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Class Information
Number: 438/758
Name: Semiconductor device manufacturing: process > Coating of substrate containing semiconductor region or of semiconductor substrate
Description: Processes for forming or applying a coating on a semiconductor substrate, and wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, B, of the Class 438 definition above.


Sub-classes under this class:

Class Number Class Name Patents
438/765 By reaction with substrate 179
438/759 Combined with the removal of material by nonchemical means 219
438/764 Formation of semi-insulative polycrystalline silicon 113
438/778 Insulative material deposited upon semiconductive substrate 1,189
438/761 Multiple layers 537
438/760 Utilizing reflow (e.g., planarization, etc.) 260


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18

Patent Number Title Of Patent Date Issued
7622396 Method of producing a semiconductor device Nov. 24, 2009
7618902 Plasma treatment of a semiconductor surface for enhanced nucleation of a metal-containing layer Nov. 17, 2009
7615498 Method of manufacturing a semiconductor device Nov. 10, 2009
7615479 Assembly comprising functional block deposited therein Nov. 10, 2009
7615500 Method for depositing film and method for manufacturing semiconductor device Nov. 10, 2009
7615501 Method for making a thin film layer Nov. 10, 2009
7608549 Method of forming non-conformal layers Oct. 27, 2009
7604832 Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus Oct. 20, 2009
7598182 Anti-reflective coating forming composition containing polyamic acid Oct. 6, 2009
7591937 Method of fixing macro-objects to an electricity conducting- or semi-conducting surface by means of electrografting, surfaces thus obtained and applications thereof Sep. 22, 2009
7592254 Methods for coating and filling high aspect ratio recessed features Sep. 22, 2009
7588799 Metal film production apparatus Sep. 15, 2009
7588995 Method to create damage-free porous low-k dielectric films and structures resulting therefrom Sep. 15, 2009
7585783 Drop discharge apparatus, method for forming pattern and method for manufacturing semiconductor device Sep. 8, 2009
7585784 System and method for reducing etch sequencing induced downstream dielectric defects in high volume semiconducting manufacturing Sep. 8, 2009
7582571 Substrate processing method and recording medium Sep. 1, 2009
7582585 Coating compositions Sep. 1, 2009
7582555 CVD flowable gap fill Sep. 1, 2009
7576012 Atomic layer deposition methods Aug. 18, 2009
7576016 Process for manufacturing semiconductor device Aug. 18, 2009
7572686 System for thin film deposition utilizing compensating forces Aug. 11, 2009
7572739 Tape removal in semiconductor structure fabrication Aug. 11, 2009
7569913 Boron etch-stop layer and methods related thereto Aug. 4, 2009
7563725 Method of depositing materials on a non-planar surface Jul. 21, 2009
7560392 Electrical components for microelectronic devices and methods of forming the same Jul. 14, 2009
7560393 Systems and methods of forming refractory metal nitride layers using disilazanes Jul. 14, 2009
7557047 Method of forming a layer of material using an atomic layer deposition process Jul. 7, 2009
7550336 Method for fabricating an NMOS transistor Jun. 23, 2009
7547643 Techniques promoting adhesion of porous low K film to underlying barrier layer Jun. 16, 2009
7547644 Methods and apparatus for forming barrier layers in high aspect ratio vias Jun. 16, 2009
7547645 Method for coating a structure comprising semiconductor chips Jun. 16, 2009
7541226 Manufacturing process of thin film transistor Jun. 2, 2009
7541297 Method and system for improving dielectric film quality for void free gap fill Jun. 2, 2009
7538043 Phase change memory device and fabrication method thereof May. 26, 2009
7534467 Reduced-pressure drying unit and coating film forming method May. 19, 2009
7534729 Modification of semiconductor surfaces in a liquid May. 19, 2009
7531452 Strained metal silicon nitride films and method of forming May. 12, 2009
7531891 Semiconductor device May. 12, 2009
7524750 Integrated process modulation (IPM) a novel solution for gapfill with HDP-CVD Apr. 28, 2009
7521376 Method of forming a semiconductor structure using a non-oxygen chalcogen passivation treatment Apr. 21, 2009
7521379 Deposition and densification process for titanium nitride barrier layers Apr. 21, 2009
7517771 Method for manufacturing semiconductor device having trench Apr. 14, 2009
7514277 Etching method and apparatus Apr. 7, 2009
7514371 Semiconductor substrate surface protection method Apr. 7, 2009
7514370 Compressive nitride film and method of manufacturing thereof Apr. 7, 2009
7507675 Device manufacturing method and device Mar. 24, 2009
7507676 Film formation method and apparatus for semiconductor process Mar. 24, 2009
7504344 Method of forming a carbon polymer film using plasma CVD Mar. 17, 2009
7501315 Methods and devices for forming nanostructure monolayers and devices including such monolayers Mar. 10, 2009
7501350 Plasma processing method Mar. 10, 2009

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