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Class Information
Number: 438/750
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Sequential application of etchant > To same side of substrate
Description: Processes wherein the sequential liquid phase etching steps are carried out on the same major surface of the semiconductor substrate.










Sub-classes under this class:

Class Number Class Name Patents
438/751 Each etch step exposes surface of an adjacent layer 187


Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
4341010 Fabrication of electroluminescent semiconductor device utilizing selective etching and epitaxial deposition Jul. 27, 1982
4294651 Method of surface-treating semiconductor substrate Oct. 13, 1981
4276098 Batch processing of semiconductor devices Jun. 30, 1981
4243473 Method for detecting crystal defects in semiconductor silicon and detecting solution therefor Jan. 6, 1981
4240196 Fabrication of two-level polysilicon devices Dec. 23, 1980
4238275 Pyrocatechol-amine-water solution for the determination of defects Dec. 9, 1980
4131524 Manufacture of semiconductor devices Dec. 26, 1978
4028140 Semiconductor device manufacture Jun. 7, 1977
3994758 Method of manufacturing a semiconductor device having closely spaced electrodes by perpendicular projection Nov. 30, 1976
3969164 Native oxide technique for preparing clean substrate surfaces Jul. 13, 1976
3956042 Selective etchants for thin film devices May. 11, 1976

1 2 3 4 5 6 7










 
 
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