| |
 |
|
Class Information
Number: 438/770
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation
Description: Processes wherein the external agent supplies oxygen which reacts with the silicon substrate region to form a compound therewith.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7307026 |
Method of forming an epitaxial layer for raised drain and source regions by removing contaminations |
Dec. 11, 2007 |
| 7304002 |
Method of oxidizing member to be treated |
Dec. 4, 2007 |
| 7303946 |
Method of manufacturing a semiconductor device using an oxidation process |
Dec. 4, 2007 |
| 7304003 |
Oxidizing method and oxidizing unit for object to be processed |
Dec. 4, 2007 |
| 7300847 |
MOS transistor on an SOI substrate with a body contact and a gate insulating film with variable thickness |
Nov. 27, 2007 |
| 7291566 |
Barrier layer for a processing element and a method of forming the same |
Nov. 6, 2007 |
| 7288490 |
Increased alignment in carbon nanotube growth |
Oct. 30, 2007 |
| 7282457 |
Apparatus for stabilizing high pressure oxidation of a semiconductor device |
Oct. 16, 2007 |
| 7282131 |
Methods of electrochemically treating semiconductor substrates |
Oct. 16, 2007 |
| 7279435 |
Apparatus for stabilizing high pressure oxidation of a semiconductor device |
Oct. 9, 2007 |
| 7273819 |
Method and apparatus for processing semiconductor substrates |
Sep. 25, 2007 |
| 7256114 |
Process for oxide cap formation in semiconductor manufacturing |
Aug. 14, 2007 |
| 7238625 |
Method for processing a semiconductor device comprising a silicon-oxy-nitride dielectric layer |
Jul. 3, 2007 |
| 7235498 |
Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 |
Jun. 26, 2007 |
| 7235497 |
Selective oxidation methods and transistor fabrication methods |
Jun. 26, 2007 |
| 7232772 |
Substrate processing method |
Jun. 19, 2007 |
| 7232728 |
High quality oxide on an epitaxial layer |
Jun. 19, 2007 |
| 7217578 |
Advanced process control of thermal oxidation processes, and systems for accomplishing same |
May. 15, 2007 |
| 7214628 |
Plasma gate oxidation process using pulsed RF source power |
May. 8, 2007 |
| 7211523 |
Method for forming field oxide |
May. 1, 2007 |
| 7202184 |
Method for fabricating semiconductor device |
Apr. 10, 2007 |
| 7192887 |
Semiconductor device with nitrogen in oxide film on semiconductor substrate and method of manufacturing the same |
Mar. 20, 2007 |
| 7192828 |
Capacitor with high dielectric constant materials and method of making |
Mar. 20, 2007 |
| 7189635 |
Reduction of a feature dimension in a nano-scale device |
Mar. 13, 2007 |
| 7186608 |
Masked nitrogen enhanced gate oxide |
Mar. 6, 2007 |
| 7186664 |
Methods and structures for metal interconnections in integrated circuits |
Mar. 6, 2007 |
| 7183223 |
Methods for forming small contacts |
Feb. 27, 2007 |
| 7183216 |
Methods to form oxide-filled trenches |
Feb. 27, 2007 |
| 7183143 |
Method for forming nitrided tunnel oxide layer |
Feb. 27, 2007 |
| 7179746 |
Method of surface treatment for manufacturing semiconductor device |
Feb. 20, 2007 |
| 7169714 |
Method and structure for graded gate oxides on vertical and non-planar surfaces |
Jan. 30, 2007 |
| 7166519 |
Method for isolating semiconductor devices with use of shallow trench isolation method |
Jan. 23, 2007 |
| 7166541 |
Method of forming dielectric layer using plasma enhanced atomic layer deposition technique |
Jan. 23, 2007 |
| 7160819 |
Method to perform selective atomic layer deposition of zinc oxide |
Jan. 9, 2007 |
| 7157383 |
Method for forming silicon dioxide film on silicon substrate, method for forming oxide film on semiconductor substrate, and method for producing semiconductor device |
Jan. 2, 2007 |
| 7153785 |
Method of producing annealed wafer and annealed wafer |
Dec. 26, 2006 |
| 7151059 |
MOS transistor and method of manufacture |
Dec. 19, 2006 |
| 7148101 |
Capacitors of semiconductor devices and methods of fabricating the same |
Dec. 12, 2006 |
| 7148153 |
Process for oxide fabrication using oxidation steps below and above a threshold temperature |
Dec. 12, 2006 |
| 7141513 |
Integrated ashing and implant annealing method using ozone |
Nov. 28, 2006 |
| 7141514 |
Selective plasma re-oxidation process using pulsed RF source power |
Nov. 28, 2006 |
| 7135370 |
Dielectric storage memory cell having high permittivity top dielectric and method therefor |
Nov. 14, 2006 |
| 7129188 |
Transistor fabrication methods |
Oct. 31, 2006 |
| 7129183 |
Method of forming grating microstrutures by anodic oxidation |
Oct. 31, 2006 |
| 7125811 |
Oxidation method for semiconductor process |
Oct. 24, 2006 |
| 7115469 |
Integrated ONO processing for semiconductor devices using in-situ steam generation (ISSG) process |
Oct. 3, 2006 |
| 7112540 |
Pretreatment for an electroplating process and an electroplating process in including the pretreatment |
Sep. 26, 2006 |
| 7109131 |
System and method for hydrogen-rich selective oxidation |
Sep. 19, 2006 |
| 7101812 |
Method of forming and/or modifying a dielectric film on a semiconductor surface |
Sep. 5, 2006 |
| 7098148 |
Method for heat treating a semiconductor wafer |
Aug. 29, 2006 |
|
|
|
