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Class Information
Number: 438/743
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Substrate possessing multiple layers > Silicon oxide or glass
Description: Processes wherein the material undergoing etching with the energized gas is a compound of silicon and oxygen or glass.

Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8691704 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Apr. 8, 2014
8642476 Method for manufacturing silicon carbide semiconductor device Feb. 4, 2014
8642479 Method for forming openings in semiconductor device Feb. 4, 2014
8592322 Method of fabricating openings Nov. 26, 2013
8580694 Method of patterning hard mask layer for defining deep trench Nov. 12, 2013
8535551 Plasma etching method Sep. 17, 2013
8501629 Smooth SiConi etch for silicon-containing films Aug. 6, 2013
8497211 Integrated process modulation for PSG gapfill Jul. 30, 2013
8440568 Substrate etching method and system May. 14, 2013
8420547 Plasma processing method Apr. 16, 2013
8318605 Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Nov. 27, 2012
8314033 Method of patterning a low-k dielectric film Nov. 20, 2012
8299564 Diffusion regions having different depths Oct. 30, 2012
8282845 Etching with improved control of critical feature dimensions at the bottom of thick layers Oct. 9, 2012
8236702 Method of fabricating openings and contact holes Aug. 7, 2012
8177990 Etching method, plasma processing system and storage medium May. 15, 2012
8153019 Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices Apr. 10, 2012
8129242 Method of manufacturing a memory device Mar. 6, 2012
8114781 Substrate processing method and substrate processing apparatus Feb. 14, 2012
8076248 Methods for forming semiconductor constructions, and methods for selectively etching silicon nitride relative to conductive material Dec. 13, 2011
8062982 High yield plasma etch process for interlayer dielectrics Nov. 22, 2011
8048689 Semiconductor chip with backside conductor structure Nov. 1, 2011
8012877 Backside nitride removal to reduce streak defects Sep. 6, 2011
8008209 Thermal gradient control of high aspect ratio etching and deposition processes Aug. 30, 2011
7988873 Method of forming a mask pattern for fabricating a semiconductor device Aug. 2, 2011
7977246 Thermal annealing method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Jul. 12, 2011
7972967 Method of forming patterns of a semiconductor device including forming spacers on sidewalls of auxiliary patterns and removing exposed auxiliary patterns Jul. 5, 2011
7943524 Method of etching and etching apparatus May. 17, 2011
7911034 Techniques for precision pattern transfer of carbon nanotubes from photo mask to wafers Mar. 22, 2011
7902080 Deposition-plasma cure cycle process to enhance film quality of silicon dioxide Mar. 8, 2011
7846843 Method for manufacturing a semiconductor device using a spacer as an etch mask for forming a fine pattern Dec. 7, 2010
7838431 Method for surface treatment of semiconductor substrates Nov. 23, 2010
7825034 Method of fabricating openings and contact holes Nov. 2, 2010
7803673 Method of manufacturing a thin film transistor substrate Sep. 28, 2010
7772038 CMOS process for fabrication of ultra small or non standard size or shape semiconductor die Aug. 10, 2010
7758760 Thin film transistor array panel and method of manufacturing the same Jul. 20, 2010
7759244 Method for fabricating an inductor structure or a dual damascene structure Jul. 20, 2010
7666796 Substrate patterning for multi-gate transistors Feb. 23, 2010
7648915 Methods of forming semiconductor constructions, and methods of recessing materials within openings Jan. 19, 2010
7592262 Method for manufacturing MOS transistors utilizing a hybrid hard mask Sep. 22, 2009
7572733 Gas switching during an etch process to modulate the characteristics of the etch Aug. 11, 2009
7547635 Process for etching dielectric films with improved resist and/or etch profile characteristics Jun. 16, 2009
7538036 Methods of forming openings, and methods of forming container capacitors May. 26, 2009
7528076 Method for manufacturing gate oxide layer with different thicknesses May. 5, 2009
7524752 Method of manufacturing semiconductor device Apr. 28, 2009
7521308 Dual layer stress liner for MOSFETS Apr. 21, 2009
7517710 Method of manufacturing field emission device Apr. 14, 2009
7514282 Patterned silicon submicron tubes Apr. 7, 2009
7510973 Method for forming fine pattern in semiconductor device Mar. 31, 2009
7510972 Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device Mar. 31, 2009

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