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Class Information
Number: 438/738
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Substrate possessing multiple layers > Selectively etching substrate possessing multiple layers of differing etch characteristics
Description: Process involving the etching of a multilayered substrate, using a single etching step, where the process parameters used causes a difference of the etching rate or characteristic in at least two different layers of the substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7618510 |
Imprinting polymer film on patterned substrate |
Nov. 17, 2009 |
| 7615497 |
Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layer |
Nov. 10, 2009 |
| 7595010 |
Method for producing a doped nitride film, doped oxide film and other doped films |
Sep. 29, 2009 |
| 7589024 |
Process for producing semiconductor integrated circuit device |
Sep. 15, 2009 |
| 7589006 |
Method for manufacturing semiconductor device |
Sep. 15, 2009 |
| 7566658 |
Method for fabricating a metal interconnection using a dual damascene process and resulting semiconductor device |
Jul. 28, 2009 |
| 7566664 |
Selective etching of MEMS using gaseous halides and reactive co-etchants |
Jul. 28, 2009 |
| 7563688 |
Method for fabricating capacitor in semiconductor device |
Jul. 21, 2009 |
| 7560315 |
Manufacturing method for semiconductor device |
Jul. 14, 2009 |
| 7560360 |
Methods for enhancing trench capacitance and trench capacitor |
Jul. 14, 2009 |
| 7553723 |
Manufacturing method of a memory device |
Jun. 30, 2009 |
| 7547638 |
Method for manufacturing semiconductor device |
Jun. 16, 2009 |
| 7547641 |
Super hybrid SOI CMOS devices |
Jun. 16, 2009 |
| 7547640 |
Method for integrated circuit fabrication using pitch multiplication |
Jun. 16, 2009 |
| 7547565 |
Method of manufacturing optical interference color display |
Jun. 16, 2009 |
| 7544623 |
Method for fabricating a contact hole |
Jun. 9, 2009 |
| 7541232 |
Method for fabrication of devices in a multi-layer structure |
Jun. 2, 2009 |
| 7537987 |
Semiconductor device manufacturing method |
May. 26, 2009 |
| 7537988 |
Differential offset spacer |
May. 26, 2009 |
| 7538041 |
Magnetic recording medium, method of manufacturing the same, and intermediate for magnetic recording medium |
May. 26, 2009 |
| 7534687 |
Semiconductor device and method for manufacturing the same |
May. 19, 2009 |
| 7531456 |
Method of forming self-aligned double pattern |
May. 12, 2009 |
| 7528076 |
Method for manufacturing gate oxide layer with different thicknesses |
May. 5, 2009 |
| 7528075 |
Self-masking defect removing method |
May. 5, 2009 |
| 7521308 |
Dual layer stress liner for MOSFETS |
Apr. 21, 2009 |
| 7517805 |
Method of in-situ ash strip to eliminate memory effect and reduce wafer damage |
Apr. 14, 2009 |
| 7510981 |
Method for manufacturing semiconductor device |
Mar. 31, 2009 |
| 7510972 |
Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device |
Mar. 31, 2009 |
| 7498181 |
Method of preparing an integrated circuit die for imaging |
Mar. 3, 2009 |
| 7498226 |
Method for fabricating semiconductor device with step gated asymmetric recess |
Mar. 3, 2009 |
| 7494918 |
Semiconductor structures including multiple crystallographic orientations and methods for fabrication thereof |
Feb. 24, 2009 |
| 7491644 |
Manufacturing process for a transistor made of thin layers |
Feb. 17, 2009 |
| 7488687 |
Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers |
Feb. 10, 2009 |
| 7485581 |
Device with gaps for capacitance reduction |
Feb. 3, 2009 |
| 7473377 |
Plasma processing method |
Jan. 6, 2009 |
| 7463476 |
Capacitor with nanotubes and method for fabricating the same |
Dec. 9, 2008 |
| 7462567 |
Method for manufacturing integrated circuit |
Dec. 9, 2008 |
| 7452825 |
Method of forming a mask structure and method of forming a minute pattern using the same |
Nov. 18, 2008 |
| 7442606 |
Method of manufacturing a semiconductor device |
Oct. 28, 2008 |
| 7442319 |
Poly etch without separate oxide decap |
Oct. 28, 2008 |
| 7442644 |
Method for manufacturing nitride semiconductor wafer or nitride semiconductor device; nitride semiconductor wafer or nitride semiconductor device made by the same; and laser irradiating appara |
Oct. 28, 2008 |
| 7439186 |
Method for structuring a silicon layer |
Oct. 21, 2008 |
| 7432120 |
Method for realizing a hosting structure of nanometric elements |
Oct. 7, 2008 |
| 7431967 |
Limited thermal budget formation of PMD layers |
Oct. 7, 2008 |
| 7429493 |
Method for fabricating a magnetic head for perpendicular recording using a CMP lift-off and resistant layer |
Sep. 30, 2008 |
| 7425277 |
Method for hard mask CD trim |
Sep. 16, 2008 |
| 7425512 |
Method for etching a substrate and a device formed using the method |
Sep. 16, 2008 |
| 7419843 |
Method of manufacturing semiconductor probe having resistive tip |
Sep. 2, 2008 |
| 7419917 |
Ion implanted microscale and nanoscale device method |
Sep. 2, 2008 |
| 7419915 |
Laser assisted chemical etching method for release microscale and nanoscale devices |
Sep. 2, 2008 |
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