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Class Information
Number: 438/765
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate
Description: Processes wherein a coating layer is formed by reacting an external agent with a constituent of the substrate to form the coating thereupon.










Sub-classes under this class:

Class Number Class Name Patents
438/767 Compound semiconductor substrate 177
438/766 Implantation of ion (e.g., to form ion amorphousized region prior to selective oxidation, reacting with substrate to form insulative region, etc.) 367
438/768 Reaction with conductive region 136
438/769 Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) 397


Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8703410 Substrate having a mark formed on a surface thereof by a CO.sub.2 laser beam Apr. 22, 2014
8691636 Method for removing germanium suboxide Apr. 8, 2014
8673711 Methods of fabricating a semiconductor device having a high-K gate dielectric layer and semiconductor devices fabricated thereby Mar. 18, 2014
8675368 Vertically oriented semiconductor device and shielding structure thereof Mar. 18, 2014
8657959 Apparatus for atomic layer deposition on a moving substrate Feb. 25, 2014
8618003 Method of making electronic devices using selective deposition Dec. 31, 2013
8617993 Method of reducing pattern collapse in high aspect ratio nanostructures Dec. 31, 2013
8586485 Molecular self-assembly in substrate processing Nov. 19, 2013
8569184 Method for forming single-phase multi-element film by PEALD Oct. 29, 2013
8563339 System for and method for closed loop electrophoretic deposition of phosphor materials on semiconductor devices Oct. 22, 2013
8563353 Method of making a multicomponent film Oct. 22, 2013
8557715 Marking CO.sub.2 laser-transparent materials by using absorption-material-assisted laser processing Oct. 15, 2013
8546270 Atomic layer deposition apparatus Oct. 1, 2013
8535571 Water-soluble electrically conductive polymers Sep. 17, 2013
8524395 Nonaqueous electrolyte secondary battery anode material with a uniform metal-semiconductor alloy layer Sep. 3, 2013
8524614 III-V compound semiconductor material passivation with crystalline interlayer Sep. 3, 2013
8501636 Method for fabricating silicon dioxide layer Aug. 6, 2013
8497190 Process for treating a semiconductor-on-insulator structure Jul. 30, 2013
8492289 Barrier layer formation for metal interconnects through enhanced impurity diffusion Jul. 23, 2013
8492290 Fabrication of silicon oxide and oxynitride having sub-nanometer thickness Jul. 23, 2013
8470693 Method for manufacturing quantum dot Jun. 25, 2013
8440578 GCIB process for reducing interfacial roughness following pre-amorphization May. 14, 2013
8435905 Manufacturing method of semiconductor device, and substrate processing apparatus May. 7, 2013
8426320 Method of formation of coherent wavy nanostructures (variants) Apr. 23, 2013
8372759 Molecular self-assembly in substrate processing Feb. 12, 2013
8372753 Dry cleaning of silicon surface for solar cell applications Feb. 12, 2013
8349743 Method for fabricating light emitting device Jan. 8, 2013
8318612 Methods for improving the quality of group III-nitride materials and structures produced by the methods Nov. 27, 2012
8293658 Reactive site deactivation against vapor deposition Oct. 23, 2012
8278124 Assembly of ordered carbon shells on semiconducting nanomaterials Oct. 2, 2012
8269289 Transistor device and methods of manufacture thereof Sep. 18, 2012
8257599 Thermal head manufacturing method Sep. 4, 2012
8252685 Techniques to improve characteristics of processed semiconductor substrates Aug. 28, 2012
8242030 Activation of graphene buffer layers on silicon carbide by ultra low temperature oxidation Aug. 14, 2012
8207063 Process for atomic layer deposition Jun. 26, 2012
8193027 Method of making a multicomponent film Jun. 5, 2012
8193101 Substrate processing apparatus and semiconductor device manufacturing method for forming film Jun. 5, 2012
8173095 Method and apparatus for producing graphene oxide layers on an insulating substrate May. 8, 2012
8168546 Method for selective deposition and devices May. 1, 2012
8158465 Vertical coffee-stain method for forming self-organized line structures Apr. 17, 2012
8158494 Method for processing a substrate, method for manufacturing a semiconductor chip, and method for manufacturing a semiconductor chip having a resin adhesive layer Apr. 17, 2012
8133820 Substrate processing method and substrate processing apparatus Mar. 13, 2012
8133613 Nonaqueous electrolyte secondary battery anode material with a uniform metal-semiconductor alloy layer Mar. 13, 2012
8119539 Methods of fabricating oxide layers on silicon carbide layers utilizing atomic oxygen Feb. 21, 2012
8105957 Method of producing semiconductor device Jan. 31, 2012
8084369 Producing method of semiconductor device and substrate processing apparatus Dec. 27, 2011
8076240 Techniques to improve characteristics of processed semiconductor substrates Dec. 13, 2011
8053372 Method of reducing plasma stabilization time in a cyclic deposition process Nov. 8, 2011
8043977 Method of manufacturing a semiconductor device having a group-III nitride superlattice layer on a silicon substrate Oct. 25, 2011
8030212 Process for selective area deposition of inorganic materials Oct. 4, 2011

1 2 3 4 5 6










 
 
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