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Class Information
Number: 438/744
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Substrate possessing multiple layers > Silicon nitride
Description: Process wherein the material undergoing etching with the energized gas is a compound of silicon and nitrogen.










Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8691704 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Apr. 8, 2014
8679985 Dry etching method for silicon nitride film Mar. 25, 2014
8668837 Method for etching substrate Mar. 11, 2014
8664119 Semiconductor device manufacturing method Mar. 4, 2014
8617998 Method of forming a micro-pattern for semiconductor devices Dec. 31, 2013
8614150 Methods of manufacturing semiconductor structures using RIE process Dec. 24, 2013
8609533 Methods for fabricating integrated circuits having substrate contacts and integrated circuits having substrate contacts Dec. 17, 2013
8580694 Method of patterning hard mask layer for defining deep trench Nov. 12, 2013
8513086 Methods for etching doped oxides in the manufacture of microfeature devices Aug. 20, 2013
8470716 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Jun. 25, 2013
8362596 Engineered interconnect dielectric caps having compressive stress and interconnect structures containing same Jan. 29, 2013
8343867 Method for main spacer trim-back Jan. 1, 2013
8278180 Methods of forming a semiconductor device having a contact structure Oct. 2, 2012
8252696 Selective etching of silicon nitride Aug. 28, 2012
8163653 Semiconductor device and method of manufacturing the same Apr. 24, 2012
8114781 Substrate processing method and substrate processing apparatus Feb. 14, 2012
8076248 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Dec. 13, 2011
8062982 High yield plasma etch process for interlayer dielectrics Nov. 22, 2011
8039388 Main spacer trim-back method for replacement gate process Oct. 18, 2011
8012877 Backside nitride removal to reduce streak defects Sep. 6, 2011
8008650 Transistor with nanotube structure exhibiting N-type semiconductor-like characteristics Aug. 30, 2011
7998876 Method of producing semiconductor element Aug. 16, 2011
7943524 Method of etching and etching apparatus May. 17, 2011
7902089 N-type transistor, production methods for n-type transistor and n-type transistor-use channel, and production method of nanotube structure exhibiting n-type semiconductor-like characteristics Mar. 8, 2011
7846843 Method for manufacturing a semiconductor device using a spacer as an etch mask for forming a fine pattern Dec. 7, 2010
7816274 Methods for normalizing strain in a semiconductor device Oct. 19, 2010
7816218 Selective deposition of amorphous silicon films on metal gates Oct. 19, 2010
7803673 Method of manufacturing a thin film transistor substrate Sep. 28, 2010
7772038 CMOS process for fabrication of ultra small or non standard size or shape semiconductor die Aug. 10, 2010
7759244 Method for fabricating an inductor structure or a dual damascene structure Jul. 20, 2010
7754552 Preventing silicide formation at the gate electrode in a replacement metal gate technology Jul. 13, 2010
7670938 Methods of forming contact openings Mar. 2, 2010
7666797 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Feb. 23, 2010
7666796 Substrate patterning for multi-gate transistors Feb. 23, 2010
7655562 Method of manufacturing semiconductor memory device Feb. 2, 2010
7648915 Methods of forming semiconductor constructions, and methods of recessing materials within openings Jan. 19, 2010
7638436 Semiconductor processing methods of transferring patterns from patterned photoresists to materials Dec. 29, 2009
7592262 Method for manufacturing MOS transistors utilizing a hybrid hard mask Sep. 22, 2009
7588883 Method for forming a gate and etching a conductive layer Sep. 15, 2009
7560385 Etching systems and processing gas specie modulation Jul. 14, 2009
7560389 Method for fabricating semiconductor element Jul. 14, 2009
7538036 Methods of forming openings, and methods of forming container capacitors May. 26, 2009
7521308 Dual layer stress liner for MOSFETS Apr. 21, 2009
7517710 Method of manufacturing field emission device Apr. 14, 2009
7514366 Methods for forming shallow trench isolation Apr. 7, 2009
7514282 Patterned silicon submicron tubes Apr. 7, 2009
7452825 Method of forming a mask structure and method of forming a minute pattern using the same Nov. 18, 2008
7442650 Methods of manufacturing semiconductor structures using RIE process Oct. 28, 2008
7435683 Apparatus and method for selectively recessing spacers on multi-gate devices Oct. 14, 2008
7435688 Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride Oct. 14, 2008

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