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Class Information
Number: 438/764
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Formation of semi-insulative polycrystalline silicon
Description: Processes involving the deposition of polycrystalline silicon which possesses an electrical conductivity less than that typically utilized for the formation of electrical devices.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8497190 Process for treating a semiconductor-on-insulator structure Jul. 30, 2013
8377832 Method for manufacturing semiconductor device Feb. 19, 2013
8293626 Method for manufacturing semiconductor device Oct. 23, 2012
8178428 Manufacturing method of semiconductor device and substrate processing apparatus May. 15, 2012
8119489 Method of forming a shallow trench isolation structure having a polysilicon capping layer Feb. 21, 2012
8105917 Connection pad structure for an image sensor on a thinned substrate Jan. 31, 2012
7989358 Prevention of backside cracks in semiconductor chips or wafers using backside film or backside wet etch Aug. 2, 2011
7838437 Method for simultaneous recrystallization and doping of semiconductor layers Nov. 23, 2010
7772602 Light emitting device having a plurality of light emitting cells and method of fabricating the same Aug. 10, 2010
7648576 Epitaxial wafer and method for producing same Jan. 19, 2010
7576015 Methods for manufacturing alignment layer, active device array substrate and color filter substrate Aug. 18, 2009
7538044 Process for producing high-purity silicon and apparatus May. 26, 2009
7482283 Thin film forming method and thin film forming device Jan. 27, 2009
7446055 Aerosol misted deposition of low dielectric organosilicate films Nov. 4, 2008
7420202 Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device Sep. 2, 2008
7407873 Method of manufacturing semiconductor device Aug. 5, 2008
7355269 IC on non-semiconductor substrate Apr. 8, 2008
7300888 Methods of manufacturing integrated circuit devices having an encapsulated insulation layer Nov. 27, 2007
7268088 Formation of low leakage thermally assisted radical nitrided dielectrics Sep. 11, 2007
7265061 Method and apparatus for UV exposure of low dielectric constant materials for porogen removal and improved mechanical properties Sep. 4, 2007
7176145 Manufacturing method of semiconductor device Feb. 13, 2007
7157331 Ultraviolet blocking layer Jan. 2, 2007
7138607 Determining method of thermal processing condition Nov. 21, 2006
7022628 Method for forming quantum dots using metal thin film or metal powder Apr. 4, 2006
6991999 Bi-layer silicon film and method of fabrication Jan. 31, 2006
6977223 Three dimensional microfabrication Dec. 20, 2005
6949476 Method of creating shielded structures to protect semiconductor devices Sep. 27, 2005
6893982 Method for forming a thin film, methods for forming a gate electrode and transistor using the same, and a gate electrode manufactured using the same May. 17, 2005
6872972 Method for forming silicon film with changing grain size by thermal process Mar. 29, 2005
6867151 Mask for sequential lateral solidification and crystallization method using thereof Mar. 15, 2005
6818485 Thin film transistor, thin film transistor array substrate, liquid crystal display device, and electroluminescent display device Nov. 16, 2004
6780789 Laser thermal oxidation to form ultra-thin gate oxide Aug. 24, 2004
6774061 Nanocrystalline silicon quantum dots within an oxide layer Aug. 10, 2004
6770570 Method of forming a semiconductor device with a substantially uniform density low-k dielectric layer Aug. 3, 2004
6767773 Method of Production of a thin film type semiconductor device having a heat-retaining layer Jul. 27, 2004
6767799 Laser beam irradiation method Jul. 27, 2004
6756319 Silica microstructure and fabrication method thereof Jun. 29, 2004
6696369 Method of creating shielded structures to protect semiconductor devices Feb. 24, 2004
6660570 Method of fabricating a high voltage semiconductor device using SIPOS Dec. 9, 2003
6649032 System and method for sputtering silicon films using hydrogen gas mixtures Nov. 18, 2003
6624921 Micromirror device package fabrication method Sep. 23, 2003
6624089 Wafer planarization using a uniform layer of material and method and apparatus for forming uniform layer of material used in semiconductor processing Sep. 23, 2003
6566277 Liquid-phase growth method, liquid-phase growth apparatus, and solar cell May. 20, 2003
6566219 Method of forming a self aligned trench in a semiconductor using a patterned sacrificial layer for defining the trench opening May. 20, 2003
6492240 Method for forming improved high resistance resistor by treating the surface of polysilicon layer Dec. 10, 2002
6486045 Apparatus and method for forming deposited film Nov. 26, 2002
6451694 Control of abnormal growth in dichloro silane (DCS) based CVD polycide WSix films Sep. 17, 2002
6403445 Enhanced trench isolation structure Jun. 11, 2002
6287987 Method and apparatus for deposition of porous silica dielectrics Sep. 11, 2001
6277741 Method and planarizing polysilicon layer Aug. 21, 2001

1 2 3

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