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Class Information
Number: 438/757
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon nitride
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and nitrogen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7629257 |
Combined etching and doping substances |
Dec. 8, 2009 |
| 7622393 |
Method and apparatus for manufacturing a semiconductor device, control program thereof and computer-readable storage medium storing the control program |
Nov. 24, 2009 |
| 7591959 |
Etchants and etchant systems with plural etch selectivities |
Sep. 22, 2009 |
| 7566666 |
Composition for removing an insulation material and related methods |
Jul. 28, 2009 |
| 7550396 |
Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device |
Jun. 23, 2009 |
| 7544621 |
Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method |
Jun. 9, 2009 |
| 7528078 |
Process of forming electronic device including a densified nitride layer adjacent to an opening within a semiconductor layer |
May. 5, 2009 |
| 7517809 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations |
Apr. 14, 2009 |
| 7514282 |
Patterned silicon submicron tubes |
Apr. 7, 2009 |
| 7482278 |
Key-hole free process for high aspect ratio gap filling with reentrant spacer |
Jan. 27, 2009 |
| 7468105 |
CMP cleaning composition with microbial inhibitor |
Dec. 23, 2008 |
| 7468325 |
Method of cleaning silicon nitride layer |
Dec. 23, 2008 |
| 7442598 |
Method of forming an interlayer dielectric |
Oct. 28, 2008 |
| 7435683 |
Apparatus and method for selectively recessing spacers on multi-gate devices |
Oct. 14, 2008 |
| 7432215 |
Semiconductor device manufacturing method and semiconductor manufacturing apparatus |
Oct. 7, 2008 |
| 7422936 |
Facilitating removal of sacrificial layers via implantation to form replacement metal gates |
Sep. 9, 2008 |
| 7402513 |
Method for forming interlayer insulation film |
Jul. 22, 2008 |
| 7384799 |
Method to avoid amorphous-si damage during wet stripping processes in the manufacture of MEMS devices |
Jun. 10, 2008 |
| 7382515 |
Silicon-rich silicon nitrides as etch stops in MEMS manufacture |
Jun. 3, 2008 |
| 7375028 |
Method for manufacturing a semiconductor device |
May. 20, 2008 |
| 7361571 |
Method for fabricating a trench isolation with spacers |
Apr. 22, 2008 |
| 7358595 |
Method for manufacturing MOS transistor |
Apr. 15, 2008 |
| 7338910 |
Method of fabricating semiconductor devices and method of removing a spacer |
Mar. 4, 2008 |
| 7323413 |
Method for stripping silicon nitride |
Jan. 29, 2008 |
| 7316970 |
Method for forming high selectivity protection layer on semiconductor device |
Jan. 8, 2008 |
| 7297639 |
Methods for etching doped oxides in the manufacture of microfeature devices |
Nov. 20, 2007 |
| 7265026 |
Method of forming a shallow trench isolation structure in a semiconductor device |
Sep. 4, 2007 |
| 7238295 |
Regeneration process of etching solution, etching process, and etching system |
Jul. 3, 2007 |
| 7235494 |
CMP cleaning composition with microbial inhibitor |
Jun. 26, 2007 |
| 7220630 |
Method for selectively forming strained etch stop layers to improve FET charge carrier mobility |
May. 22, 2007 |
| 7205245 |
Method of forming trench isolation within a semiconductor substrate |
Apr. 17, 2007 |
| 7196013 |
Capping layer for a semiconductor device and a method of fabrication |
Mar. 27, 2007 |
| 7192883 |
Method of manufacturing semiconductor device |
Mar. 20, 2007 |
| 7189628 |
Fabrication of trenches with multiple depths on the same substrate |
Mar. 13, 2007 |
| 7186662 |
Method for forming a hard mask for gate electrode patterning and corresponding device |
Mar. 6, 2007 |
| 7183226 |
Method of forming a trench for use in manufacturing a semiconductor device |
Feb. 27, 2007 |
| 7176142 |
Method of manufacturing trench structure for device |
Feb. 13, 2007 |
| 7163834 |
CMOS image sensor and method of fabricating the same |
Jan. 16, 2007 |
| 7160816 |
Method for fabricating semiconductor device |
Jan. 9, 2007 |
| 7160815 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations |
Jan. 9, 2007 |
| 7151058 |
Etchant for etching nitride and method for removing a nitride layer using the same |
Dec. 19, 2006 |
| 7148158 |
Semiconductor device and method for manufacturing the same |
Dec. 12, 2006 |
| 7125770 |
Gate Structure in flash memory cell and method of forming the same, and method of forming dielectric film |
Oct. 24, 2006 |
| 7119006 |
Via formation for damascene metal conductors in an integrated circuit |
Oct. 10, 2006 |
| 7115526 |
Method for wet etching of high k thin film at low temperature |
Oct. 3, 2006 |
| 7115491 |
Method for forming self-aligned contact in semiconductor device |
Oct. 3, 2006 |
| 7074725 |
Method for forming a storage node of a capacitor |
Jul. 11, 2006 |
| 7067425 |
Method of manufacturing flash memory device |
Jun. 27, 2006 |
| 7057263 |
Semiconductor wafer assemblies comprising photoresist over silicon nitride materials |
Jun. 6, 2006 |
| 7045468 |
Isolated junction structure and method of manufacture |
May. 16, 2006 |
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