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Class Information
Number: 438/765
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > By reaction with substrate
Description: Processes wherein a coating layer is formed by reacting an external agent with a constituent of the substrate to form the coating thereupon.


Sub-classes under this class:

Class Number Class Name Patents
438/767 Compound semiconductor substrate 141
438/766 Implantation of ion (e.g., to form ion amorphousized region prior to selective oxidation, reacting with substrate to form insulative region, etc.) 318
438/768 Reaction with conductive region 113
438/769 Reaction with silicon semiconductive region (e.g., oxynitride formation, etc.) 291


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7622397 InN/TiO.sub.2 photosensitized electrode Nov. 24, 2009
7576015 Methods for manufacturing alignment layer, active device array substrate and color filter substrate Aug. 18, 2009
7572741 Methods of fabricating oxide layers on silicon carbide layers utilizing atomic oxygen Aug. 11, 2009
7566481 Method of making scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s) Jul. 28, 2009
7560393 Systems and methods of forming refractory metal nitride layers using disilazanes Jul. 14, 2009
7560352 Selective deposition Jul. 14, 2009
7553776 Patterned functionalized silicon surfaces Jun. 30, 2009
7547643 Techniques promoting adhesion of porous low K film to underlying barrier layer Jun. 16, 2009
7541295 Method of manufacturing semiconductor device Jun. 2, 2009
7541294 Semiconductor package and semiconductor package mounting method Jun. 2, 2009
7534729 Modification of semiconductor surfaces in a liquid May. 19, 2009
7534730 Producing method of semiconductor device and substrate processing apparatus May. 19, 2009
7521376 Method of forming a semiconductor structure using a non-oxygen chalcogen passivation treatment Apr. 21, 2009
7521344 Method of forming semiconductor compound film for fabrication of electronic device and film produced by same using a solid solution Apr. 21, 2009
7517812 Method and system for forming a nitrided germanium-containing layer using plasma processing Apr. 14, 2009
7446052 Method for forming insulation film Nov. 4, 2008
7420202 Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device Sep. 2, 2008
7413914 Method and apparatus for manufacturing semiconductor device, method and apparatus for controlling the same, and method and apparatus for simulating manufacturing process of semiconductor devic Aug. 19, 2008
7378319 Method of forming double gate dielectric layers and semiconductor device having the same May. 27, 2008
7378358 Method for forming insulating film on substrate, method for manufacturing semiconductor device and substrate-processing apparatus May. 27, 2008
7365028 Methods of forming metal oxide and semimetal oxide Apr. 29, 2008
7358162 Method of manufacturing semiconductor device Apr. 15, 2008
7312163 Atomic layer deposition methods, and methods of forming materials over semiconductor substrates Dec. 25, 2007
7309660 Buffer layer for selective SiGe growth for uniform nucleation Dec. 18, 2007
7304002 Method of oxidizing member to be treated Dec. 4, 2007
7288490 Increased alignment in carbon nanotube growth Oct. 30, 2007
7268090 Method of manufacturing flash memory device Sep. 11, 2007
7256259 Methods for ligation of molecules to surfaces Aug. 14, 2007
7250375 Substrate processing method and material for electronic device Jul. 31, 2007
7238612 Methods of forming a double metal salicide layer and methods of fabricating semiconductor devices incorporating the same Jul. 3, 2007
7238629 Deposition method, method of manufacturing semiconductor device, and semiconductor device Jul. 3, 2007
7232772 Substrate processing method Jun. 19, 2007
7199063 Process for passivating polysilicon and process for fabricating polysilicon thin film transistor Apr. 3, 2007
7176146 Method of making a molecule-surface interface Feb. 13, 2007
7172967 Methods for forming cobalt layers including introducing vaporized cobalt precursors and methods for manufacturing semiconductor devices using the same Feb. 6, 2007
7169713 Atomic layer deposition (ALD) method with enhanced deposition rate Jan. 30, 2007
7160802 Adhesion of tungsten nitride films to a silicon surface Jan. 9, 2007
7144746 Method for monitoring implantation depth of impurity Dec. 5, 2006
7125811 Oxidation method for semiconductor process Oct. 24, 2006
7122464 Systems and methods of forming refractory metal nitride layers using disilazanes Oct. 17, 2006
7122484 Process for removing organic materials during formation of a metal interconnect Oct. 17, 2006
7105459 Method for forming thin film Sep. 12, 2006
7091136 Method of forming semiconductor compound film for fabrication of electronic device and film produced by same Aug. 15, 2006
7091135 Method of manufacturing semiconductor device Aug. 15, 2006
7084075 Method for producing a layer on a substrate Aug. 1, 2006
7071127 Methods for improving quality of semiconductor oxide composition formed from halogen-containing precursor Jul. 4, 2006
7067410 Method of forming a metal silicide Jun. 27, 2006
7067328 Methods, devices and compositions for depositing and orienting nanostructures Jun. 27, 2006
7053007 Method for fabricating semiconductor integrated circuit device May. 30, 2006
7033956 Semiconductor memory devices and methods for making the same Apr. 25, 2006

1 2 3 4


 
 
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