| |
 |
|
Class Information
Number: 438/757
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon nitride
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and nitrogen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6579807 |
Method for forming isolation regions on semiconductor device |
Jun. 17, 2003 |
| 6576151 |
Etching of silicon nitride by anhydrous halogen gas |
Jun. 10, 2003 |
| 6562727 |
Methods and compositions for removal of anti-reflective layers using fluorine containing compounds, oxidants, and water |
May. 13, 2003 |
| 6554002 |
Method for removing etching residues |
Apr. 29, 2003 |
| 6541382 |
Lining and corner rounding method for shallow trench isolation |
Apr. 1, 2003 |
| 6521540 |
Method for making self-aligned contacts to source/drain without a hard mask layer |
Feb. 18, 2003 |
| 6498079 |
Method for selective source diffusion |
Dec. 24, 2002 |
| 6498105 |
Method of forming fine patterns of a semiconductor device |
Dec. 24, 2002 |
| 6497827 |
Method for etching dielectric films |
Dec. 24, 2002 |
| 6495472 |
Method for avoiding erosion of conductor structure during removing etching residues |
Dec. 17, 2002 |
| 6492273 |
Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies |
Dec. 10, 2002 |
| 6489251 |
Method of forming a slope lateral structure |
Dec. 3, 2002 |
| 6479397 |
Method for forming isolation regions on semiconductor device |
Nov. 12, 2002 |
| 6479380 |
Semiconductor device and manufacturing method thereof |
Nov. 12, 2002 |
| 6475403 |
Etching method and apparatus |
Nov. 5, 2002 |
| 6472271 |
Planarization method of memory unit of flash memory |
Oct. 29, 2002 |
| 6468910 |
Slurry for chemical mechanical polishing silicon dioxide |
Oct. 22, 2002 |
| 6455433 |
Method for forming square-shouldered sidewall spacers and devices fabricated |
Sep. 24, 2002 |
| 6444588 |
Anti-reflective coatings and methods regarding same |
Sep. 3, 2002 |
| 6440872 |
Method for hybrid DRAM cell utilizing confined strap isolation |
Aug. 27, 2002 |
| 6436833 |
Method for pre-STI-CMP planarization using poly-si thermal oxidation |
Aug. 20, 2002 |
| 6436791 |
Method of manufacturing a very deep STI (shallow trench isolation) |
Aug. 20, 2002 |
| 6432836 |
Cleaning method for semiconductor substrate and cleaning solution |
Aug. 13, 2002 |
| 6429132 |
Combination CMP-etch method for forming a thin planar layer over the surface of a device |
Aug. 6, 2002 |
| 6423618 |
Method of manufacturing trench gate structure |
Jul. 23, 2002 |
| 6407005 |
Method for forming semiconductor device to prevent electric field concentration from being generated at corner of active region |
Jun. 18, 2002 |
| 6403484 |
Method to achieve STI planarization |
Jun. 11, 2002 |
| 6403496 |
Method for forming shallow trench isolations |
Jun. 11, 2002 |
| 6403492 |
Method of manufacturing semiconductor devices with trench isolation |
Jun. 11, 2002 |
| 6391793 |
Compositions for etching silicon with high selectivity to oxides and methods of using same |
May. 21, 2002 |
| 6368982 |
Pattern reduction by trimming a plurality of layers of different handmask materials |
Apr. 9, 2002 |
| 6352939 |
Method for improving the electrical properties of a gate oxide |
Mar. 5, 2002 |
| 6348419 |
Modification of the wet characteristics of deposited layers and in-line control |
Feb. 19, 2002 |
| 6340625 |
Method for simultaneously forming thinner and thicker parts of a dual oxide layer having varying thicknesses |
Jan. 22, 2002 |
| 6337292 |
Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
Jan. 8, 2002 |
| 6326313 |
Method and apparatus for partial drain during a nitride strip process step |
Dec. 4, 2001 |
| 6323138 |
Capacitor, methods of forming capacitors, methods for forming silicon nitride layers on silicon-comprising substrates, and methods of densifying silicon nitride layers |
Nov. 27, 2001 |
| 6323139 |
Semiconductor processing methods of forming photoresist over silicon nitride materials |
Nov. 27, 2001 |
| 6319839 |
Approach to form an inter-polysilicon oxide (IPO) layer for charge coupled devices |
Nov. 20, 2001 |
| 6303514 |
Composition and method for selectively etching a silicon nitride film |
Oct. 16, 2001 |
| 6300253 |
Semiconductor processing methods of forming photoresist over silicon nitride materials, and semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
Oct. 9, 2001 |
| 6287936 |
Method of forming porous silicon in a silicon substrate, in particular for improving the performance of an inductive circuit |
Sep. 11, 2001 |
| 6287983 |
Selective nitride etching with silicate ion pre-loading |
Sep. 11, 2001 |
| 6281130 |
Method for developing ultra-thin resist films |
Aug. 28, 2001 |
| 6277757 |
Methods to modify wet by dry etched via profile |
Aug. 21, 2001 |
| 6277725 |
Method for fabricating passivation layer on metal pad |
Aug. 21, 2001 |
| 6277755 |
Method for fabricating an interconnect |
Aug. 21, 2001 |
| 6271143 |
Method for preventing trench fill erosion |
Aug. 7, 2001 |
| 6268295 |
Method of manufacturing semiconductor device |
Jul. 31, 2001 |
| 6265304 |
Controlling an etching process of multiple layers based upon thickness ratio of the dielectric layers |
Jul. 24, 2001 |
|
|
|
