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Class Information
Number: 438/749
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Sequential application of etchant
Description: Processes wherein plural liquid phase etching steps are carried out on the semiconductor substrate in succession to one another.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7354869 |
Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method |
Apr. 8, 2008 |
| 7344999 |
Method for cleaning substrate having exposed silicon and silicon germanium layers and related method for fabricating semiconductor device |
Mar. 18, 2008 |
| 7323421 |
Silicon wafer etching process and composition |
Jan. 29, 2008 |
| 7319076 |
Low resistance T-shaped ridge structure |
Jan. 15, 2008 |
| 7303933 |
Process of manufacturing a semiconductor device |
Dec. 4, 2007 |
| 7291283 |
Combined wet etching method for stacked films and wet etching system used for same |
Nov. 6, 2007 |
| 7288206 |
High-purity alkali etching solution for silicon wafers and use thereof |
Oct. 30, 2007 |
| 7267127 |
Method for manufacturing electronic device |
Sep. 11, 2007 |
| 7256138 |
Method and composition for selectively etching against cobalt silicide |
Aug. 14, 2007 |
| 7205184 |
Method of crystallizing silicon film and method of manufacturing thin film transistor liquid crystal display |
Apr. 17, 2007 |
| 7205245 |
Method of forming trench isolation within a semiconductor substrate |
Apr. 17, 2007 |
| 7195927 |
Process for making magnetic memory structures having different-sized memory cell layers |
Mar. 27, 2007 |
| 7189628 |
Fabrication of trenches with multiple depths on the same substrate |
Mar. 13, 2007 |
| 7183226 |
Method of forming a trench for use in manufacturing a semiconductor device |
Feb. 27, 2007 |
| 7183575 |
High reverse voltage silicon carbide diode and method of manufacturing the same high reverse voltage silicon carbide diode |
Feb. 27, 2007 |
| 7172975 |
Process for the wet chemical treatment of semiconductor wafers |
Feb. 6, 2007 |
| 7160816 |
Method for fabricating semiconductor device |
Jan. 9, 2007 |
| 7148114 |
Process for patterning high-k dielectric material |
Dec. 12, 2006 |
| 7135414 |
Method for producing multicrystalline silicon substrate for solar cells |
Nov. 14, 2006 |
| 7119022 |
Manufacturing method of semiconductor device |
Oct. 10, 2006 |
| 7104267 |
Planarized copper cleaning for reduced defects |
Sep. 12, 2006 |
| 7105361 |
Method of etching a magnetic material |
Sep. 12, 2006 |
| 7037852 |
Composition for stripping photoresist and method of preparing the same |
May. 2, 2006 |
| 7029965 |
Semiconductor device and manufacturing method thereof |
Apr. 18, 2006 |
| 7030034 |
Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum |
Apr. 18, 2006 |
| 7015147 |
Fabrication of silicon-on-nothing (SON) MOSFET fabrication using selective etching of Si.sub.1-xGe.sub.x layer |
Mar. 21, 2006 |
| 7015134 |
Method for reducing anti-reflective coating layer removal during removal of photoresist |
Mar. 21, 2006 |
| 7005384 |
Chemical mechanical polishing method, and washing/rinsing method associated therewith |
Feb. 28, 2006 |
| 6992017 |
Process for cleaning silicon surface and fabrication of thin film transistor by the process |
Jan. 31, 2006 |
| 6991991 |
Method for preventing to form a spacer undercut in SEG pre-clean process |
Jan. 31, 2006 |
| 6955988 |
Method of forming a cavity and SOI in a semiconductor substrate |
Oct. 18, 2005 |
| 6946369 |
Method for forming, by CVD, nanostructures of semi-conductor material of homogenous and controlled size on dielectric material |
Sep. 20, 2005 |
| 6938340 |
Method of forming a printhead using a silicon on insulator substrate |
Sep. 6, 2005 |
| 6924162 |
Process of manufacturing a semiconductor device |
Aug. 2, 2005 |
| 6864152 |
Fabrication of trenches with multiple depths on the same substrate |
Mar. 8, 2005 |
| 6835617 |
Methods of forming hemispherical grained silicon on a template on a semiconductor work object |
Dec. 28, 2004 |
| 6828228 |
Methods for fabricating residue-free contact openings |
Dec. 7, 2004 |
| 6821892 |
Intelligent wet etching tool as a function of chemical concentration, temperature and film loss |
Nov. 23, 2004 |
| 6809004 |
Method of forming a shallow trench isolation |
Oct. 26, 2004 |
| 6809037 |
MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT INCLUDING SIMULTANEOUS FORMATION OF VIA-HOLE REACHING METAL WIRING AND CONCAVE GROOVE IN INTERLAYER FILM AND SEMICONDUCTOR INTEGRATED C |
Oct. 26, 2004 |
| 6803240 |
Method of measuring crystal defects in thin Si/SiGe bilayers |
Oct. 12, 2004 |
| 6783694 |
Composition for selectively etching against cobalt silicide |
Aug. 31, 2004 |
| 6780751 |
Method for eliminating voiding in plated solder |
Aug. 24, 2004 |
| 6767841 |
Process for producing a semiconductor wafer |
Jul. 27, 2004 |
| 6762135 |
Method of cleaning a polishing pad conditioner |
Jul. 13, 2004 |
| 6759343 |
Method and composition for selectively etching against cobalt silicide |
Jul. 6, 2004 |
| 6756317 |
Method for making a microstructure by surface micromachining |
Jun. 29, 2004 |
| 6753237 |
Method of shallow trench isolation fill-in without generation of void |
Jun. 22, 2004 |
| 6750153 |
Process for producing macroscopic cavities beneath the surface of a silicon wafer |
Jun. 15, 2004 |
| 6746965 |
Manufacturing method of semiconductor device |
Jun. 8, 2004 |
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