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Class Information
Number: 438/757
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon nitride
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and nitrogen.










Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8709886 Compound semiconductor device and manufacturing method therefor Apr. 29, 2014
8703005 Methods for removing dielectric materials Apr. 22, 2014
8642479 Method for forming openings in semiconductor device Feb. 4, 2014
8623231 Method for etching an ultra thin film Jan. 7, 2014
8580133 Methods of controlling the etching of silicon nitride relative to silicon dioxide Nov. 12, 2013
8513086 Methods for etching doped oxides in the manufacture of microfeature devices Aug. 20, 2013
8476165 Method for thinning a bonding wafer Jul. 2, 2013
8470717 Method of forming current tracks on semiconductors Jun. 25, 2013
8455367 Method of manufacturing nitride substrate for semiconductors Jun. 4, 2013
8435903 Semiconductor substrate surface treatment method May. 7, 2013
8409997 Apparatus and method for controlling silicon nitride etching tank Apr. 2, 2013
8372299 Substrate treating apparatus and substrate treating method Feb. 12, 2013
8283260 Process for restoring dielectric properties Oct. 9, 2012
8221642 Methods for removing dielectric materials Jul. 17, 2012
8222153 Textured single crystal Jul. 17, 2012
8216434 MEMS vascular sensor Jul. 10, 2012
8188447 Field-by-field laser annealing and feed forward process control May. 29, 2012
8187487 Material removal methods employing solutions with reversible ETCH selectivities May. 29, 2012
8183163 Etching liquid, etching method, and method of manufacturing electronic component May. 22, 2012
8173532 Semiconductor transistors having reduced distances between gate electrode regions May. 8, 2012
8148175 Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device Apr. 3, 2012
8143172 Printable etching media for silicon dioxide and silicon nitride layers Mar. 27, 2012
8105851 Nitride film wet stripping Jan. 31, 2012
8043921 Nitride removal while protecting semiconductor surfaces for forming shallow junctions Oct. 25, 2011
8043974 Semiconductor wet etchant and method of forming interconnection structure using the same Oct. 25, 2011
8012877 Backside nitride removal to reduce streak defects Sep. 6, 2011
7998876 Method of producing semiconductor element Aug. 16, 2011
7981743 Method of fabricating a memory cell Jul. 19, 2011
7977251 High selectivity BPSG to TEOS etchant Jul. 12, 2011
7977228 Methods for the formation of interconnects separated by air gaps Jul. 12, 2011
7947606 Methods of forming conductive features and structures thereof May. 24, 2011
7943440 Fabrication method of thin film device May. 17, 2011
7939451 Method for fabricating a pattern May. 10, 2011
7902082 Method of forming field effect transistors using diluted hydrofluoric acid to remove sacrificial nitride spacers Mar. 8, 2011
7897501 Method of fabricating a field-effect transistor having robust sidewall spacers Mar. 1, 2011
7888270 Etching method for nitride semiconductor Feb. 15, 2011
7803673 Method of manufacturing a thin film transistor substrate Sep. 28, 2010
7781342 Substrate treatment method for etching a base film using a resist pattern Aug. 24, 2010
7718084 Etchants for selectively removing dielectric materials May. 18, 2010
7709393 Method for manufacturing semiconductor device May. 4, 2010
7662672 Manufacturing process of leadframe-based BGA packages Feb. 16, 2010
7655562 Method of manufacturing semiconductor memory device Feb. 2, 2010
7648915 Methods of forming semiconductor constructions, and methods of recessing materials within openings Jan. 19, 2010
7635397 Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device Dec. 22, 2009
7629257 Combined etching and doping substances Dec. 8, 2009
7622393 Method and apparatus for manufacturing a semiconductor device, control program thereof and computer-readable storage medium storing the control program Nov. 24, 2009
7591959 Etchants and etchant systems with plural etch selectivities Sep. 22, 2009
7566666 Composition for removing an insulation material and related methods Jul. 28, 2009
7550396 Method for reducing resist poisoning during patterning of silicon nitride layers in a semiconductor device Jun. 23, 2009
7544621 Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method Jun. 9, 2009

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