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Class Information
Number: 438/770
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation
Description: Processes wherein the external agent supplies oxygen which reacts with the silicon substrate region to form a compound therewith.










Sub-classes under this class:

Class Number Class Name Patents
438/774 In atmosphere containing halogen 131
438/773 In atmosphere containing water vapor (i.e., wet oxidation) 223
438/771 Using electromagnetic or wave energy 190


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16

Patent Number Title Of Patent Date Issued
7655574 Method of modifying insulating film Feb. 2, 2010
7655524 Method for manufacturing isolation layer having barrier layer formed thereon Feb. 2, 2010
7648923 Method of fabricating semiconductor device Jan. 19, 2010
7645709 Methods for low temperature oxidation of a semiconductor device Jan. 12, 2010
7642152 Method of fabricating spacers and cleaning method of post-etching and semiconductor device Jan. 5, 2010
7641736 Method of manufacturing SiC single crystal wafer Jan. 5, 2010
7638439 Peripheral processing method and method of manufacturing a semiconductor device Dec. 29, 2009
7638442 Method of forming a silicon nitride layer on a gate oxide film of a semiconductor device and annealing the nitride layer Dec. 29, 2009
7635623 Methods of forming capacitors Dec. 22, 2009
7622402 Method for forming underlying insulation film Nov. 24, 2009
7623937 Semiconductor device manufacturing system and method for manufacturing semiconductor devices including calculating oxide film thickness using real time simulator Nov. 24, 2009
7618901 Process for growing a dielectric layer on a silicon-containing surface using a mixture of N.sub.2O and O.sub.3 Nov. 17, 2009
7618891 Method for forming self-aligned metal silicide contacts Nov. 17, 2009
7615499 Method for oxidizing a layer, and associated holding devices for a substrate Nov. 10, 2009
7611579 Systems and methods for synthesis of extended length nanostructures Nov. 3, 2009
7611949 Method of fabricating metal-oxide-semiconductor transistor Nov. 3, 2009
7605095 Heat processing method and apparatus for semiconductor process Oct. 20, 2009
7598145 Method for producing Si.sub.1-yGe.sub.y based zones with different contents in Ge on a same substrate by condensation of germanium Oct. 6, 2009
7598140 Method of producing a semiconductor device having an oxide film Oct. 6, 2009
7569494 Apparatus and method for deposition of thin films Aug. 4, 2009
7569487 Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices Aug. 4, 2009
7563628 Fabrication of optical waveguide devices Jul. 21, 2009
7563697 Method for producing SOI wafer Jul. 21, 2009
7553704 Antifuse element and method of manufacture Jun. 30, 2009
7541297 Method and system for improving dielectric film quality for void free gap fill Jun. 2, 2009
7541295 Method of manufacturing semiconductor device Jun. 2, 2009
7541246 Method of manufacturing semiconductor device Jun. 2, 2009
7538008 Method for producing a layer structure May. 26, 2009
7534731 Method for growing a thin oxynitride film on a substrate May. 19, 2009
7534730 Producing method of semiconductor device and substrate processing apparatus May. 19, 2009
7531431 Methods for reducing contamination of semiconductor devices and materials during wafer processing May. 12, 2009
7528041 Method of manufacturing semiconductor device that utilizes oxidation prevention film to form thick and thin gate insulator portions May. 5, 2009
7528015 Tunable antifuse element and method of manufacture May. 5, 2009
7524744 Method of producing SOI wafer and SOI wafer Apr. 28, 2009
7524745 Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure Apr. 28, 2009
7521325 Semiconductor device and method for fabricating the same Apr. 21, 2009
7521375 Method of forming an oxinitride layer Apr. 21, 2009
7517813 Two-step oxidation process for semiconductor wafers Apr. 14, 2009
7514315 Methods of forming capacitor structures having aluminum oxide diffusion barriers Apr. 7, 2009
7507676 Film formation method and apparatus for semiconductor process Mar. 24, 2009
7498270 Method of forming a silicon oxynitride film with tensile stress Mar. 3, 2009
7494940 Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices Feb. 24, 2009
7491656 Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film Feb. 17, 2009
7488652 Manufacturing method of gate oxidation films Feb. 10, 2009
7446052 Method for forming insulation film Nov. 4, 2008
7442571 Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having th Oct. 28, 2008
7442655 Selective oxidation methods and transistor fabrication methods Oct. 28, 2008
7439165 Method of fabricating tensile strained layers and compressive strain layers for a CMOS device Oct. 21, 2008
7435690 Method of preparing a silicon dioxide layer by high temperature oxidation on a substrate having, at least on the surface, germanium or a silicon-germanium alloy Oct. 14, 2008
7435691 Micromechanical component and suitable method for its manufacture Oct. 14, 2008

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16










 
 
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