Chemical etching > Liquid phase etching > Silicon oxide > Patents

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Class Information
Number: 438/756
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon oxide
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and oxygen.

Patents under this class:

1 2 3 4 5 6 7 8 9

Patent Number	Title Of Patent	Date Issued
6271143	Method for preventing trench fill erosion	Aug. 7, 2001
6261952	Method of forming copper interconnects with reduced in-line diffusion	Jul. 17, 2001
6261969	Method of manufacturing semiconductor apparatus and apparatus thereof	Jul. 17, 2001
6255219	Method for fabricating high-performance submicron MOSFET with lateral asymmetric channel	Jul. 3, 2001
6254796	Selective etching of silicate	Jul. 3, 2001
6245682	Removal of SiON ARC film after poly photo and etch	Jun. 12, 2001
6240933	Methods for cleaning semiconductor surfaces	Jun. 5, 2001
6242331	Method to reduce device contact resistance using a hydrogen peroxide treatment	Jun. 5, 2001
6238580	Method of HF vapor release of microstructures	May. 29, 2001
6238590	Tribochemical polishing of ceramics and metals	May. 29, 2001
6235638	Simplified etching technique for producing multiple undercut profiles	May. 22, 2001
6232240	Method for fabricating a capacitor	May. 15, 2001
6228770	Method to form self-sealing air gaps between metal interconnects	May. 8, 2001
6221785	Method for forming shallow trench isolations	Apr. 24, 2001
6218305	Composition and method for polishing a composite of silica and silicon nitride	Apr. 17, 2001
6218268	Two-step borophosphosilicate glass deposition process and related devices and apparatus	Apr. 17, 2001
6211057	Method for manufacturing arch air gap in multilevel interconnection	Apr. 3, 2001
6207517	Method of fabricating a semiconductor insulation layer and a semiconductor component containing the semiconductor insulation layer	Mar. 27, 2001
6200909	Method for selective etching of antireflective coatings	Mar. 13, 2001
6200897	Method for manufacturing even dielectric layer	Mar. 13, 2001
6197700	Fabrication method for bottom electrode of capacitor	Mar. 6, 2001
6194320	Method for preparing a semiconductor device	Feb. 27, 2001
6192899	Etch residue clean with aqueous HF/organic solution	Feb. 27, 2001
6191037	Methods, apparatuses and substrate assembly structures for fabricating microelectronic components using mechanical and chemical-mechanical planarization processes	Feb. 20, 2001
6191047	Etching process using a buffer layer	Feb. 20, 2001
6187216	Method for etching a dielectric layer over a semiconductor substrate	Feb. 13, 2001
6184153	Semiconductor material produced by improved etch process which protects metal	Feb. 6, 2001
6174820	Use of silicon oxynitride as a sacrificial material for microelectromechanical devices	Jan. 16, 2001
6174814	Method for producing a crack stop for interlevel dielectric layers	Jan. 16, 2001
6171968	Method of forming damascene structure having borderless via design	Jan. 9, 2001
6171975	Wet-chemical treatment method, treatment method of semiconductor substrate, and manufacturing method of semiconductor device	Jan. 9, 2001
6165867	Method to reduce aspect ratio of DRAM peripheral contact	Dec. 26, 2000
6162739	Process for wet etching of semiconductor wafers	Dec. 19, 2000
6162370	Composition and method for selectively etching a silicon nitride film	Dec. 19, 2000
6153526	Method to remove residue in wolfram CMP	Nov. 28, 2000
6150227	Integrated circuit structure with a gap between resistor film and substrate	Nov. 21, 2000
6146937	Method of forming a DRAM device utilizing a sacrificial doped oxide layer	Nov. 14, 2000
6140203	Capacitor constructions and semiconductor processing method of forming capacitor constructions	Oct. 31, 2000
6140242	Method of forming an isolation trench in a semiconductor device including annealing at an increased temperature	Oct. 31, 2000
6140244	Method for forming a spacer	Oct. 31, 2000
6140254	Edge bead removal for nanoporous dielectric silica coatings	Oct. 31, 2000
6124181	Method for manufacturing bipolar transistor capable of suppressing deterioration of transistor characteristics	Sep. 26, 2000
6123088	Method and cleaner composition for stripping copper containing residue layers	Sep. 26, 2000
6117350	Adjustable selectivity etching solutions and methods of etching semiconductor devices using the same	Sep. 12, 2000
6117351	Method for etching dielectric films	Sep. 12, 2000
6117790	Method for fabricating a capacitor for a semiconductor memory configuration	Sep. 12, 2000
6117796	Removal of silicon oxide	Sep. 12, 2000
6107201	Aluminum spiking inspection method	Aug. 22, 2000
6103627	Treatment of a surface having an exposed silicon/silica interface	Aug. 15, 2000
6103637	Method for selective etching of antireflective coatings	Aug. 15, 2000