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Class Information
Number: 438/752
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Germanium
Description: Processes wherein the material undergoing wet chemical etching is germanium (Ge).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7361574 |
Single-crystal silicon-on-glass from film transfer |
Apr. 22, 2008 |
| 7303949 |
High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture |
Dec. 4, 2007 |
| 7241707 |
Layered films formed by controlled phase segregation |
Jul. 10, 2007 |
| 7238291 |
Method for removing oxides from a Ge semiconductor substrate surface |
Jul. 3, 2007 |
| 7238622 |
Wafer bonded virtual substrate and method for forming the same |
Jul. 3, 2007 |
| 7233054 |
Phase change material and non-volatile memory device using the same |
Jun. 19, 2007 |
| 7211521 |
Capping layer for crystallizing germanium, and substrate having thin crystallized germanium layer |
May. 1, 2007 |
| 7202121 |
Methods for preserving strained semiconductor substrate layers during CMOS processing |
Apr. 10, 2007 |
| 7199015 |
Rare earth-oxides, rare earth-nitrides, rare earth-phosphides and ternary alloys with silicon |
Apr. 3, 2007 |
| 7195934 |
Method and system for deposition tuning in an epitaxial film growth apparatus |
Mar. 27, 2007 |
| 7192884 |
Method for manufacturing semiconductor laser device |
Mar. 20, 2007 |
| 7176041 |
PAA-based etchant, methods of using same, and resultant structures |
Feb. 13, 2007 |
| 7172975 |
Process for the wet chemical treatment of semiconductor wafers |
Feb. 6, 2007 |
| 7163903 |
Method for making a semiconductor structure using silicon germanium |
Jan. 16, 2007 |
| 7153753 |
Strained Si/SiGe/SOI islands and processes of making same |
Dec. 26, 2006 |
| 7129184 |
Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch |
Oct. 31, 2006 |
| 7037854 |
Method for chemical-mechanical jet etching of semiconductor structures |
May. 2, 2006 |
| 7018909 |
Forming structures that include a relaxed or pseudo-relaxed layer on a substrate |
Mar. 28, 2006 |
| 7019339 |
Method of using a germanium layer transfer to Si for photovoltaic applications and heterostructure made thereby |
Mar. 28, 2006 |
| 6995054 |
Method of manufacturing a semiconductor device |
Feb. 7, 2006 |
| 6982229 |
Ion recoil implantation and enhanced carrier mobility in CMOS device |
Jan. 3, 2006 |
| 6982208 |
Method for producing high throughput strained-Si channel MOSFETS |
Jan. 3, 2006 |
| 6967175 |
Damascene gate semiconductor processing with local thinning of channel region |
Nov. 22, 2005 |
| 6960536 |
Method for producing integrated microsystems |
Nov. 1, 2005 |
| 6958286 |
Method of preventing surface roughening during hydrogen prebake of SiGe substrates |
Oct. 25, 2005 |
| 6951819 |
High efficiency, monolithic multijunction solar cells containing lattice-mismatched materials and methods of forming same |
Oct. 4, 2005 |
| 6946350 |
Controlled faceting of source/drain regions |
Sep. 20, 2005 |
| 6924200 |
Methods using disposable and permanent films for diffusion and implantation doping |
Aug. 2, 2005 |
| 6905976 |
Structure and method of forming a notched gate field effect transistor |
Jun. 14, 2005 |
| 6900143 |
Strained silicon MOSFETs having improved thermal dissipation |
May. 31, 2005 |
| 6878579 |
Semiconductor device and method of manufacturing the same |
Apr. 12, 2005 |
| 6862312 |
Quantum dot tunable external cavity laser (QD-TEC laser) |
Mar. 1, 2005 |
| 6861270 |
Method for manufacturing gallium nitride compound semiconductor and light emitting element |
Mar. 1, 2005 |
| 6831005 |
Electron beam process during damascene processing |
Dec. 14, 2004 |
| 6811448 |
Pre-cleaning for silicidation in an SMOS process |
Nov. 2, 2004 |
| 6812115 |
Method of filling an opening in a material layer with an insulating material |
Nov. 2, 2004 |
| 6812113 |
Process for achieving intermetallic and/or intrametallic air isolation in an integrated circuit, and integrated circuit obtained |
Nov. 2, 2004 |
| 6797641 |
Gate oxide stabilization by means of germanium components in gate conductor |
Sep. 28, 2004 |
| 6794306 |
Semiconductor device having gate all around type transistor and method of forming the same |
Sep. 21, 2004 |
| 6784035 |
Field effect transistor having source and/or drain forming Schottky or Schottky-like contact with strained semiconductor substrate |
Aug. 31, 2004 |
| 6767842 |
Implementation of Si-Ge HBT with CMOS process |
Jul. 27, 2004 |
| 6764953 |
Electronic device, and method of patterning a first layer |
Jul. 20, 2004 |
| 6746967 |
Etching metal using sonication |
Jun. 8, 2004 |
| 6740558 |
SiGe vertical gate contact for gate conductor post etch treatment |
May. 25, 2004 |
| 6727186 |
Method for lateral etching with holes for making semiconductor devices |
Apr. 27, 2004 |
| 6709912 |
Dual Si-Ge polysilicon gate with different Ge concentrations for CMOS device optimization |
Mar. 23, 2004 |
| 6709909 |
Semiconductor device and method of manufacturing the same |
Mar. 23, 2004 |
| 6699763 |
Disposable spacer technology for reduced cost CMOS processing |
Mar. 2, 2004 |
| 6677192 |
Method of fabricating a relaxed silicon germanium platform having planarizing for high speed CMOS electronics and high speed analog circuits |
Jan. 13, 2004 |
| 6653211 |
Semiconductor substrate, SOI substrate and manufacturing method therefor |
Nov. 25, 2003 |
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