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Class Information
Number: 438/746
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching > Utilizing electromagnetic or wave energy
Description: Processes wherein the liquid phase etching is conducted using irradiation of electromagnetic or wave energy.


Patents under this class:
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Patent Number Title Of Patent Date Issued
7598181 Process for enhancing solubility and reaction rates in supercritical fluids Oct. 6, 2009
7563717 Method for fabricating a semiconductor device Jul. 21, 2009
7550395 Control of photoelectrochemical (PEC) etching by modification of the local electrochemical potential of the semiconductor structure relative to the electrolyte Jun. 23, 2009
7538042 Method of manufacturing a structure having a projection May. 26, 2009
7452478 Method for converting and purifying materials for modifying surfaces of semiconductor nanoparticles Nov. 18, 2008
7410814 Process and apparatus for cleaning silicon wafers Aug. 12, 2008
7410909 Method of removing ion implanted photoresist Aug. 12, 2008
7375017 Method for fabricating semiconductor device having stacked-gate structure May. 20, 2008
7307026 Method of forming an epitaxial layer for raised drain and source regions by removing contaminations Dec. 11, 2007
7247577 Insulated pad conditioner and method of using same Jul. 24, 2007
7129160 Method for simultaneously removing multiple conductive materials from microelectronic substrates Oct. 31, 2006
7064082 Methods for forming pin alloy-semiconductor devices with rectifying junction contacts Jun. 20, 2006
7049235 Method of manufacturing semiconductor device May. 23, 2006
7026255 Method and device for photo-electrochemically etching a semiconductor sample, especially gallium nitride Apr. 11, 2006
7018938 Controlled use of photochemically susceptible chemistries for etching, cleaning and surface conditioning Mar. 28, 2006
7018936 Ion implant lithography method of processing a semiconductor substrate Mar. 28, 2006
6989312 Method for fabricating semiconductor optical device Jan. 24, 2006
6943124 Two step exposure to strengthen structure of polyimide or negative tone photosensitive material Sep. 13, 2005
6914008 Structure having pores and its manufacturing method Jul. 5, 2005
6897161 Method of cleaning component in plasma processing chamber and method of producing semiconductor devices May. 24, 2005
6878634 Structure having recesses and projections, method of manufacturing structure, and functional device Apr. 12, 2005
6869889 Etching metal carbide films Mar. 22, 2005
6863769 Configuration and method for making contact with the back surface of a semiconductor substrate Mar. 8, 2005
6852643 Method for using ammonium fluoride solution in a photoelectrochemical etching process of a silicon wafer Feb. 8, 2005
6849859 Fabrication of precision optics using an imbedded reference surface Feb. 1, 2005
6835319 Method of patterning a substrate Dec. 28, 2004
6803322 PIN ALLOY-SEMICONDUCTOR, RADIATION DETECTORS WITH RECTIFYING JUNCTION CONTACTS, METHODS AND SYSTEMS FOR FORMING PIN ALLOY-SEMICONDUCTOR DEVICES WITH RECTIFYING JUNCTION CONTACTS, AND SYSTEMS A Oct. 12, 2004
6784007 Nano-structures, process for preparing nano-structures and devices Aug. 31, 2004
6770568 Selective etching using sonication Aug. 3, 2004
6589882 Copper post-etch cleaning process Jul. 8, 2003
6586337 Method and apparatus for endpoint detection during chemical mechanical polishing Jul. 1, 2003
6566275 Spinner apparatus with chemical supply nozzle and methods of forming patterns and performing etching using the same May. 20, 2003
6562684 Methods of forming dielectric materials May. 13, 2003
6551945 Process for manufacturing a semiconductor device Apr. 22, 2003
6551943 Wet clean of organic silicate glass films Apr. 22, 2003
6547919 Device and method for fabricating diffractive gratings Apr. 15, 2003
6541386 Method for producing a structure with narrow pores Apr. 1, 2003
6524965 Cleaning method for semiconductor manufacturing process to prevent metal corrosion Feb. 25, 2003
6513538 Method of removing contaminants from integrated circuit substrates using cleaning solutions Feb. 4, 2003
6497996 Fine pattern forming method Dec. 24, 2002
6486074 Methods of masking and etching a semiconductor substrate, and ion implant lithography methods of processing a semiconductor substrate Nov. 26, 2002
6358861 Manufacturing method of silicon device Mar. 19, 2002
6335292 Method of controlling striations and CD loss in contact oxide etch Jan. 1, 2002
6333268 Method and apparatus for removing post-etch residues and other adherent matrices Dec. 25, 2001
6331489 Semiconductor device production method Dec. 18, 2001
6319846 Method for removing solder bodies from a semiconductor wafer Nov. 20, 2001
6265323 Substrate processing method and apparatus Jul. 24, 2001
6245687 Precision wide band gap semiconductor etching Jun. 12, 2001
6177358 Photo-stimulated etching of CaF2 Jan. 23, 2001
6174819 Low temperature photoresist removal for rework during metal mask formation Jan. 16, 2001

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