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Class Information
Number: 438/753
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon
Description: Processes wherein the material undergoing wet chemical etching is silicon (Si).


Patents under this class:
1 2 3 4 5 6 7 8 9

Patent Number Title Of Patent Date Issued
5968849 Method for pre-shaping a semiconductor substrate for polishing and structure Oct. 19, 1999
5954888 Post-CMP wet-HF cleaning station Sep. 21, 1999
5953595 Method of manufacturing thin film transistor Sep. 14, 1999
5942449 Method for removing an upper layer of material from a semiconductor wafer Aug. 24, 1999
5939336 Aqueous solutions of ammonium fluoride in propylene glycol and their use in the removal of etch residues from silicon substrates Aug. 17, 1999
5939741 Methods of forming integrated circuitry and integrated circuitry structures Aug. 17, 1999
5928969 Method for controlled selective polysilicon etching Jul. 27, 1999
5930650 Method of etching silicon materials Jul. 27, 1999
5926705 Method for manufacturing a semiconductor device with stabilization of a bipolar transistor and a schottky barrier diode Jul. 20, 1999
5916824 Etching method of silicon wafer surface and etching apparatus of the same Jun. 29, 1999
5913980 Method for removing complex oxide film growth on silicon crystal Jun. 22, 1999
5914183 Porous semiconductor material Jun. 22, 1999
5914281 Apparatus for etching wafer Jun. 22, 1999
5906951 Strained Si/SiGe layers on insulator May. 25, 1999
5904156 Dry film resist removal in the presence of electroplated C4's May. 18, 1999
5904572 Wet etching station and a wet etching method adapted for utilizing the same May. 18, 1999
5899743 Method for fabricating semiconductor wafers May. 4, 1999
5899750 Fine processing method May. 4, 1999
5891354 Methods of etching through wafers and substrates with a composite etch stop layer Apr. 6, 1999
5888761 Etching method for forming air bridge pattern on silicon substrate Mar. 30, 1999
5883012 Method of etching a trench into a semiconductor substrate Mar. 16, 1999
5879572 Method of protecting silicon wafers during wet chemical etching Mar. 9, 1999
5869385 Selectively oxidized field oxide region Feb. 9, 1999
5869399 Method for increasing utilizable surface of rugged polysilicon layer in semiconductor device Feb. 9, 1999
5868862 Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media Feb. 9, 1999
5868856 Method for removing inorganic contamination by chemical derivitization and extraction Feb. 9, 1999
5854133 Method for manufacturing a semiconductor device Dec. 29, 1998
5849624 Method of fabricating a bottom electrode with rounded corners for an integrated memory cell capacitor Dec. 15, 1998
5830777 Method of manufacturing a capacitance type acceleration sensor Nov. 3, 1998
5827784 Method for improving contact openings during the manufacture of an integrated circuit Oct. 27, 1998
5824596 POCl.sub.3 process flow for doping polysilicon without forming oxide pillars or gate oxide shorts Oct. 20, 1998
5804516 Wet processing tank equipped with rapid drain and rinse system Sep. 8, 1998
5804090 Process for etching semiconductors using a hydrazine and metal hydroxide-containing etching solution Sep. 8, 1998
5801103 Etching process which protects metal Sep. 1, 1998
5767020 Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution Jun. 16, 1998
5728259 Process for fabricating thin-film semiconductor device without plasma induced damage Mar. 17, 1998
5693181 Method of making transducer chips with grooves on the wafer for easy separation of the chips Dec. 2, 1997
5670411 Process of making semiconductor-on-insulator substrate Sep. 23, 1997
5630905 Method of fabricating quantum bridges by selective etching of superlattice structures May. 20, 1997
5587046 Process for treating semiconductor material with an acid-containing fluid Dec. 24, 1996
5573680 Method for etching a semiconductor material without altering flow pattern defect distribution Nov. 12, 1996
5565060 Methods and compositions for the selective etching of silicon Oct. 15, 1996
5534112 Method for testing electrical properties of silicon single crystal Jul. 9, 1996
5518966 Method for wet etching polysilicon May. 21, 1996
5516730 Pre-thermal treatment cleaning process of wafers May. 14, 1996
5494862 Method of making semiconductor wafers Feb. 27, 1996
5484748 Method for storage of silicon wafer Jan. 16, 1996
5468344 Method for manufacturing semiconductor devices Nov. 21, 1995
5468338 Methods for selectively wet etching substrates Nov. 21, 1995
5462639 Method of treating particles Oct. 31, 1995

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