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Class Information
Number: 438/740
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Substrate possessing multiple layers > Selectively etching substrate possessing multiple layers of differing etch characteristics > Utilizing etch stop layer
Description: Processes wherein the selective etching is effected through the use of a material resistant to the etchant.










Sub-classes under this class:

Class Number Class Name Patents
438/741 Pn junction functions as etch stop 20


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8703604 Creation of vias and trenches with different depths Apr. 22, 2014
8691610 Semiconductor device and method for manufacturing the same Apr. 8, 2014
8664125 Highly selective spacer etch process with reduced sidewall spacer slimming Mar. 4, 2014
8643059 Substrate structure and method of manufacturing the same Feb. 4, 2014
8642473 Methods for contact clean Feb. 4, 2014
8633104 Methods of manufacturing three-dimensional semiconductor devices Jan. 21, 2014
8623730 Method for fabricating silicon-on-insulator transistor with self-aligned borderless source/drain contacts Jan. 7, 2014
8609492 Vertical memory cell Dec. 17, 2013
8598045 Semiconductor device and method for manufacturing the same Dec. 3, 2013
8592322 Method of fabricating openings Nov. 26, 2013
8557612 Method for fabricating micro and nanostructures in a material Oct. 15, 2013
8557613 Methods for designing, fabricating, and predicting shape formations in a material Oct. 15, 2013
8546241 Semiconductor device with stress trench isolation and method for forming the same Oct. 1, 2013
8541313 Method for etching a sacrificial layer for a micro-machined structure Sep. 24, 2013
8530309 Memory device and method for fabricating the same Sep. 10, 2013
8518829 Self-sealed fluidic channels for nanopore array Aug. 27, 2013
8513143 Semiconductor structure and method of manufacturing Aug. 20, 2013
8461049 Method for fabricating semiconductor device Jun. 11, 2013
8461047 Method for processing amorphous carbon film, and semiconductor device manufacturing method using the method Jun. 11, 2013
8450216 Contact etch stop layers of a field effect transistor May. 28, 2013
8445382 Side wall pore sealing for low-k dielectrics May. 21, 2013
8440533 Self-aligned contact for replacement metal gate and silicide last processes May. 14, 2013
8426316 Ta-TaN selective removal process for integrated device fabrication Apr. 23, 2013
8409996 Method of manufacturing a bulk acoustic wave device Apr. 2, 2013
8377785 Planar field effect transistor structure having an angled crystallographic etch-defined source/drain recess and a method of forming the transistor structure Feb. 19, 2013
8377817 Three dimensional semiconductor memory device and method of manufacturing the same Feb. 19, 2013
8377829 Method of manufacturing a capacitor deep trench and of etching a deep trench opening Feb. 19, 2013
8330257 Thin film transistor substrate, method of manufacturing the same, and display apparatus having the same Dec. 11, 2012
8324111 Liquid crystal display device and method for fabricating the same Dec. 4, 2012
8282842 Cleaning method following opening etch Oct. 9, 2012
8252684 Method of forming a trench by a silicon-containing mask Aug. 28, 2012
8252694 Plasma etching method and storage medium Aug. 28, 2012
8236702 Method of fabricating openings and contact holes Aug. 7, 2012
8232178 Method for forming a semiconductor device with stressed trench isolation Jul. 31, 2012
8227339 Creation of vias and trenches with different depths Jul. 24, 2012
8211809 Method of producing semiconductor device Jul. 3, 2012
8158521 Two step post-deposition treatment of ILD layer for a lower dielectric constant and improved mechanical properties Apr. 17, 2012
8101468 Method of manufacturing a semiconductor device Jan. 24, 2012
8084339 Remote plasma processing of interface surfaces Dec. 27, 2011
8076230 Method of forming self-aligned contacts and local interconnects Dec. 13, 2011
8062982 High yield plasma etch process for interlayer dielectrics Nov. 22, 2011
7988873 Method of forming a mask pattern for fabricating a semiconductor device Aug. 2, 2011
7989357 Method of patterning semiconductor structure and structure thereof Aug. 2, 2011
7985690 Method for a gate last process Jul. 26, 2011
7981801 Chemical mechanical polishing (CMP) method for gate last process Jul. 19, 2011
7981810 Methods of depositing highly selective transparent ashable hardmask films Jul. 19, 2011
7972955 Three dimensional semiconductor memory device and method of fabricating the same Jul. 5, 2011
7932542 Method of fabricating an integrated circuit with stress enhancement Apr. 26, 2011
7923345 Methods relating to trench-based support structures for semiconductor devices Apr. 12, 2011
7923372 Method for fabricating semiconductor device Apr. 12, 2011

1 2 3 4 5 6 7 8 9 10










 
 
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