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Class Information
Number: 438/750
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Sequential application of etchant > To same side of substrate
Description: Processes wherein the sequential liquid phase etching steps are carried out on the same major surface of the semiconductor substrate.


Sub-classes under this class:

Class Number Class Name Patents
438/751 Each etch step exposes surface of an adjacent layer 143


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
6984535 Selective etching of a protective layer to form a catalyst layer for an electron-emitting device Jan. 10, 2006
6979653 Semiconductor fabrication methods and apparatus Dec. 27, 2005
6979655 Substrate processing method and substrate processing apparatus Dec. 27, 2005
6974756 Methods of forming shallow trench isolation Dec. 13, 2005
6969684 Method of making a planarized semiconductor structure Nov. 29, 2005
6955994 Method of manufacturing semiconductor device and method of manufacturing optical wave guide Oct. 18, 2005
6903022 Method of forming contact hole Jun. 7, 2005
6875705 Method of high selectivity wet etching of salicides Apr. 5, 2005
6867148 Removal of organic material in integrated circuit fabrication using ozonated organic acid solutions Mar. 15, 2005
6864177 Method for manufacturing metal line contact plug of semiconductor device Mar. 8, 2005
6864152 Fabrication of trenches with multiple depths on the same substrate Mar. 8, 2005
6861369 Method of forming silicidation blocking layer Mar. 1, 2005
6852643 Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer Feb. 8, 2005
6853076 Copper-containing C4 ball-limiting metallurgy stack for enhanced reliability of packaged structures and method of making same Feb. 8, 2005
6852641 Method of spiking mixed acid liquid in reactor Feb. 8, 2005
6849924 Wide band cross point switch using MEMS technology Feb. 1, 2005
6841452 Method of forming device isolation trench Jan. 11, 2005
6828228 Methods for fabricating residue-free contact openings Dec. 7, 2004
6825128 Method for manufacturing semiconductor device Nov. 30, 2004
6825127 Micro-fluidic devices Nov. 30, 2004
6821892 Intelligent wet etching tool as a function of chemical concentration, temperature and film loss Nov. 23, 2004
6821908 In-situ method for producing a hydrogen terminated hydrophobic surface on a silicon wafer Nov. 23, 2004
6812156 Method to reduce residual particulate contamination in CVD and PVD semiconductor wafer manufacturing Nov. 2, 2004
6809039 Method for forming a silicide layer Oct. 26, 2004
6802322 Method of fabricating a stringerless flash memory Oct. 12, 2004
6803323 Method of forming a component overlying a semiconductor substrate Oct. 12, 2004
6797632 Bonded wafer producing method and bonded wafer Sep. 28, 2004
6790785 Metal-assisted chemical etch porous silicon formation method Sep. 14, 2004
6783694 Composition for selectively etching against cobalt silicide Aug. 31, 2004
6783695 Acid blend for removing etch residue Aug. 31, 2004
6762134 Metal-assisted chemical etch to produce porous group III-V materials Jul. 13, 2004
6756317 Method for making a microstructure by surface micromachining Jun. 29, 2004
6750153 Process for producing macroscopic cavities beneath the surface of a silicon wafer Jun. 15, 2004
6723656 Method and apparatus for etching a semiconductor die Apr. 20, 2004
6706642 Method for fabricating semiconductor capacitors Mar. 16, 2004
6703314 Method for fabricating semiconductor device Mar. 9, 2004
6703320 Successful and easy method to remove polysilicon film Mar. 9, 2004
6692976 Post-etch cleaning treatment Feb. 17, 2004
6693044 Semiconductor device and method of manufacturing the same Feb. 17, 2004
6677249 Method for manufacturing breakaway layers for detaching deposited layer systems Jan. 13, 2004
6673723 Circuit board and a method for making the same Jan. 6, 2004
6670277 Method of manufacturing semiconductor device Dec. 30, 2003
6664195 Method for forming damascene metal gate Dec. 16, 2003
6660652 Method for fabricating semiconductor device Dec. 9, 2003
6656851 Method for forming isolation film Dec. 2, 2003
6620738 Etchant and method for fabricating a semiconductor device using the same Sep. 16, 2003
6617085 Wet etch reduction of gate widths Sep. 9, 2003
6610610 Methods for selective removal of material from wafer alignment marks Aug. 26, 2003
6602795 System and method for analyzing a semiconductor surface Aug. 5, 2003
6596640 Method of forming a raised contact for a substrate Jul. 22, 2003

1 2 3 4 5


 
 
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