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Class Information
Number: 438/741
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Substrate possessing multiple layers > Selectively etching substrate possessing multiple layers of differing etch characteristics > Utilizing etch stop layer > Pn junction functions as etch stop
Description: Processes wherein the etch stop layer is a component of a PN junction.










Patents under this class:

Patent Number Title Of Patent Date Issued
8691611 Method for creating a micromechanical membrane structure and MEMS component Apr. 8, 2014
7816162 Semiconductor device manufacturing method Oct. 19, 2010
7776753 Method of fabricating semiconductor devices employing at least one modulation doped quantum well structure and one or more etch stop layers for accurate contact formation Aug. 17, 2010
7704892 Semiconductor device having local interconnection layer and etch stopper pattern for preventing leakage of current Apr. 27, 2010
7635650 Prevention of plasma induced damage arising from etching of crack stop trenches in multi-layered low-k semiconductor devices Dec. 22, 2009
7402529 Method of applying cladding material on conductive lines of MRAM devices Jul. 22, 2008
7250323 Methods of making energy conversion devices with a substantially contiguous depletion regions Jul. 31, 2007
6992342 Magnetic memory device having a non-volatile magnetic section and manufacturing thereof Jan. 31, 2006
6767835 Method of making a shaped gate electrode structure, and device comprising same Jul. 27, 2004
6642148 RELACS shrink method applied for single print resist mask for LDD or buried bitline implants using chemically amplified DUV type photoresist Nov. 4, 2003
6642158 Photo-thermal induced diffusion Nov. 4, 2003
6211090 Method of fabricating flux concentrating layer for use with magnetoresistive random access memories Apr. 3, 2001
6127237 Etching end point detecting method based on junction current measurement and etching apparatus Oct. 3, 2000
6107208 Nitride etch using N.sub.2 /Ar/CHF.sub.3 chemistry Aug. 22, 2000
5858875 Integrated circuits with borderless vias Jan. 12, 1999
5242533 Method of structuring a semiconductor chip Sep. 7, 1993
5129982 Selective electrochemical etching Jul. 14, 1992
5129981 Method of selectively etching silicon Jul. 14, 1992
5116457 Semiconductor transducer or actuator utilizing corrugated supports May. 26, 1992
4635343 Method of manufacturing GaAs semiconductor device Jan. 13, 1987











 
 
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