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Class Information
Number: 438/750
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Sequential application of etchant > To same side of substrate
Description: Processes wherein the sequential liquid phase etching steps are carried out on the same major surface of the semiconductor substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7364666 |
Flexible circuits and method of making same |
Apr. 29, 2008 |
| 7354869 |
Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method |
Apr. 8, 2008 |
| 7354870 |
Process for chemical etching of parts fabricated by stereolithography |
Apr. 8, 2008 |
| 7344999 |
Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor device |
Mar. 18, 2008 |
| 7338908 |
Method for fabrication of semiconductor interconnect structure with reduced capacitance, leakage current, and improved breakdown voltage |
Mar. 4, 2008 |
| 7338911 |
Method for etching and for forming a contact hole using thereof |
Mar. 4, 2008 |
| 7332437 |
Method for processing semiconductor wafer and semiconductor wafer |
Feb. 19, 2008 |
| 7312159 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Dec. 25, 2007 |
| 7303933 |
Process of manufacturing a semiconductor device |
Dec. 4, 2007 |
| 7291282 |
Method of fabricating a mold for imprinting a structure |
Nov. 6, 2007 |
| 7291283 |
Combined wet etching method for stacked films and wet etching system used for same |
Nov. 6, 2007 |
| 7288207 |
Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same |
Oct. 30, 2007 |
| 7276452 |
Method for removing mottled etch in semiconductor fabricating process |
Oct. 2, 2007 |
| 7259103 |
Fabrication method of polycrystalline silicon TFT |
Aug. 21, 2007 |
| 7247576 |
Method of manufacturing a semiconductor device |
Jul. 24, 2007 |
| 7241699 |
Wide bandgap semiconductor device construction |
Jul. 10, 2007 |
| 7238621 |
Integrated optical MEMS devices |
Jul. 3, 2007 |
| 7208325 |
Refreshing wafers having low-k dielectric materials |
Apr. 24, 2007 |
| 7205245 |
Method of forming trench isolation within a semiconductor substrate |
Apr. 17, 2007 |
| 7196018 |
Semiconductor etching paste and the use thereof for localized etching of semiconductor substrates |
Mar. 27, 2007 |
| 7192886 |
Method for using additives in the caustic etching of silicon for obtaining improved surface characteristics |
Mar. 20, 2007 |
| 7189628 |
Fabrication of trenches with multiple depths on the same substrate |
Mar. 13, 2007 |
| 7183575 |
High reverse voltage silicon carbide diode and method of manufacturing the same high reverse voltage silicon carbide diode |
Feb. 27, 2007 |
| 7172977 |
Method for non-destructive removal of cured epoxy from wafer backside |
Feb. 6, 2007 |
| 7172975 |
Process for the wet chemical treatment of semiconductor wafers |
Feb. 6, 2007 |
| 7157381 |
Method for providing whisker-free aluminum metal lines or aluminum alloy lines in integrated circuits |
Jan. 2, 2007 |
| 7132370 |
Method for selective removal of high-k material |
Nov. 7, 2006 |
| 7129184 |
Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch |
Oct. 31, 2006 |
| 7129182 |
Method for etching a thin metal layer |
Oct. 31, 2006 |
| 7119026 |
Basic material for patterning and patterning method |
Oct. 10, 2006 |
| 7104267 |
Planarized copper cleaning for reduced defects |
Sep. 12, 2006 |
| 7091132 |
Ultrasonic assisted etch using corrosive liquids |
Aug. 15, 2006 |
| 7064069 |
Substrate thinning including planarization |
Jun. 20, 2006 |
| 7060630 |
Method of forming isolation film of semiconductor device |
Jun. 13, 2006 |
| 7052617 |
Simplified etching technique for producing multiple undercut profiles |
May. 30, 2006 |
| 7037849 |
Process for patterning high-k dielectric material |
May. 2, 2006 |
| 7037853 |
Wafer cleaning apparatus |
May. 2, 2006 |
| 7030034 |
Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum |
Apr. 18, 2006 |
| 7026255 |
Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride |
Apr. 11, 2006 |
| 7026254 |
Manufacture of masks and electronic parts |
Apr. 11, 2006 |
| 7022610 |
Wet cleaning method to eliminate copper corrosion |
Apr. 4, 2006 |
| 7018939 |
Micellar technology for post-etch residues |
Mar. 28, 2006 |
| 7018936 |
Ion implant lithography method of processing a semiconductor substrate |
Mar. 28, 2006 |
| 7001784 |
Method to control spacer width |
Feb. 21, 2006 |
| 6995095 |
Methods of simultaneously fabricating isolation structures having varying dimensions |
Feb. 7, 2006 |
| 6989334 |
Manufacturing method of a semiconductor device |
Jan. 24, 2006 |
| 6984535 |
Selective etching of a protective layer to form a catalyst layer for an electron-emitting device |
Jan. 10, 2006 |
| 6979655 |
Substrate processing method and substrate processing apparatus |
Dec. 27, 2005 |
| 6979653 |
Semiconductor fabrication methods and apparatus |
Dec. 27, 2005 |
| 6974756 |
Methods of forming shallow trench isolation |
Dec. 13, 2005 |
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