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Class Information
Number: 438/756
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon oxide
Description: Processes wherein the material undergoing wet chemical etching is a compound of silicon and oxygen.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7611958 |
Method of making a semiconductor element |
Nov. 3, 2009 |
| 7611995 |
Method for removing silicon oxide film and processing apparatus |
Nov. 3, 2009 |
| 7591959 |
Etchants and etchant systems with plural etch selectivities |
Sep. 22, 2009 |
| 7566666 |
Composition for removing an insulation material and related methods |
Jul. 28, 2009 |
| 7541293 |
Method for manufacturing semiconductor device |
Jun. 2, 2009 |
| 7540968 |
Micro movable device and method of making the same using wet etching |
Jun. 2, 2009 |
| 7541286 |
Method for manufacturing semiconductor device using KrF light source |
Jun. 2, 2009 |
| 7528076 |
Method for manufacturing gate oxide layer with different thicknesses |
May. 5, 2009 |
| 7524729 |
Method of manufacturing a semiconductor integrated circuit device having a trench |
Apr. 28, 2009 |
| 7521373 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Apr. 21, 2009 |
| 7517809 |
Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations |
Apr. 14, 2009 |
| 7517811 |
Method for fabricating a floating gate of flash rom |
Apr. 14, 2009 |
| 7514282 |
Patterned silicon submicron tubes |
Apr. 7, 2009 |
| 7514366 |
Methods for forming shallow trench isolation |
Apr. 7, 2009 |
| 7501300 |
Manufacturing method of semiconductor integrated circuit device |
Mar. 10, 2009 |
| 7479461 |
Method of etching silicon anisotropically |
Jan. 20, 2009 |
| 7473607 |
Method of manufacturing a multi-workfunction gates for a CMOS circuit |
Jan. 6, 2009 |
| 7468105 |
CMP cleaning composition with microbial inhibitor |
Dec. 23, 2008 |
| 7462544 |
Methods for fabricating transistors having trench gates |
Dec. 9, 2008 |
| 7449417 |
Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same |
Nov. 11, 2008 |
| 7446046 |
Selective polish for fabricating electronic devices |
Nov. 4, 2008 |
| 7442319 |
Poly etch without separate oxide decap |
Oct. 28, 2008 |
| 7439087 |
Semiconductor device and manufacturing method thereof |
Oct. 21, 2008 |
| 7439190 |
Fabrication method of semiconductor device |
Oct. 21, 2008 |
| 7435683 |
Apparatus and method for selectively recessing spacers on multi-gate devices |
Oct. 14, 2008 |
| 7435644 |
Method of manufacturing capacitor of semiconductor device |
Oct. 14, 2008 |
| 7431853 |
Selective etching of oxides from substrates |
Oct. 7, 2008 |
| 7432214 |
Compositions for dissolution of low-k dielectric film, and methods of use |
Oct. 7, 2008 |
| 7410865 |
Method for fabricating capacitor of semiconductor device |
Aug. 12, 2008 |
| 7410901 |
Submicron device fabrication |
Aug. 12, 2008 |
| 7375028 |
Method for manufacturing a semiconductor device |
May. 20, 2008 |
| 7371695 |
Use of TEOS oxides in integrated circuit fabrication processes |
May. 13, 2008 |
| 7368395 |
Method for fabricating a nano-imprinting mold |
May. 6, 2008 |
| 7364666 |
Flexible circuits and method of making same |
Apr. 29, 2008 |
| 7358196 |
Wet chemical treatment to form a thin oxide for high k gate dielectrics |
Apr. 15, 2008 |
| 7338610 |
Etching method for manufacturing semiconductor device |
Mar. 4, 2008 |
| 7329616 |
Substrate processing apparatus and substrate processing method |
Feb. 12, 2008 |
| 7312161 |
Advanced process control for low variation treatment in immersion processing |
Dec. 25, 2007 |
| 7312159 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Dec. 25, 2007 |
| 7307026 |
Method of forming an epitaxial layer for raised drain and source regions by removing contaminations |
Dec. 11, 2007 |
| 7297639 |
Methods for etching doped oxides in the manufacture of microfeature devices |
Nov. 20, 2007 |
| 7294577 |
Method of manufacturing a silicide layer |
Nov. 13, 2007 |
| 7259100 |
Nanoparticles and method for making the same |
Aug. 21, 2007 |
| 7259078 |
Method for forming isolation layer in semiconductor memory device |
Aug. 21, 2007 |
| 7255801 |
Deep submicron CMOS compatible suspending inductor |
Aug. 14, 2007 |
| 7253114 |
Self-aligned method for defining a semiconductor gate oxide in high voltage device area |
Aug. 7, 2007 |
| 7238620 |
System and method for providing a uniform oxide layer over a laser trimmed fuse with a differential wet etch stop technique |
Jul. 3, 2007 |
| 7235494 |
CMP cleaning composition with microbial inhibitor |
Jun. 26, 2007 |
| 7235495 |
Controlled growth of highly uniform, oxide layers, especially ultrathin layers |
Jun. 26, 2007 |
| 7226871 |
Method for forming a silicon oxynitride layer |
Jun. 5, 2007 |
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