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Class Information
Number: 438/747
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > With relative movement between substrate and confined pool of etchant
Description: Processes including the step of causing a relative motion between the semiconductor substrate being etched and the liquid phase etchant which is confined by a container.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7371693 |
Manufacturing method of semiconductor device with chamfering |
May. 13, 2008 |
| 7371694 |
Semiconductor device fabrication method and fabrication apparatus |
May. 13, 2008 |
| 7354530 |
Chemical mechanical polishing systems and methods for their use |
Apr. 8, 2008 |
| 7354869 |
Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method |
Apr. 8, 2008 |
| 7341065 |
Single wafer cleaning method to reduce particle defects on a wafer surface |
Mar. 11, 2008 |
| 7332437 |
Method for processing semiconductor wafer and semiconductor wafer |
Feb. 19, 2008 |
| 7312159 |
Compositions for dissolution of low-k dielectric films, and methods of use |
Dec. 25, 2007 |
| 7307026 |
Method of forming an epitaxial layer for raised drain and source regions by removing contaminations |
Dec. 11, 2007 |
| 7291283 |
Combined wet etching method for stacked films and wet etching system used for same |
Nov. 6, 2007 |
| 7288207 |
Etching liquid for controlling silicon wafer surface shape and method for manufacturing silicon wafer using the same |
Oct. 30, 2007 |
| 7235141 |
Lift-off method and chemical liquid tank |
Jun. 26, 2007 |
| 7205245 |
Method of forming trench isolation within a semiconductor substrate |
Apr. 17, 2007 |
| 7179693 |
Method for manufacturing thin film device that includes a chemical etchant process |
Feb. 20, 2007 |
| 7172708 |
Process for the fabrication of thin-film device and thin-film device |
Feb. 6, 2007 |
| 7104267 |
Planarized copper cleaning for reduced defects |
Sep. 12, 2006 |
| 7030034 |
Methods of etching silicon nitride substantially selectively relative to an oxide of aluminum |
Apr. 18, 2006 |
| 7026255 |
Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride |
Apr. 11, 2006 |
| 7018939 |
Micellar technology for post-etch residues |
Mar. 28, 2006 |
| 7001086 |
Developing method, substrate treating method, and substrate treating apparatus |
Feb. 21, 2006 |
| 6992014 |
Method and apparatus for etch rate uniformity control |
Jan. 31, 2006 |
| 6969688 |
Wet etchant composition and method for etching HfO2 and ZrO2 |
Nov. 29, 2005 |
| 6955994 |
Method of manufacturing semiconductor device and method of manufacturing optical wave guide |
Oct. 18, 2005 |
| 6900142 |
Inhibition of tin oxide formation in lead free interconnect formation |
May. 31, 2005 |
| 6863796 |
Method for reducing cu surface defects following cu ECP |
Mar. 8, 2005 |
| 6864186 |
Method of reducing surface contamination in semiconductor wet-processing vessels |
Mar. 8, 2005 |
| 6861371 |
Substrate processing system and substrate processing method |
Mar. 1, 2005 |
| 6861005 |
Generating nitride waveguides |
Mar. 1, 2005 |
| 6855640 |
Apparatus and process for bulk wet etch with leakage protection |
Feb. 15, 2005 |
| 6852630 |
Electroetching process and system |
Feb. 8, 2005 |
| 6831307 |
Semiconductor mounting system |
Dec. 14, 2004 |
| 6806205 |
Stiction-free microstructure releasing method for fabricating MEMS device |
Oct. 19, 2004 |
| 6790683 |
Methods of controlling wet chemical processes in forming metal silicide regions, and system for performing same |
Sep. 14, 2004 |
| 6767841 |
Process for producing a semiconductor wafer |
Jul. 27, 2004 |
| 6767840 |
Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method |
Jul. 27, 2004 |
| 6762132 |
Compositions for dissolution of low-K dielectric films, and methods of use |
Jul. 13, 2004 |
| 6750154 |
Gas assisted method for applying resist stripper and gas-resist stripper combinations |
Jun. 15, 2004 |
| 6730605 |
Redistribution of copper deposited films |
May. 4, 2004 |
| 6716365 |
Method for wet etching and wet etching apparatus |
Apr. 6, 2004 |
| 6709531 |
Chemical liquid processing apparatus for processing a substrate and the method thereof |
Mar. 23, 2004 |
| 6699400 |
Etch process and apparatus therefor |
Mar. 2, 2004 |
| 6686297 |
Method of manufacturing a semiconductor device and apparatus to be used therefore |
Feb. 3, 2004 |
| 6646348 |
Silane containing polishing composition for CMP |
Nov. 11, 2003 |
| 6627558 |
Apparatus and method for selectively restricting process fluid flow in semiconductor processing |
Sep. 30, 2003 |
| 6624087 |
Etchant for patterning indium tin oxide and method of fabricating liquid crystal display device using the same |
Sep. 23, 2003 |
| 6620738 |
Etchant and method for fabricating a semiconductor device using the same |
Sep. 16, 2003 |
| 6613693 |
Etchant used in the manufacture of semiconductor devices and etching method using the same |
Sep. 2, 2003 |
| 6589882 |
Copper post-etch cleaning process |
Jul. 8, 2003 |
| 6579382 |
Chemical liquid processing apparatus for processing a substrate and the method thereof |
Jun. 17, 2003 |
| 6566268 |
Method and apparatus for planarizing a wafer surface of a semiconductor wafer having an elevated portion extending therefrom |
May. 20, 2003 |
| 6566275 |
Spinner apparatus with chemical supply nozzle and methods of forming patterns and performing etching using the same |
May. 20, 2003 |
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