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Class Information
Number: 438/752
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Germanium
Description: Processes wherein the material undergoing wet chemical etching is germanium (Ge).


Patents under this class:
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Patent Number Title Of Patent Date Issued
6709912 Dual Si-Ge polysilicon gate with different Ge concentrations for CMOS device optimization Mar. 23, 2004
6699763 Disposable spacer technology for reduced cost CMOS processing Mar. 2, 2004
6677192 Method of fabricating a relaxed silicon germanium platform having planarizing for high speed CMOS electronics and high speed analog circuits Jan. 13, 2004
6653211 Semiconductor substrate, SOI substrate and manufacturing method therefor Nov. 25, 2003
6645831 Thermally stable crystalline defect-free germanium bonded to silicon and silicon dioxide Nov. 11, 2003
6620665 Method for fabricating semiconductor device Sep. 16, 2003
6613679 Method for fabricating a semiconductor device Sep. 2, 2003
6605548 Process for etching gallium nitride compound based semiconductors Aug. 12, 2003
6599803 Method for fabricating semiconductor device Jul. 29, 2003
6599840 Material removal method for forming a structure Jul. 29, 2003
6590236 Semiconductor structure for use with high-frequency signals Jul. 8, 2003
6562728 Surface treatment method of germanium-containing semiconductor substrate that includes immersion of the substrate in chemical solutions to remove foreign matter May. 13, 2003
6551936 Method of etching patterns into epitaxial material Apr. 22, 2003
6545323 Semiconductor memory device including a pair of MOS transistors forming a detection circuit Apr. 8, 2003
6537894 Process for fabricating a substrate of the silicon-on-insulator or silicon-on-nothing type and resulting device Mar. 25, 2003
6531405 Process for producing a light-emitting and/or a light-receiving semiconductor body Mar. 11, 2003
6518197 Method for manufacturing semiconductor device Feb. 11, 2003
6514875 Chemical method for producing smooth surfaces on silicon wafers Feb. 4, 2003
6482751 Titanium dioxide layer serving as a mask and its removed method Nov. 19, 2002
6458662 Method of fabricating a semiconductor device having an asymmetrical dual-gate silicon-germanium (SiGe) channel MOSFET and a device thereby formed Oct. 1, 2002
6440766 Microfabrication using germanium-based release masks Aug. 27, 2002
6399502 Process for fabricating a planar heterostructure Jun. 4, 2002
6383917 Method for making integrated circuits May. 7, 2002
6290859 Tungsten coating for improved wear resistance and reliability of microelectromechanical devices Sep. 18, 2001
6284672 Method of forming a super-shallow amorphous layer in silicon Sep. 4, 2001
6261964 Material removal method for forming a structure Jul. 17, 2001
6217228 Fiber channel drive adapter Apr. 17, 2001
6207555 Electron beam process during dual damascene processing Mar. 27, 2001
6153514 Self-aligned dual damascene arrangement for metal interconnection with low k dielectric constant materials and nitride middle etch stop layer Nov. 28, 2000
6143655 Methods and structures for silver interconnections in integrated circuits Nov. 7, 2000
6140248 Process for producing a semiconductor device with a roughened semiconductor surface Oct. 31, 2000
6121126 Methods and structures for metal interconnections in integrated circuits Sep. 19, 2000
6103624 Method of improving Cu damascene interconnect reliability by laser anneal before barrier polish Aug. 15, 2000
6093657 Fabrication process of semiconductor device Jul. 25, 2000
6087239 Disposable spacer and method of forming and using same Jul. 11, 2000
6051444 Method of manufacture of liquid crystal display device having characteristics which differ locally Apr. 18, 2000
6004881 Digital wet etching of semiconductor materials Dec. 21, 1999
5937272 Patterned organic layers in a full-color organic electroluminescent display array on a thin film transistor array substrate Aug. 10, 1999
5906951 Strained Si/SiGe layers on insulator May. 25, 1999
5895223 Method for etching nitride Apr. 20, 1999
5874365 Semiconductor wafer etching method Feb. 23, 1999
5731245 High aspect ratio low resistivity lines/vias with a tungsten-germanium alloy hard cap Mar. 24, 1998
5630905 Method of fabricating quantum bridges by selective etching of superlattice structures May. 20, 1997
5587046 Process for treating semiconductor material with an acid-containing fluid Dec. 24, 1996
5316618 Etching method for obtaining at least one cavity in a substrate May. 31, 1994
4971654 Process and apparatus for etching semiconductor surfaces Nov. 20, 1990
4855015 Dry etch process for selectively etching non-homogeneous material bilayers Aug. 8, 1989
4600934 Method of undercut anisotropic etching of semiconductor material Jul. 15, 1986
4252865 Highly solar-energy absorbing device and method of making the same Feb. 24, 1981
3966517 Manufacturing semiconductor devices in which silicon slices or germanium slices are etched and semiconductor devices thus manufactured Jun. 29, 1976

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