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Class Information
Number: 438/769
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.)
Description: Processes wherein the substrate region reacting with an external agent is a silicon semiconductor region.










Sub-classes under this class:

Class Number Class Name Patents
438/775 Nitridation 478
438/770 Oxidation 771


Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8679961 Method of manufacturing semiconductor device having pre-silicide nitrogen implant Mar. 25, 2014
8679922 Method of producing semiconductor device and method of producing solid-state image pickup device Mar. 25, 2014
8673711 Methods of fabricating a semiconductor device having a high-K gate dielectric layer and semiconductor devices fabricated thereby Mar. 18, 2014
8664109 Advanced low k cap film formation process for nano electronic devices Mar. 4, 2014
8664126 Selective deposition of polymer films on bare silicon instead of oxide surface Mar. 4, 2014
8580698 Method for fabricating a gate dielectric layer Nov. 12, 2013
8574985 Methods for depositing high-K dielectrics Nov. 5, 2013
8575033 Carbosilane precursors for low temperature film deposition Nov. 5, 2013
8563442 Method for manufacturing nitrogen compound semiconductor substrate and nitrogen compound semiconductor substrate, and method for manufacturing single crystal SiC substrate and single crystal S Oct. 22, 2013
8557717 Method for manufacturing a semiconductor device Oct. 15, 2013
8551891 Remote plasma burn-in Oct. 8, 2013
8546920 Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) Oct. 1, 2013
8546271 Method of improving oxide growth rate of selective oxidation processes Oct. 1, 2013
8546270 Atomic layer deposition apparatus Oct. 1, 2013
8524395 Nonaqueous electrolyte secondary battery anode material with a uniform metal-semiconductor alloy layer Sep. 3, 2013
8513578 Electromagnetic wave processing apparatus Aug. 20, 2013
8492291 Formation of gate dielectrics with uniform nitrogen distribution Jul. 23, 2013
8492290 Fabrication of silicon oxide and oxynitride having sub-nanometer thickness Jul. 23, 2013
8492289 Barrier layer formation for metal interconnects through enhanced impurity diffusion Jul. 23, 2013
8486839 Methods and apparatus to improve reliability of isolated vias Jul. 16, 2013
8481387 Method of forming an insulation structure and method of manufacturing a semiconductor device using the same Jul. 9, 2013
8470693 Method for manufacturing quantum dot Jun. 25, 2013
8455293 Method for processing solar cell substrates Jun. 4, 2013
8455314 Transistors comprising high-K metal gate electrode structures and embedded strain-inducing semiconductor alloys formed in a late stage Jun. 4, 2013
8440571 Methods for deposition of silicon carbide and silicon carbonitride films May. 14, 2013
8409988 Method of manufacturing semiconductor device and substrate processing apparatus Apr. 2, 2013
8367244 Anode material having a uniform metal-semiconductor alloy layer Feb. 5, 2013
8334220 Method of selectively forming a silicon nitride layer Dec. 18, 2012
8334221 Methods of forming patterned photoresist layers over semiconductor substrates Dec. 18, 2012
8324119 Enhancing deposition uniformity of a channel semiconductor alloy by an in situ etch process Dec. 4, 2012
8318608 Method of fabricating a nonvolatile charge trap memory device Nov. 27, 2012
8318584 Oxide-rich liner layer for flowable CVD gapfill Nov. 27, 2012
8304352 Method of manufacturing a semiconductor device Nov. 6, 2012
8288826 Semiconductor-on-insulator (SOI) structures including gradient nitrided buried oxide (BOX) Oct. 16, 2012
8283261 Radical oxidation process for fabricating a nonvolatile charge trap memory device Oct. 9, 2012
8252685 Techniques to improve characteristics of processed semiconductor substrates Aug. 28, 2012
8227356 Method of forming semiconductor device and semiconductor device Jul. 24, 2012
8222147 Semiconductor device with stop layers and fabrication method using ceria slurry Jul. 17, 2012
8211779 Method for forming isolation layer in semiconductor device Jul. 3, 2012
8193101 Substrate processing apparatus and semiconductor device manufacturing method for forming film Jun. 5, 2012
8183105 Integrated circuit device with stress reduction layer May. 22, 2012
8174049 Semiconductor device and method of fabricating the same May. 8, 2012
8158534 Reduction of defects formed on the surface of a silicon oxynitride film Apr. 17, 2012
8133613 Nonaqueous electrolyte secondary battery anode material with a uniform metal-semiconductor alloy layer Mar. 13, 2012
8101530 Lithography patterning method Jan. 24, 2012
8097517 Method for manufacturing semiconductor device with improved short channel effect of a PMOS and stabilized current of a NMOS Jan. 17, 2012
8076240 Techniques to improve characteristics of processed semiconductor substrates Dec. 13, 2011
8053373 Semiconductor-on-insulator(SOI) structures including gradient nitrided buried oxide (BOX) Nov. 8, 2011
8043916 Method of fabricating semiconductor device having multiple gate insulating layer Oct. 25, 2011
8043937 Method for manufacturing semiconductor substrate Oct. 25, 2011

1 2 3 4 5 6 7 8










 
 
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