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Class Information
Number: 438/756
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon oxide
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and oxygen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7371695 |
Use of TEOS oxides in integrated circuit fabrication processes |
May. 13, 2008 |
| 7368395 |
Method for fabricating a nano-imprinting mold |
May. 6, 2008 |
| 7364666 |
Flexible circuits and method of making same |
Apr. 29, 2008 |
| 7358196 |
Wet chemical treatment to form a thin oxide for high k gate dielectrics |
Apr. 15, 2008 |
| 7338610 |
Etching method for manufacturing semiconductor device |
Mar. 4, 2008 |
| 7329616 |
Substrate processing apparatus and substrate processing method |
Feb. 12, 2008 |
| 7312159 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Dec. 25, 2007 |
| 7312161 |
Advanced process control for low variation treatment in immersion processing |
Dec. 25, 2007 |
| 7307026 |
Method of forming an epitaxial layer for raised drain and source regions by removing contaminations |
Dec. 11, 2007 |
| 7297639 |
Methods for etching doped oxides in the manufacture of microfeature devices |
Nov. 20, 2007 |
| 7294577 |
Method of manufacturing a silicide layer |
Nov. 13, 2007 |
| 7259100 |
Nanoparticles and method for making the same |
Aug. 21, 2007 |
| 7259078 |
Method for forming isolation layer in semiconductor memory device |
Aug. 21, 2007 |
| 7255801 |
Deep submicron CMOS compatible suspending inductor |
Aug. 14, 2007 |
| 7253114 |
Self-aligned method for defining a semiconductor gate oxide in high voltage device area |
Aug. 7, 2007 |
| 7238620 |
System and method for providing a uniform oxide layer over a laser trimmed fuse with a differential wet etch stop technique |
Jul. 3, 2007 |
| 7235494 |
CMP cleaning composition with microbial inhibitor |
Jun. 26, 2007 |
| 7235495 |
Controlled growth of highly uniform, oxide layers, especially ultrathin layers |
Jun. 26, 2007 |
| 7226871 |
Method for forming a silicon oxynitride layer |
Jun. 5, 2007 |
| 7196013 |
Capping layer for a semiconductor device and a method of fabrication |
Mar. 27, 2007 |
| 7192860 |
Highly selective silicon oxide etching compositions |
Mar. 20, 2007 |
| 7192883 |
Method of manufacturing semiconductor device |
Mar. 20, 2007 |
| 7189628 |
Fabrication of trenches with multiple depths on the same substrate |
Mar. 13, 2007 |
| 7189623 |
Semiconductor processing method and field effect transistor |
Mar. 13, 2007 |
| 7186657 |
Method for patterning HfO2-containing dielectric |
Mar. 6, 2007 |
| 7186649 |
Submicron semiconductor device and a fabricating method thereof |
Mar. 6, 2007 |
| 7183226 |
Method of forming a trench for use in manufacturing a semiconductor device |
Feb. 27, 2007 |
| 7176142 |
Method of manufacturing trench structure for device |
Feb. 13, 2007 |
| 7172971 |
Semiconductor device having a contact window including a lower with a wider to provide a lower contact resistance |
Feb. 6, 2007 |
| 7160816 |
Method for fabricating semiconductor device |
Jan. 9, 2007 |
| 7160815 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations |
Jan. 9, 2007 |
| 7153729 |
Crystalline semiconductor thin film, method of fabricating the same, semiconductor device, and method of fabricating the same |
Dec. 26, 2006 |
| 7138314 |
Method of manufacturing flash memory device |
Nov. 21, 2006 |
| 7132370 |
Method for selective removal of high-k material |
Nov. 7, 2006 |
| 7129184 |
Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch |
Oct. 31, 2006 |
| 7119006 |
Via formation for damascene metal conductors in an integrated circuit |
Oct. 10, 2006 |
| 7119029 |
Method of oxidizing a silicon substrate and method of forming an oxide layer using the same |
Oct. 10, 2006 |
| 7119027 |
Method for manufacturing display device that includes supplying solution to the underside of a glass substrate |
Oct. 10, 2006 |
| 7115526 |
Method for wet etching of high k thin film at low temperature |
Oct. 3, 2006 |
| 7098099 |
Semiconductor device having optimized shallow junction geometries and method for fabrication thereof |
Aug. 29, 2006 |
| 7094131 |
Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material |
Aug. 22, 2006 |
| 7084073 |
Method of forming a via hole through a glass wafer |
Aug. 1, 2006 |
| 7084072 |
Method of manufacturing semiconductor device |
Aug. 1, 2006 |
| 7081417 |
Manufacturing method for electronic device and multiple layer circuits thereof |
Jul. 25, 2006 |
| 7074725 |
Method for forming a storage node of a capacitor |
Jul. 11, 2006 |
| 7067390 |
Method for forming isolation layer of semiconductor device |
Jun. 27, 2006 |
| 7067425 |
Method of manufacturing flash memory device |
Jun. 27, 2006 |
| 7060631 |
Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates |
Jun. 13, 2006 |
| 7056836 |
Manufacturing method for a semiconductor device |
Jun. 6, 2006 |
| 7052617 |
Simplified etching technique for producing multiple undercut profiles |
May. 30, 2006 |
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