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Class Information
Number: 438/757
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon nitride
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and nitrogen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7361571 |
Method for fabricating a trench isolation with spacers |
Apr. 22, 2008 |
| 7358595 |
Method for manufacturing MOS transistor |
Apr. 15, 2008 |
| 7338910 |
Method of fabricating semiconductor devices and method of removing a spacer |
Mar. 4, 2008 |
| 7323413 |
Method for stripping silicon nitride |
Jan. 29, 2008 |
| 7316970 |
Method for forming high selectivity protection layer on semiconductor device |
Jan. 8, 2008 |
| 7297639 |
Methods for etching doped oxides in the manufacture of microfeature devices |
Nov. 20, 2007 |
| 7265026 |
Method of forming a shallow trench isolation structure in a semiconductor device |
Sep. 4, 2007 |
| 7238295 |
Regeneration process of etching solution, etching process, and etching system |
Jul. 3, 2007 |
| 7235494 |
CMP cleaning composition with microbial inhibitor |
Jun. 26, 2007 |
| 7220630 |
Method for selectively forming strained etch stop layers to improve FET charge carrier mobility |
May. 22, 2007 |
| 7205245 |
Method of forming trench isolation within a semiconductor substrate |
Apr. 17, 2007 |
| 7196013 |
Capping layer for a semiconductor device and a method of fabrication |
Mar. 27, 2007 |
| 7192883 |
Method of manufacturing semiconductor device |
Mar. 20, 2007 |
| 7189628 |
Fabrication of trenches with multiple depths on the same substrate |
Mar. 13, 2007 |
| 7186662 |
Method for forming a hard mask for gate electrode patterning and corresponding device |
Mar. 6, 2007 |
| 7183226 |
Method of forming a trench for use in manufacturing a semiconductor device |
Feb. 27, 2007 |
| 7176142 |
Method of manufacturing trench structure for device |
Feb. 13, 2007 |
| 7163834 |
CMOS image sensor and method of fabricating the same |
Jan. 16, 2007 |
| 7160815 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations |
Jan. 9, 2007 |
| 7160816 |
Method for fabricating semiconductor device |
Jan. 9, 2007 |
| 7151058 |
Etchant for etching nitride and method for removing a nitride layer using the same |
Dec. 19, 2006 |
| 7148158 |
Semiconductor device and method for manufacturing the same |
Dec. 12, 2006 |
| 7125770 |
Gate Structure in flash memory cell and method of forming the same, and method of forming dielectric film |
Oct. 24, 2006 |
| 7119006 |
Via formation for damascene metal conductors in an integrated circuit |
Oct. 10, 2006 |
| 7115526 |
Method for wet etching of high k thin film at low temperature |
Oct. 3, 2006 |
| 7115491 |
Method for forming self-aligned contact in semiconductor device |
Oct. 3, 2006 |
| 7074725 |
Method for forming a storage node of a capacitor |
Jul. 11, 2006 |
| 7067425 |
Method of manufacturing flash memory device |
Jun. 27, 2006 |
| 7057263 |
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
Jun. 6, 2006 |
| 7045468 |
Isolated junction structure and method of manufacture |
May. 16, 2006 |
| 7041603 |
Method for producing magnetic memory device |
May. 9, 2006 |
| 7029937 |
Semiconductor device and method of manufacturing the same, circuit board, and electronic instrument |
Apr. 18, 2006 |
| 7030020 |
Method to shrink cell size in a split gate flash |
Apr. 18, 2006 |
| 7030034 |
Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum |
Apr. 18, 2006 |
| 7005380 |
Simultaneous formation of device and backside contacts on wafers having a buried insulator layer |
Feb. 28, 2006 |
| 6987064 |
Method and composition to improve a nitride/oxide wet etching selectivity |
Jan. 17, 2006 |
| 6967130 |
Method of forming dual gate insulator layers for CMOS applications |
Nov. 22, 2005 |
| 6964929 |
Method of forming a narrow gate, and product produced thereby |
Nov. 15, 2005 |
| 6964926 |
Method of forming geometric deep trench capacitors |
Nov. 15, 2005 |
| 6960529 |
Methods for sidewall protection of metal interconnect for unlanded vias using physical vapor deposition |
Nov. 1, 2005 |
| 6955995 |
Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates |
Oct. 18, 2005 |
| 6951825 |
Method of etching a SiN/Ir/TaN or SiN/Ir/Ti stack using an aluminum hard mask |
Oct. 4, 2005 |
| 6943092 |
Methods of manufacturing semiconductor devices |
Sep. 13, 2005 |
| 6924221 |
Integrated process flow to improve copper filling in a damascene structure |
Aug. 2, 2005 |
| 6924196 |
Anti-reflective coating and process using an anti-reflective coating |
Aug. 2, 2005 |
| 6914010 |
Plasma etching method |
Jul. 5, 2005 |
| 6911372 |
Method of fabricating storage capacitor in semiconductor memory device, and storage capacitor structure |
Jun. 28, 2005 |
| 6908852 |
Method of forming an arc layer for a semiconductor device |
Jun. 21, 2005 |
| 6902980 |
Method of fabricating a high performance MOSFET device featuring formation of an elevated source/drain region |
Jun. 7, 2005 |
| 6887796 |
Method of wet etching a silicon and nitrogen containing material |
May. 3, 2005 |
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