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Class Information
Number: 438/756
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon oxide
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and oxygen.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
8703005 Methods for removing dielectric materials Apr. 22, 2014
8685836 Method for forming a silicon layer on any substrate using light irradiation Apr. 1, 2014
8658532 Method and material for forming a double exposure lithography pattern Feb. 25, 2014
8658543 Methods for pFET fabrication using APM solutions Feb. 25, 2014
8623231 Method for etching an ultra thin film Jan. 7, 2014
8618000 Selective wet etching of hafnium aluminum oxide films Dec. 31, 2013
8580127 Method of manufacturing RFID based thermal bubble type accelerometer Nov. 12, 2013
8580133 Methods of controlling the etching of silicon nitride relative to silicon dioxide Nov. 12, 2013
8530264 Methods for manufacturing arrays for CMOS imagers Sep. 10, 2013
8512587 Highly selective doped oxide etchant Aug. 20, 2013
8513140 Post-dry etching cleaning liquid composition and process for fabricating semiconductor device Aug. 20, 2013
8507298 Patterned implant of a dielectric layer Aug. 13, 2013
8476165 Method for thinning a bonding wafer Jul. 2, 2013
8475666 Method for making toughening agent materials Jul. 2, 2013
8470717 Method of forming current tracks on semiconductors Jun. 25, 2013
8465662 Composition for wet etching of silicon dioxide Jun. 18, 2013
8465660 Fabrication process of a microfabricated blazed grating Jun. 18, 2013
8461057 Process for the rough-etching of silicon solar cells Jun. 11, 2013
8450772 Phase change RAM device and method for manufacturing the same May. 28, 2013
8435903 Semiconductor substrate surface treatment method May. 7, 2013
8426319 Composition for etching a metal hard mask material in semiconductor processing Apr. 23, 2013
8415255 Pore sealing and cleaning porous low dielectric constant structures Apr. 9, 2013
8409997 Apparatus and method for controlling silicon nitride etching tank Apr. 2, 2013
8394668 Oxide thin film, methods of manufacturing oxide thin film and electronic devices including oxide thin film Mar. 12, 2013
8372299 Substrate treating apparatus and substrate treating method Feb. 12, 2013
8372752 Method for fabricating ultra-fine nanowire Feb. 12, 2013
8324114 Method and apparatus for silicon oxide residue removal Dec. 4, 2012
8318606 Dielectric etching Nov. 27, 2012
8309472 Method of rapid thermal treatment using high energy electromagnetic radiation of a semiconductor substrate for formation of epitaxial materials Nov. 13, 2012
8310053 Method of manufacturing a device with a cavity Nov. 13, 2012
8283260 Process for restoring dielectric properties Oct. 9, 2012
8273262 Method for etching glass substrate Sep. 25, 2012
8258056 Method and material for forming a double exposure lithography pattern Sep. 4, 2012
8236694 Method for manufacturing micromechanical components Aug. 7, 2012
8222149 Method for photoresist pattern removal Jul. 17, 2012
8221642 Methods for removing dielectric materials Jul. 17, 2012
8222153 Textured single crystal Jul. 17, 2012
8198198 Method for forming electrode pattern of ceramic substrate Jun. 12, 2012
8193069 Stacked structure and production method thereof Jun. 5, 2012
8187487 Material removal methods employing solutions with reversible ETCH selectivities May. 29, 2012
8153019 Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices Apr. 10, 2012
8148272 Application of millisecond heating source for surface treatment Apr. 3, 2012
8129242 Method of manufacturing a memory device Mar. 6, 2012
8129287 Method for manufacturing semiconductor device and semiconductor device Mar. 6, 2012
8123966 Piezoelectric electronic component, process for producing the same, and communication apparatus Feb. 28, 2012
8124545 Methods of etching oxide, reducing roughness, and forming capacitor constructions Feb. 28, 2012
8119537 Selective etching of oxides to metal nitrides and metal oxides Feb. 21, 2012
8105948 Use of CMP to contact a MTJ structure without forming a via Jan. 31, 2012
8048726 SOI semiconductor device with reduced topography above a substrate window area Nov. 1, 2011
8043974 Semiconductor wet etchant and method of forming interconnection structure using the same Oct. 25, 2011

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