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Class Information
Number: 438/766
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate > Implantation of ion (e.g., to form ion amorphousized region prior to selective oxidation, reacting with substrate to form insulative region, etc.)
Description: Processes having a step of implanting an ionized species into a substrate region to form or facilitate formation of a reactive coating layer.

Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
8703567 Method for manufacturing a semiconductor device Apr. 22, 2014
8679356 Mask system and method of patterning magnetic media Mar. 25, 2014
8664126 Selective deposition of polymer films on bare silicon instead of oxide surface Mar. 4, 2014
8614501 Method of producing a layer of cavities Dec. 24, 2013
8603924 Methods of forming gate dielectric material Dec. 10, 2013
8580696 Systems and methods for detecting watermark formations on semiconductor wafers Nov. 12, 2013
8460957 Optical semiconductor device, method for manufacturing optical semiconductor device, and method for manufacturing optical semiconductor apparatus Jun. 11, 2013
8440578 GCIB process for reducing interfacial roughness following pre-amorphization May. 14, 2013
8389068 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation Mar. 5, 2013
8372760 Method and system for using ion implantation for treating a low-k dielectric film Feb. 12, 2013
8343877 Angle ion implant to re-shape sidewall image transfer patterns Jan. 1, 2013
8304033 Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles Nov. 6, 2012
8274081 Semiconductor constructions Sep. 25, 2012
8207044 Methods for oxidation of a semiconductor device Jun. 26, 2012
8192805 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices Jun. 5, 2012
8173553 Epitaxial wafer and production method thereof May. 8, 2012
8174074 Asymmetric embedded silicon germanium field effect transistor May. 8, 2012
8124509 Method of forming porous diamond films for semiconductor applications Feb. 28, 2012
8124427 Method of creating an extremely thin semiconductor-on-insulator (ETSOI) layer having a uniform thickness Feb. 28, 2012
8101528 Low temperature ion implantation Jan. 24, 2012
8097530 Method for manufacturing SIC semiconductor device Jan. 17, 2012
8088676 Metal-induced crystallization of amorphous silicon, polycrystalline silicon thin films produced thereby and thin film transistors produced therefrom Jan. 3, 2012
8080482 Methods for preparing a semiconductor structure for use in backside illumination applications Dec. 20, 2011
8048784 Methods of manufacturing semiconductor devices including a doped silicon layer Nov. 1, 2011
7994064 Selective etch for damage at exfoliated surface Aug. 9, 2011
7981483 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices Jul. 19, 2011
7977252 Method of formation of coherent wavy nanostructures (variants) Jul. 12, 2011
7927980 Method for forming a detachable substrate including implantation and exfoliation Apr. 19, 2011
7888272 Methods for manufacturing memory and logic devices using the same process without the need for additional masks Feb. 15, 2011
7875560 Semiconductor having optimized insulation structure and process for producing the semiconductor Jan. 25, 2011
7855131 Manufacturing method of a semiconductor device Dec. 21, 2010
7838437 Method for simultaneous recrystallization and doping of semiconductor layers Nov. 23, 2010
7833888 Integrated circuit system employing grain size enlargement Nov. 16, 2010
7811896 Semiconductor structure and method of manufacture Oct. 12, 2010
7807545 Method for manufacturing SIMOX wafer Oct. 5, 2010
7772646 Method of manufacturing a semiconductor device and such a semiconductor device Aug. 10, 2010
7767583 Method to improve uniformity of chemical mechanical polishing planarization Aug. 3, 2010
7759254 Method for forming impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device Jul. 20, 2010
7759260 Selective nitridation of gate oxides Jul. 20, 2010
7736963 Method of forming a gate structure for a semiconductor device and method of forming a cell gate structure for a non-volatile memory device Jun. 15, 2010
7718231 Thin buried oxides by low-dose oxygen implantation into modified silicon May. 18, 2010
7695564 Thermal management substrate Apr. 13, 2010
7691734 Deep trench based far subcollector reachthrough Apr. 6, 2010
7675048 Wafer holding robot end effecter vertical position determination in ion implanter system Mar. 9, 2010
7670930 Method of detaching a thin film by melting precipitates Mar. 2, 2010
7659213 Transistor having an embedded tensile strain layer with reduced offset to the gate electrode and a method for forming the same Feb. 9, 2010
7659184 Plasma immersion ion implantation process with chamber seasoning and seasoning layer plasma discharging for wafer dechucking Feb. 9, 2010
7645676 Semiconductor structures for latch-up suppression and methods of forming such semiconductor structures Jan. 12, 2010
7635653 Method of fabricating a semiconductor circuit having a plurality of MOS transistors and flash memory Dec. 22, 2009
7569496 Method for manufacturing SiC semiconductor device Aug. 4, 2009

1 2 3 4 5 6 7 8

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