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Class Information
Number: 438/757
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon nitride
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and nitrogen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5795830 |
Reducing pitch with continuously adjustable line and space dimensions |
Aug. 18, 1998 |
| 5731235 |
Methods of forming a silicon nitrite film, a capacitor dielectric layer and a capacitor |
Mar. 24, 1998 |
| 5723384 |
Method for manufacturing a capacitor in a semiconductor device using selective tungsten nitride thin film |
Mar. 3, 1998 |
| 5639342 |
Method of monitoring and controlling a silicon nitride etch step |
Jun. 17, 1997 |
| 5597737 |
Method for testing and burning-in a semiconductor wafer |
Jan. 28, 1997 |
| 5501767 |
Method for gettering noble metals from mineral acid solution |
Mar. 26, 1996 |
| 5472562 |
Method of etching silicon nitride |
Dec. 5, 1995 |
| 5470421 |
Method for purification of etching solution |
Nov. 28, 1995 |
| 5413678 |
Heated SC1 solution for selective etching |
May. 9, 1995 |
| 5310457 |
Method of integrated circuit fabrication including selective etching of silicon and silicon compounds |
May. 10, 1994 |
| 5188701 |
Method of fabricating semiconductor device |
Feb. 23, 1993 |
| 4978421 |
Monolithic silicon membrane device fabrication process |
Dec. 18, 1990 |
| 4940509 |
Isotropic etchant for capped silicide processes |
Jul. 10, 1990 |
| 4863556 |
Method for transferring superfine photoresist structures |
Sep. 5, 1989 |
| 4269654 |
Silicon nitride and silicon oxide etchant |
May. 26, 1981 |
| 3979241 |
Method of etching films of silicon nitride and silicon dioxide |
Sep. 7, 1976 |
| 3979238 |
Etchant for silicon nitride and borosilicate glasses and method of using the etchant |
Sep. 7, 1976 |
| 3971683 |
Method of etching materials containing silicon |
Jul. 27, 1976 |
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