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Class Information
Number: 438/745
Name: Semiconductor device manufacturing: process > Chemical etching > Liquid phase etching
Description: Processes wherein the chemical etchant is in a liquid state when brought into contact with the semiconductive substrate.


Sub-classes under this class:

Class Number Class Name Patents
438/754 Electrically conductive material (e.g., metal, conductive oxide, etc.) 384
438/752 Germanium 96
438/748 Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant 127
438/749 Sequential application of etchant 149
438/757 Silicon nitride 214
438/756 Silicon oxide 421
438/753 Silicon 422
438/746 Utilizing electromagnetic or wave energy 84
438/747 With relative movement between substrate and confined pool of etchant 142


Patents under this class:

Patent Number Title Of Patent Date Issued
7371694 Semiconductor device fabrication method and fabrication apparatus May. 13, 2008
7371693 Manufacturing method of semiconductor device with chamfering May. 13, 2008
7371333 Methods of etching nickel silicide and cobalt silicide and methods of forming conductive lines May. 13, 2008
7368416 Methods of removing metal-containing materials May. 6, 2008
7368397 Method for monitoring edge bead removal process of copper metal interconnection May. 6, 2008
7368396 Dry etching methods May. 6, 2008
7368395 Method for fabricating a nano-imprinting mold May. 6, 2008
7367343 Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit com May. 6, 2008
7365021 Methods of fabricating a semiconductor device using an organic compound and fluoride-based buffered solution Apr. 29, 2008
7361610 Method of etching a glass substrate Apr. 22, 2008
7361609 Mask patterns for semiconductor device fabrication and related methods Apr. 22, 2008
7358195 Method for fabricating liquid crystal display device Apr. 15, 2008
7354870 Process for chemical etching of parts fabricated by stereolithography Apr. 8, 2008
7354869 Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method Apr. 8, 2008
7354868 Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixture Apr. 8, 2008
7354860 Manufacturing method of mask blank and manufacturing method of transfer mask Apr. 8, 2008
7354523 Methods for sidewall etching and etching during filling of a trench Apr. 8, 2008
7351667 Etching solution for silicon oxide method of manufacturing a semiconductor device using the same Apr. 1, 2008
7348230 Manufacturing method of semiconductor device Mar. 25, 2008
7344998 Wafer recovering method, wafer, and fabrication method Mar. 18, 2008
7344955 Cut-and-paste imprint lithographic mold and method therefor Mar. 18, 2008
7341958 Integrated process for thin film resistors with silicides Mar. 11, 2008
7341065 Single wafer cleaning method to reduce particle defects on a wafer surface Mar. 11, 2008
7338911 Method for etching and for forming a contact hole using thereof Mar. 4, 2008
7338910 Method of fabricating semiconductor devices and method of removing a spacer Mar. 4, 2008
7338909 Micro-etching method to replicate alignment marks for semiconductor wafer photolithography Mar. 4, 2008
7338908 Method for fabrication of semiconductor interconnect structure with reduced capacitance, leakage current, and improved breakdown voltage Mar. 4, 2008
7338904 Method for manufacturing single-side mirror surface wafer Mar. 4, 2008
7338859 Non-volatile memory cells having floating gate and method of forming the same Mar. 4, 2008
7338610 Etching method for manufacturing semiconductor device Mar. 4, 2008
7332449 Method for forming dual damascenes with supercritical fluid treatments Feb. 19, 2008
7332441 Passivation of porous semiconductors Feb. 19, 2008
7332437 Method for processing semiconductor wafer and semiconductor wafer Feb. 19, 2008
7332436 Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition Feb. 19, 2008
7329616 Substrate processing apparatus and substrate processing method Feb. 12, 2008
7329611 Method for forming finely-structured parts, finely-structured parts formed thereby, and product using such finely-structured part Feb. 12, 2008
7329365 Etchant composition for indium oxide layer and etching method using the same Feb. 12, 2008
7326654 Monodisperse nanoparticles produced by size-selective photoetching reaction Feb. 5, 2008
7323420 Method for manufacturing multi-thickness gate dielectric layer of semiconductor device Jan. 29, 2008
7323413 Method for stripping silicon nitride Jan. 29, 2008
7314834 Semiconductor device fabrication method Jan. 1, 2008
7314833 Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media Jan. 1, 2008
7314521 Low micropipe 100 mm silicon carbide wafer Jan. 1, 2008
7314520 Low 1c screw dislocation 3 inch silicon carbide wafer Jan. 1, 2008
7312153 Treatment of semiconductor wafers Dec. 25, 2007
7306955 Method of performing a double-sided process Dec. 11, 2007
7303994 Process for interfacial adhesion in laminate structures through patterned roughing of a surface Dec. 4, 2007
7303933 Process of manufacturing a semiconductor device Dec. 4, 2007
7300827 Method of manufacturing a thin film transistor substrate and stripping composition Nov. 27, 2007
7297639 Methods for etching doped oxides in the manufacture of microfeature devices Nov. 20, 2007



 
 
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