method of producing same Aug. 24, 2004
6780789 Laser thermal oxidation to form ultra-thin gate oxide Aug. 24, 2004
6777274 Low temperature polycrystalline silicon type thin film transistor and a method of the thin film transistor fabrication Aug. 17, 2004
6777348 Method of forming oxynitride film Aug. 17, 2004
6777346 Planarization using plasma oxidized amorphous silicon Aug. 17, 2004
6770538 Ion-assisted oxidation methods and the resulting structures Aug. 3, 2004
6767843 Method of N2O growth of an oxide layer on a silicon carbide layer Jul. 27, 2004
6767848 Silicon semiconductor substrate and method for production thereof Jul. 27, 2004
6767760 Process of manufacturing a thin-film transistor Jul. 27, 2004
6764963 Manufacturing method of semiconductor devices Jul. 20, 2004
6764961 Method of forming a metal gate electrode Jul. 20, 2004
6764960 Manufacture of composite oxide film and magnetic tunneling junction element having thin composite oxide film Jul. 20, 2004
6764962 Method for forming an oxynitride layer Jul. 20, 2004
6759314 Method for manufacturing semiconductor devices using thermal nitride films as gate insulating films Jul. 6, 2004
6746968 Method of reducing charge loss for nonvolatile memory Jun. 8, 2004
6746955 Method of manufacturing a semiconductor device including a heat treatment procedure Jun. 8, 2004
6737362 Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication May. 18, 2004
6734114 Method for manufacturing semiconductor integrated circuit device May. 11, 2004
6727142 Orientation independent oxidation of nitrided silicon Apr. 27, 2004
6727194 Wafer batch processing system and method Apr. 27, 2004
6723641 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF DETERMINING FILM FORMATION TIME, CHAMBER, CHEMICAL VAPOR DEPOSITION APPARATUS AND BOAT THEREOF, ETCHING APPARATUS, AND FILM FORMATION Apr. 20, 2004

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