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Class Information
Number: 438/770
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) > Oxidation
Description: Processes wherein the external agent supplies oxygen which reacts with the silicon substrate region to form a compound therewith.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7569487 |
Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices |
Aug. 4, 2009 |
| 7569494 |
Apparatus and method for deposition of thin films |
Aug. 4, 2009 |
| 7563628 |
Fabrication of optical waveguide devices |
Jul. 21, 2009 |
| 7563697 |
Method for producing SOI wafer |
Jul. 21, 2009 |
| 7553704 |
Antifuse element and method of manufacture |
Jun. 30, 2009 |
| 7541246 |
Method of manufacturing semiconductor device |
Jun. 2, 2009 |
| 7541297 |
Method and system for improving dielectric film quality for void free gap fill |
Jun. 2, 2009 |
| 7541295 |
Method of manufacturing semiconductor device |
Jun. 2, 2009 |
| 7538008 |
Method for producing a layer structure |
May. 26, 2009 |
| 7534730 |
Producing method of semiconductor device and substrate processing apparatus |
May. 19, 2009 |
| 7534731 |
Method for growing a thin oxynitride film on a substrate |
May. 19, 2009 |
| 7531431 |
Methods for reducing contamination of semiconductor devices and materials during wafer processing |
May. 12, 2009 |
| 7528015 |
Tunable antifuse element and method of manufacture |
May. 5, 2009 |
| 7528041 |
Method of manufacturing semiconductor device that utilizes oxidation prevention film to form thick and thin gate insulator portions |
May. 5, 2009 |
| 7524744 |
Method of producing SOI wafer and SOI wafer |
Apr. 28, 2009 |
| 7524745 |
Method and device for doping, diffusion and oxidation of silicon wafers under reduced pressure |
Apr. 28, 2009 |
| 7521325 |
Semiconductor device and method for fabricating the same |
Apr. 21, 2009 |
| 7521375 |
Method of forming an oxinitride layer |
Apr. 21, 2009 |
| 7517813 |
Two-step oxidation process for semiconductor wafers |
Apr. 14, 2009 |
| 7514315 |
Methods of forming capacitor structures having aluminum oxide diffusion barriers |
Apr. 7, 2009 |
| 7507676 |
Film formation method and apparatus for semiconductor process |
Mar. 24, 2009 |
| 7498270 |
Method of forming a silicon oxynitride film with tensile stress |
Mar. 3, 2009 |
| 7494940 |
Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices |
Feb. 24, 2009 |
| 7491656 |
Semiconductor device, method for forming silicon oxide film, and apparatus for forming silicon oxide film |
Feb. 17, 2009 |
| 7488652 |
Manufacturing method of gate oxidation films |
Feb. 10, 2009 |
| 7446052 |
Method for forming insulation film |
Nov. 4, 2008 |
| 7442655 |
Selective oxidation methods and transistor fabrication methods |
Oct. 28, 2008 |
| 7442571 |
Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having th |
Oct. 28, 2008 |
| 7439165 |
Method of fabricating tensile strained layers and compressive strain layers for a CMOS device |
Oct. 21, 2008 |
| 7435690 |
Method of preparing a silicon dioxide layer by high temperature oxidation on a substrate having, at least on the surface, germanium or a silicon-germanium alloy |
Oct. 14, 2008 |
| 7435691 |
Micromechanical component and suitable method for its manufacture |
Oct. 14, 2008 |
| 7429539 |
Nitriding method of gate oxide film |
Sep. 30, 2008 |
| 7425480 |
Semiconductor device and method of manufacture thereof |
Sep. 16, 2008 |
| 7420202 |
Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device |
Sep. 2, 2008 |
| 7410911 |
Method for stabilizing high pressure oxidation of a semiconductor device |
Aug. 12, 2008 |
| 7410910 |
Lanthanum aluminum oxynitride dielectric films |
Aug. 12, 2008 |
| 7396729 |
Methods of forming semiconductor devices having a trench with beveled corners |
Jul. 8, 2008 |
| 7387972 |
Reducing nitrogen concentration with in-situ steam generation |
Jun. 17, 2008 |
| 7381658 |
Encapsulation of nano-dimensional structures by oxidation |
Jun. 3, 2008 |
| 7381620 |
Oxygen elimination for device processing |
Jun. 3, 2008 |
| 7381657 |
Biased pulse DC reactive sputtering of oxide films |
Jun. 3, 2008 |
| 7378319 |
Method of forming double gate dielectric layers and semiconductor device having the same |
May. 27, 2008 |
| 7371630 |
Patterned backside stress engineering for transistor performance optimization |
May. 13, 2008 |
| 7368400 |
Method for forming oxide film in semiconductor device |
May. 6, 2008 |
| 7365028 |
Methods of forming metal oxide and semimetal oxide |
Apr. 29, 2008 |
| 7358171 |
Method to chemically remove metal impurities from polycide gate sidewalls |
Apr. 15, 2008 |
| 7351668 |
Film formation method and apparatus for semiconductor process |
Apr. 1, 2008 |
| 7338850 |
Method for manufacturing device isolation film of semiconductor device |
Mar. 4, 2008 |
| 7335606 |
Silicide formed from ternary metal alloy films |
Feb. 26, 2008 |
| 7312139 |
Method of fabricating nitrogen-containing gate dielectric layer and semiconductor device |
Dec. 25, 2007 |
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