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Class Information
Number: 438/745
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching
Description: Processes wherein the chemical etchant is in a liquid state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6528428 |
Method of forming dual damascene structure |
Mar. 4, 2003 |
| 6521540 |
Method for making self-aligned contacts to source/drain without a hard mask layer |
Feb. 18, 2003 |
| 6521965 |
Integrated pressure sensor |
Feb. 18, 2003 |
| 6518188 |
Apparatus and methods for chemical-mechanical polishing of semiconductor wafers |
Feb. 11, 2003 |
| 6514424 |
Process for the double-side polishing of semiconductor wafers and carrier for carrying out the process |
Feb. 4, 2003 |
| 6514875 |
Chemical method for producing smooth surfaces on silicon wafers |
Feb. 4, 2003 |
| 6514921 |
Cleaning agent |
Feb. 4, 2003 |
| 6511576 |
System for planarizing microelectronic substrates having apertures |
Jan. 28, 2003 |
| 6511609 |
Cu seed layer deposition for ULSI metalization |
Jan. 28, 2003 |
| 6508947 |
Method for fabricating a micro-electro-mechanical fluid ejector |
Jan. 21, 2003 |
| 6509275 |
Method of manufacturing thin film and pretreating method thereof |
Jan. 21, 2003 |
| 6506679 |
Deadhesion method and mechanism for wafer processing |
Jan. 14, 2003 |
| 6506681 |
Thin flip--chip method |
Jan. 14, 2003 |
| 6506684 |
Anti-corrosion system |
Jan. 14, 2003 |
| 6503363 |
System for reducing wafer contamination using freshly, conditioned alkaline etching solution |
Jan. 7, 2003 |
| 6503828 |
Process for selective polishing of metal-filled trenches of integrated circuit structures |
Jan. 7, 2003 |
| 6503837 |
Method of rinsing residual etching reactants/products on a semiconductor wafer |
Jan. 7, 2003 |
| 6503838 |
Integrated circuit isolation of functionally distinct RF circuits |
Jan. 7, 2003 |
| 6497824 |
One mask solution for the integration of the thin film resistor |
Dec. 24, 2002 |
| 6498099 |
Leadless plastic chip carrier with etch back pad singulation |
Dec. 24, 2002 |
| 6498101 |
Planarizing pads, planarizing machines and methods for making and using planarizing pads in mechanical and chemical-mechanical planarization of microelectronic device substrate assemblies |
Dec. 24, 2002 |
| 6498106 |
Prevention of defects formed in photoresist during wet etching |
Dec. 24, 2002 |
| 6498107 |
Interface control for film deposition by gas-cluster ion-beam processing |
Dec. 24, 2002 |
| 6498110 |
Ruthenium silicide wet etch |
Dec. 24, 2002 |
| 6495403 |
Gate-all-around semiconductor device and process for fabricating the same |
Dec. 17, 2002 |
| 6495472 |
Method for avoiding erosion of conductor structure during removing etching residues |
Dec. 17, 2002 |
| 6491836 |
Semiconductor wafer and production method therefor |
Dec. 10, 2002 |
| 6491837 |
Polishing slurry |
Dec. 10, 2002 |
| 6488038 |
Method for cleaning semiconductor substrates |
Dec. 3, 2002 |
| 6489250 |
Method for cutting group III nitride semiconductor light emitting element |
Dec. 3, 2002 |
| 6489251 |
Method of forming a slope lateral structure |
Dec. 3, 2002 |
| 6482748 |
Poly gate silicide inspection by back end etching |
Nov. 19, 2002 |
| 6482749 |
Method for etching a wafer edge using a potassium-based chemical oxidizer in the presence of hydrofluoric acid |
Nov. 19, 2002 |
| 6482750 |
Method of manufacturing semiconductor device including a cleaning step, and semiconductor device manufactured thereby |
Nov. 19, 2002 |
| 6482751 |
Titanium dioxide layer serving as a mask and its removed method |
Nov. 19, 2002 |
| 6479372 |
Method for avoiding water marks formed during cleaning after well implantation |
Nov. 12, 2002 |
| 6479395 |
Methods for forming openings in a substrate and apparatuses with these openings and methods for creating assemblies with openings |
Nov. 12, 2002 |
| 6475398 |
Semiconductor device incorporating hemispherical solid immersion lens, apparatus and method for manufacturing same |
Nov. 5, 2002 |
| 6475399 |
Method for fabricating a stencil mask |
Nov. 5, 2002 |
| 6475966 |
Plasma etching residue removal |
Nov. 5, 2002 |
| 6472331 |
Method and apparatus for measuring and dispensing a wafer etchant |
Oct. 29, 2002 |
| 6472332 |
Surface micromachined structure fabrication methods for a fluid ejection device |
Oct. 29, 2002 |
| 6468902 |
Semiconductor device and its manufacturing method |
Oct. 22, 2002 |
| 6468904 |
RPO process for selective CoSix formation |
Oct. 22, 2002 |
| 6468907 |
Method of manufacturing a copper wiring in a semiconductor device |
Oct. 22, 2002 |
| 6468911 |
Method of chemical/mechanical polishing of the surface of semiconductor device |
Oct. 22, 2002 |
| 6468913 |
Ready-to-use stable chemical-mechanical polishing slurries |
Oct. 22, 2002 |
| 6468914 |
Method of forming gate electrode in semiconductor device |
Oct. 22, 2002 |
| 6468917 |
Method for modifying a C4 semiconductor device |
Oct. 22, 2002 |
| 6468919 |
Method of making a local interconnect in an embedded memory |
Oct. 22, 2002 |
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