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Class Information
Number: 438/747
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > With relative movement between substrate and confined pool of etchant
Description: Processes including the step of causing a relative motion between the semiconductor substrate being etched and the liquid phase etchant which is confined by a container.










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8685864 Method and device for treating a substrate surface of a substrate Apr. 1, 2014
8563440 Method for chemically treating a substrate Oct. 22, 2013
8530359 Modulated metal removal using localized wet etching Sep. 10, 2013
8513140 Post-dry etching cleaning liquid composition and process for fabricating semiconductor device Aug. 20, 2013
8481432 Fabrication of semiconductor interconnect structure Jul. 9, 2013
8466071 Method for etching single wafer Jun. 18, 2013
8435903 Semiconductor substrate surface treatment method May. 7, 2013
8309471 Method of manufacturing semiconductor device Nov. 13, 2012
8159050 Single crystal silicon structures Apr. 17, 2012
8145342 Methods and systems for adjusting operation of a wafer grinder using feedback from warp data Mar. 27, 2012
8053371 Apparatus and methods for selective removal of material from wafer alignment marks Nov. 8, 2011
8043974 Semiconductor wet etchant and method of forming interconnection structure using the same Oct. 25, 2011
7981807 Manufacturing method of semiconductor device with smoothing Jul. 19, 2011
7976637 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for impleme Jul. 12, 2011
7943526 Process for the wet-chemical treatment of one side of silicon wafers May. 17, 2011
7906438 Single wafer etching method Mar. 15, 2011
7887636 Substrate dryer and a drying method Feb. 15, 2011
7743783 Method and apparatus for recycling process fluids Jun. 29, 2010
7709341 Methods of shaping vertical single crystal silicon walls and resulting structures May. 4, 2010
7691207 Method for cleaning disk-shape glass substrate and magnetic disk Apr. 6, 2010
7601642 Method of processing silicon wafer Oct. 13, 2009
7592201 Adjustments of masks by re-flow Sep. 22, 2009
7566644 Method for forming gate electrode of semiconductor device Jul. 28, 2009
7563717 Method for fabricating a semiconductor device Jul. 21, 2009
7521374 Method and apparatus for cleaning semiconductor substrates Apr. 21, 2009
7521373 Compositions for dissolution of low-k dielectric films, and methods of use Apr. 21, 2009
7476554 Substrate processing method Jan. 13, 2009
7470622 Fabrication and use of polished silicon micro-mirrors Dec. 30, 2008
7468325 Method of cleaning silicon nitride layer Dec. 23, 2008
7456113 Cleaning method and solution for cleaning a wafer in a single wafer process Nov. 25, 2008
7432214 Compositions for dissolution of low-k dielectric film, and methods of use Oct. 7, 2008
7396773 Method for cleaning a gate stack Jul. 8, 2008
7371694 Semiconductor device fabrication method and fabrication apparatus May. 13, 2008
7371693 Manufacturing method of semiconductor device with chamfering May. 13, 2008
7354530 Chemical mechanical polishing systems and methods for their use Apr. 8, 2008
7354869 Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method Apr. 8, 2008
7341065 Single wafer cleaning method to reduce particle defects on a wafer surface Mar. 11, 2008
7332437 Method for processing semiconductor wafer and semiconductor wafer Feb. 19, 2008
7312159 Compositions for dissolution of low-k dielectric films, and methods of use Dec. 25, 2007
7307026 Method of forming an epitaxial layer for raised drain and source regions by removing contaminations Dec. 11, 2007
7291283 Combined wet etching method for stacked films and wet etching system used for same Nov. 6, 2007
7288207 Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same Oct. 30, 2007
7235141 Lift-off method and chemical liquid tank Jun. 26, 2007
7205245 Method of forming trench isolation within a semiconductor substrate Apr. 17, 2007
7179693 Method for manufacturing thin film device that includes a chemical etchant process Feb. 20, 2007
7172708 Process for the fabrication of thin-film device and thin-film device Feb. 6, 2007
7104267 Planarized copper cleaning for reduced defects Sep. 12, 2006
7030034 Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum Apr. 18, 2006
7026255 Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride Apr. 11, 2006
7018939 Micellar technology for post-etch residues Mar. 28, 2006

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