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Class Information
Number: 438/746
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Utilizing electromagnetic or wave energy
Description: Processes wherein the liquid phase etching is conducted using irradiation of electromagnetic or wave energy.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7307026 |
Method of forming an epitaxial layer for raised drain and source regions by removing contaminations |
Dec. 11, 2007 |
| 7247577 |
Insulated pad conditioner and method of using same |
Jul. 24, 2007 |
| 7129160 |
Method for simultaneously removing multiple conductive materials from microelectronic substrates |
Oct. 31, 2006 |
| 7064082 |
Methods for forming pin alloy-semiconductor devices with rectifying junction contacts |
Jun. 20, 2006 |
| 7049235 |
Method of manufacturing semiconductor device |
May. 23, 2006 |
| 7026255 |
Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride |
Apr. 11, 2006 |
| 7018938 |
Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning |
Mar. 28, 2006 |
| 7018936 |
Ion implant lithography method of processing a semiconductor substrate |
Mar. 28, 2006 |
| 6989312 |
Method for fabricating semiconductor optical device |
Jan. 24, 2006 |
| 6943124 |
Two step exposure to strengthen structure of polyimide or negative tone photosensitive material |
Sep. 13, 2005 |
| 6914008 |
Structure having pores and its manufacturing method |
Jul. 5, 2005 |
| 6897161 |
Method of cleaning component in plasma processing chamber and method of producing semiconductor devices |
May. 24, 2005 |
| 6878634 |
Structure having recesses and projections, method of manufacturing structure, and functional device |
Apr. 12, 2005 |
| 6869889 |
Etching metal carbide films |
Mar. 22, 2005 |
| 6863769 |
Configuration and method for making contact with the back surface of a semiconductor substrate |
Mar. 8, 2005 |
| 6852643 |
Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer |
Feb. 8, 2005 |
| 6849859 |
Fabrication of precision optics using an imbedded reference surface |
Feb. 1, 2005 |
| 6835319 |
Method of patterning a substrate |
Dec. 28, 2004 |
| 6803322 |
PIN ALLOY-SEMICONDUCTOR, RADIATION DETECTORS WITH RECTIFYING JUNCTION CONTACTS, METHODS AND SYSTEMS FOR FORMING PIN ALLOY-SEMICONDUCTOR DEVICES WITH RECTIFYING JUNCTION CONTACTS, AND SYSTEMS A |
Oct. 12, 2004 |
| 6784007 |
Nano-structures, process for preparing nano-structures and devices |
Aug. 31, 2004 |
| 6770568 |
Selective etching using sonication |
Aug. 3, 2004 |
| 6589882 |
Copper post-etch cleaning process |
Jul. 8, 2003 |
| 6586337 |
Method and apparatus for endpoint detection during chemical mechanical polishing |
Jul. 1, 2003 |
| 6566275 |
Spinner apparatus with chemical supply nozzle and methods of forming patterns and performing etching using the same |
May. 20, 2003 |
| 6562684 |
Methods of forming dielectric materials |
May. 13, 2003 |
| 6551943 |
Wet clean of organic silicate glass films |
Apr. 22, 2003 |
| 6551945 |
Process for manufacturing a semiconductor device |
Apr. 22, 2003 |
| 6547919 |
Device and method for fabricating diffractive gratings |
Apr. 15, 2003 |
| 6541386 |
Method for producing a structure with narrow pores |
Apr. 1, 2003 |
| 6524965 |
Cleaning method for semiconductor manufacturing process to prevent metal corrosion |
Feb. 25, 2003 |
| 6513538 |
Method of removing contaminants from integrated circuit substrates using cleaning solutions |
Feb. 4, 2003 |
| 6497996 |
Fine pattern forming method |
Dec. 24, 2002 |
| 6486074 |
Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate |
Nov. 26, 2002 |
| 6358861 |
Manufacturing method of silicon device |
Mar. 19, 2002 |
| 6335292 |
Method of controlling striations and CD loss in contact oxide etch |
Jan. 1, 2002 |
| 6333268 |
Method and apparatus for removing post-etch residues and other adherent matrices |
Dec. 25, 2001 |
| 6331489 |
Semiconductor device production method |
Dec. 18, 2001 |
| 6319846 |
Method for removing solder bodies from a semiconductor wafer |
Nov. 20, 2001 |
| 6265323 |
Substrate processing method and apparatus |
Jul. 24, 2001 |
| 6245687 |
Precision wide band gap semiconductor etching |
Jun. 12, 2001 |
| 6177358 |
Photo-stimulated etching of CaF2 |
Jan. 23, 2001 |
| 6174819 |
Low temperature photoresist removal for rework during metal mask formation |
Jan. 16, 2001 |
| 6127280 |
Photoelectrochemical capacitance-voltage measurements of wide bandgap semiconductors |
Oct. 3, 2000 |
| 6124214 |
Method and apparatus for ultrasonic wet etching of silicon |
Sep. 26, 2000 |
| 6124207 |
Slurries for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods and apparatuses for making and using such slurries |
Sep. 26, 2000 |
| 6071829 |
Method of fabricating semiconductor components |
Jun. 6, 2000 |
| 6037270 |
Method of manufacturing semiconductor device and methods of processing, analyzing and manufacturing its substrate |
Mar. 14, 2000 |
| 6033994 |
Apparatus and method for deprocessing a multi-layer semiconductor device |
Mar. 7, 2000 |
| 6007695 |
Selective removal of material using self-initiated galvanic activity in electrolytic bath |
Dec. 28, 1999 |
| 5919311 |
Control of SiO.sub.2 etch rate using dilute chemical etchants in the presence of a megasonic field |
Jul. 6, 1999 |
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