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Class Information
Number: 438/756
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon oxide
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and oxygen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 4752505 |
Pre-metal deposition cleaning for bipolar semiconductors |
Jun. 21, 1988 |
| 4721548 |
Semiconductor planarization process |
Jan. 26, 1988 |
| 4698132 |
Method of forming tapered contact openings |
Oct. 6, 1987 |
| 4652334 |
Method for patterning silicon dioxide with high resolution in three dimensions |
Mar. 24, 1987 |
| 4596627 |
Etching a layer over a semiconductor |
Jun. 24, 1986 |
| 4585513 |
Method for removing glass support from semiconductor device |
Apr. 29, 1986 |
| 4543707 |
Method of forming through holes by differential etching of stacked silicon oxynitride layers |
Oct. 1, 1985 |
| 4536251 |
Method for eliminating laser-induced substrate fissures associated with crystallized silicon areas |
Aug. 20, 1985 |
| 4508591 |
Polymethyl methacrylate compatible silicon dioxide complexing agent |
Apr. 2, 1985 |
| 4454004 |
Utilizing controlled illumination for creating or removing a conductive layer from a SiO.sub.2 insulator over a PN junction bearing semiconductor |
Jun. 12, 1984 |
| 4395304 |
Selective etching of phosphosilicate glass |
Jul. 26, 1983 |
| 4363868 |
Process of producing semiconductor devices by forming a silicon oxynitride layer by a plasma CVD technique which is employed in a selective oxidation process |
Dec. 14, 1982 |
| 4313773 |
Method for removing borosilicate and boron rich oxides from a silicon body prior to doping silicon bodies with a SiB.sub.6 solid source |
Feb. 2, 1982 |
| 4269654 |
Silicon nitride and silicon oxide etchant |
May. 26, 1981 |
| 4230523 |
Etchant for silicon dioxide films disposed atop silicon or metallic silicides |
Oct. 28, 1980 |
| 4125427 |
Method of processing a semiconductor |
Nov. 14, 1978 |
| 4119483 |
Method of structuring thin layers |
Oct. 10, 1978 |
| 4052253 |
Semiconductor-oxide etchant |
Oct. 4, 1977 |
| 3979238 |
Etchant for silicon nitride and borosilicate glasses and method of using the etchant |
Sep. 7, 1976 |
| 3979241 |
Method of etching films of silicon nitride and silicon dioxide |
Sep. 7, 1976 |
| 3971683 |
Method of etching materials containing silicon |
Jul. 27, 1976 |
| 3960623 |
Membrane mask for selective semiconductor etching |
Jun. 1, 1976 |
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