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Class Information
Number: 438/753
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Silicon
Description: Processes wherein the material undergoing wet chemical etching is silicon (Si).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6468914 |
Method of forming gate electrode in semiconductor device |
Oct. 22, 2002 |
| 6461967 |
Material removal method for forming a structure |
Oct. 8, 2002 |
| 6458711 |
Self-aligned silicide process |
Oct. 1, 2002 |
| 6458494 |
Etching method |
Oct. 1, 2002 |
| 6451218 |
Method for the wet chemical pyramidal texture etching of silicon surfaces |
Sep. 17, 2002 |
| 6446641 |
Method of manufacturing semiconductor device, and semiconductor device manufactured thereby |
Sep. 10, 2002 |
| 6444590 |
Semiconductor processing methods, methods of forming hemispherical grain polysilicon, methods of forming capacitors, and methods of forming wordlines |
Sep. 3, 2002 |
| 6444589 |
Method and apparatus for etching silicon |
Sep. 3, 2002 |
| 6440872 |
Method for hybrid DRAM cell utilizing confined strap isolation |
Aug. 27, 2002 |
| 6436839 |
Increasing programming silicide process window by forming native oxide film on amourphous Si after metal etching |
Aug. 20, 2002 |
| 6429144 |
Integrated circuit manufacture method with aqueous hydrogen fluoride and nitric acid oxide etch |
Aug. 6, 2002 |
| 6428718 |
Selective back side wet etch |
Aug. 6, 2002 |
| 6423646 |
Method for removing etch-induced polymer film and damaged silicon layer from a silicon surface |
Jul. 23, 2002 |
| 6423618 |
Method of manufacturing trench gate structure |
Jul. 23, 2002 |
| 6423641 |
Method of making self-aligned bit-lines |
Jul. 23, 2002 |
| 6420275 |
System and method for analyzing a semiconductor surface |
Jul. 16, 2002 |
| 6410436 |
Method of cleaning porous body, and process for producing porous body, non-porous film or bonded substrate |
Jun. 25, 2002 |
| 6407005 |
Method for forming semiconductor device to prevent electric field concentration from being generated at corner of active region |
Jun. 18, 2002 |
| 6399499 |
Method for fabricating an electrode of a plasma chamber |
Jun. 4, 2002 |
| 6399517 |
Etching method and etching apparatus |
Jun. 4, 2002 |
| 6399502 |
Process for fabricating a planar heterostructure |
Jun. 4, 2002 |
| 6399504 |
Methods and etchants for etching oxides of silicon with low selectivity |
Jun. 4, 2002 |
| 6395622 |
Manufacturing process of semiconductor devices |
May. 28, 2002 |
| 6395645 |
Anisotropic wet etching |
May. 28, 2002 |
| 6395646 |
Machine for etching the edge of a wafer and method of etching the edge of a wafer |
May. 28, 2002 |
| 6395638 |
Method for producing a micromembrane pump body |
May. 28, 2002 |
| 6391793 |
Compositions for etching silicon with high selectivity to oxides and methods of using same |
May. 21, 2002 |
| 6387815 |
Method of manufacturing semiconductor substrate |
May. 14, 2002 |
| 6383937 |
Method of fabricating a silicon island |
May. 7, 2002 |
| 6380097 |
Method for obtaining a sulfur-passivated semiconductor surface |
Apr. 30, 2002 |
| 6380099 |
Porous region removing method and semiconductor substrate manufacturing method |
Apr. 30, 2002 |
| 6376380 |
Method of forming memory circuitry and method of forming memory circuitry comprising a buried bit line array of memory cells |
Apr. 23, 2002 |
| 6372656 |
Method of producing a radiation sensor |
Apr. 16, 2002 |
| 6372081 |
Process to prevent copper contamination of semiconductor fabs |
Apr. 16, 2002 |
| 6368934 |
Semiconductor memory device and method of manufacturing the same |
Apr. 9, 2002 |
| 6368982 |
Pattern reduction by trimming a plurality of layers of different handmask materials |
Apr. 9, 2002 |
| 6358860 |
Line width calibration standard manufacturing and certifying method |
Mar. 19, 2002 |
| 6358360 |
Precision polishing apparatus for polishing a semiconductor substrate |
Mar. 19, 2002 |
| 6358861 |
Manufacturing method of silicon device |
Mar. 19, 2002 |
| 6354309 |
Process for treating a semiconductor substrate |
Mar. 12, 2002 |
| 6352932 |
Methods of forming integrated circuitry and integrated circuitry structures |
Mar. 5, 2002 |
| 6350702 |
Fabrication process of semiconductor substrate |
Feb. 26, 2002 |
| 6348419 |
Modification of the wet characteristics of deposited layers and in-line control |
Feb. 19, 2002 |
| 6346485 |
Semiconductor wafer processing method and semiconductor wafers produced by the same |
Feb. 12, 2002 |
| 6344417 |
Method for micro-mechanical structures |
Feb. 5, 2002 |
| 6344418 |
Methods of forming hemispherical grain polysilicon |
Feb. 5, 2002 |
| 6340640 |
Solar cell, a method of producing the same and a semiconductor producing apparatus |
Jan. 22, 2002 |
| 6337287 |
High speed, high bandwidth, high density nonvolatile memory system |
Jan. 8, 2002 |
| 6337292 |
Method of forming silicon oxide layer and method of manufacturing thin film transistor thereby |
Jan. 8, 2002 |
| 6331487 |
Removal of polishing residue from substrate using supercritical fluid process |
Dec. 18, 2001 |
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