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Class Information
Number: 438/762
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate > Multiple layers > At least one layer formed by reaction with substrate
Description: Processes wherein at least one of the layers is formed by reacting an external agent with a constituent of the substrate to form a compound thereof.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618891 |
Method for forming self-aligned metal silicide contacts |
Nov. 17, 2009 |
| 7611928 |
Method for producing a substrate |
Nov. 3, 2009 |
| 7605086 |
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
Oct. 20, 2009 |
| 7598159 |
Method of fabricating thin film transistor substrate and thin film transistor substrate produced using the same |
Oct. 6, 2009 |
| 7592267 |
Method for manufacturing semiconductor silicon substrate and apparatus for manufacturing the same |
Sep. 22, 2009 |
| 7575991 |
Removing a high-k gate dielectric |
Aug. 18, 2009 |
| 7576016 |
Process for manufacturing semiconductor device |
Aug. 18, 2009 |
| 7569494 |
Apparatus and method for deposition of thin films |
Aug. 4, 2009 |
| 7566667 |
Methods of fabricating a semiconductor device having a barrier metal layer and devices formed thereby |
Jul. 28, 2009 |
| 7560352 |
Selective deposition |
Jul. 14, 2009 |
| 7557004 |
Method for fabricating semiconductor device |
Jul. 7, 2009 |
| 7553775 |
Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles |
Jun. 30, 2009 |
| 7553704 |
Antifuse element and method of manufacture |
Jun. 30, 2009 |
| 7531467 |
Manufacturing method of semiconductor device and substrate processing apparatus |
May. 12, 2009 |
| 7514038 |
Sensor substrate and method of fabricating same |
Apr. 7, 2009 |
| 7501351 |
Relaxed SiGe platform for high speed CMOS electronics and high speed analog circuits |
Mar. 10, 2009 |
| 7449385 |
Gate dielectric and method |
Nov. 11, 2008 |
| 7416994 |
Atomic layer deposition systems and methods including metal beta-diketiminate compounds |
Aug. 26, 2008 |
| 7405120 |
Method of forming a gate insulator and thin film transistor incorporating the same |
Jul. 29, 2008 |
| 7393785 |
Methods and apparatus for forming rhodium-containing layers |
Jul. 1, 2008 |
| 7384880 |
Method for making a semiconductor device having a high-k gate dielectric |
Jun. 10, 2008 |
| 7344913 |
Spin on memory cell active layer doped with metal ions |
Mar. 18, 2008 |
| 7338826 |
Silicon nitride passivation with ammonia plasma pretreatment for improving reliability of AlGaN/GaN HEMTs |
Mar. 4, 2008 |
| 7335606 |
Silicide formed from ternary metal alloy films |
Feb. 26, 2008 |
| 7312156 |
Method and apparatus for supporting a semiconductor wafer during processing |
Dec. 25, 2007 |
| 7312163 |
Atomic layer deposition methods, and methods of forming materials over semiconductor substrates |
Dec. 25, 2007 |
| 7304002 |
Method of oxidizing member to be treated |
Dec. 4, 2007 |
| 7291566 |
Barrier layer for a processing element and a method of forming the same |
Nov. 6, 2007 |
| 7279432 |
System and method for forming an integrated barrier layer |
Oct. 9, 2007 |
| 7271077 |
Deposition methods with time spaced and time abutting precursor pulses |
Sep. 18, 2007 |
| 7238612 |
Methods of forming a double metal salicide layer and methods of fabricating semiconductor devices incorporating the same |
Jul. 3, 2007 |
| 7205217 |
Method for forming trench gate dielectric layer |
Apr. 17, 2007 |
| 7176094 |
Ultra-thin gate oxide through post decoupled plasma nitridation anneal |
Feb. 13, 2007 |
| 7172967 |
Methods for forming cobalt layers including introducing vaporized cobalt precursors and methods for manufacturing semiconductor devices using the same |
Feb. 6, 2007 |
| 7172935 |
Method of forming multiple gate insulators on a strained semiconductor heterostructure |
Feb. 6, 2007 |
| 7160802 |
Adhesion of tungsten nitride films to a silicon surface |
Jan. 9, 2007 |
| 7157331 |
Ultraviolet blocking layer |
Jan. 2, 2007 |
| 7157383 |
Method for forming silicon dioxide film on silicon substrate, method for forming oxide film on semiconductor substrate, and method for producing semiconductor device |
Jan. 2, 2007 |
| 7125811 |
Oxidation method for semiconductor process |
Oct. 24, 2006 |
| 7118968 |
Method for manufacturing interpoly dielectric |
Oct. 10, 2006 |
| 7091138 |
Forming method and a forming apparatus of nanocrystalline silicon structure |
Aug. 15, 2006 |
| 7056381 |
Fabrication method of semiconductor device |
Jun. 6, 2006 |
| 7052997 |
Method to form etch and/or CMP stop layers |
May. 30, 2006 |
| 7045470 |
Methods of making thin dielectric layers on substrates |
May. 16, 2006 |
| 7033956 |
Semiconductor memory devices and methods for making the same |
Apr. 25, 2006 |
| 7008845 |
Method and composite for decreasing charge leakage |
Mar. 7, 2006 |
| 6992018 |
Chemical fluid deposition for the formation of metal and metal alloy films on patterned and unpatterned substrates |
Jan. 31, 2006 |
| 6992020 |
Method of fabricating semiconductor device |
Jan. 31, 2006 |
| 6987073 |
Low selectivity deposition methods |
Jan. 17, 2006 |
| 6984873 |
Method of forming a stacked device filler |
Jan. 10, 2006 |
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