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Class Information
Number: 438/770
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation
Description: Processes wherein the external agent supplies oxygen which reacts with the silicon substrate region to form a compound therewith.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6808984 |
Method for forming a contact opening |
Oct. 26, 2004 |
| 6806199 |
Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace |
Oct. 19, 2004 |
| 6800538 |
Semiconductor device fabrication method and semiconductor fabrication control method |
Oct. 5, 2004 |
| 6794314 |
Method of forming ultrathin oxide layer |
Sep. 21, 2004 |
| 6794313 |
Oxidation process to improve polysilicon sidewall roughness |
Sep. 21, 2004 |
| 6784115 |
Method of simultaneously implementing differential gate oxide thickness using fluorine bearing impurities |
Aug. 31, 2004 |
| 6780697 |
Method of manufacturing lateral double-diffused metal oxide semiconductor device |
Aug. 24, 2004 |
| 6780765 |
Integrated circuit trenched features and method of producing same |
Aug. 24, 2004 |
| 6780789 |
Laser thermal oxidation to form ultra-thin gate oxide |
Aug. 24, 2004 |
| 6777348 |
Method of forming oxynitride film |
Aug. 17, 2004 |
| 6777346 |
Planarization using plasma oxidized amorphous silicon |
Aug. 17, 2004 |
| 6777274 |
Low temperature polycrystalline silicon type thin film transistor and a method of the thin film transistor fabrication |
Aug. 17, 2004 |
| 6770538 |
Ion-assisted oxidation methods and the resulting structures |
Aug. 3, 2004 |
| 6767848 |
Silicon semiconductor substrate and method for production thereof |
Jul. 27, 2004 |
| 6767843 |
Method of N2O growth of an oxide layer on a silicon carbide layer |
Jul. 27, 2004 |
| 6767760 |
Process of manufacturing a thin-film transistor |
Jul. 27, 2004 |
| 6764962 |
Method for forming an oxynitride layer |
Jul. 20, 2004 |
| 6764960 |
Manufacture of composite oxide film and magnetic tunneling junction element having thin composite oxide film |
Jul. 20, 2004 |
| 6764961 |
Method of forming a metal gate electrode |
Jul. 20, 2004 |
| 6764963 |
Manufacturing method of semiconductor devices |
Jul. 20, 2004 |
| 6759314 |
Method for manufacturing semiconductor devices using thermal nitride films as gate insulating films |
Jul. 6, 2004 |
| 6746968 |
Method of reducing charge loss for nonvolatile memory |
Jun. 8, 2004 |
| 6746955 |
Method of manufacturing a semiconductor device including a heat treatment procedure |
Jun. 8, 2004 |
| 6737362 |
Method for manufacturing a thin gate dielectric layer for integrated circuit fabrication |
May. 18, 2004 |
| 6734114 |
Method for manufacturing semiconductor integrated circuit device |
May. 11, 2004 |
| 6727194 |
Wafer batch processing system and method |
Apr. 27, 2004 |
| 6727142 |
Orientation independent oxidation of nitrided silicon |
Apr. 27, 2004 |
| 6723641 |
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF DETERMINING FILM FORMATION TIME, CHAMBER, CHEMICAL VAPOR DEPOSITION APPARATUS AND BOAT THEREOF, ETCHING APPARATUS, AND FILM FORMATION |
Apr. 20, 2004 |
| 6716695 |
Semiconductor with a nitrided silicon gate oxide and method |
Apr. 6, 2004 |
| 6716705 |
EEPROM device having a retrograde program junction region and process for fabricating the device |
Apr. 6, 2004 |
| 6716768 |
Method of manufacturing thin-film transistor, and liquid-crystal display |
Apr. 6, 2004 |
| 6713348 |
Method for forming an etch mask during the manufacture of a semiconductor device |
Mar. 30, 2004 |
| 6713364 |
Method for forming an insulator having a low dielectric constant on a semiconductor substrate |
Mar. 30, 2004 |
| 6706572 |
Method for manufacturing a thin film transistor using a high pressure oxidation step |
Mar. 16, 2004 |
| 6706643 |
UV-enhanced oxy-nitridation of semiconductor substrates |
Mar. 16, 2004 |
| 6703322 |
Method of forming multiple oxide layers with different thicknesses in a linear nitrogen doping process |
Mar. 9, 2004 |
| 6699796 |
Single chip pad oxide layer growth process |
Mar. 2, 2004 |
| 6696326 |
Cleaning method to prevent watermarks |
Feb. 24, 2004 |
| 6693047 |
Method for recycling semiconductor wafers having carbon doped low-k dielectric layers |
Feb. 17, 2004 |
| 6689646 |
Plasma method for fabricating oxide thin films |
Feb. 10, 2004 |
| 6689702 |
High dielectric constant metal oxide gate dielectrics |
Feb. 10, 2004 |
| 6689675 |
Method for making a semiconductor device having a high-k gate dielectric |
Feb. 10, 2004 |
| 6682979 |
Methods of forming transistors associated with semiconductor substrates |
Jan. 27, 2004 |
| 6680225 |
Method for manufacturing a semiconductor memory |
Jan. 20, 2004 |
| 6680261 |
Method of reducing boron outgassing at trench power IC's oxidation process for sacrificial oxide layer |
Jan. 20, 2004 |
| 6677254 |
Processes for making a barrier between a dielectric and a conductor and products produced therefrom |
Jan. 13, 2004 |
| 6670242 |
Method for making an integrated circuit device including a graded, grown, high quality gate oxide layer and a nitride layer |
Dec. 30, 2003 |
| 6667197 |
Method for differential oxidation rate reduction for n-type and p-type materials |
Dec. 23, 2003 |
| 6667232 |
Thin dielectric layers and non-thermal formation thereof |
Dec. 23, 2003 |
| 6664201 |
Method of manufacturing anti-reflection layer |
Dec. 16, 2003 |
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