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Class Information
Number: 438/736
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Utilizing multilayered mask
Description: Processes wherein selected regions of the semiconductor substrate are protected from the effects of the etching gas through use of a mask composed of plural layers.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7387969 |
Top patterned hardmask and method for patterning |
Jun. 17, 2008 |
| 7381654 |
Method for fabricating right-angle holes in a substrate |
Jun. 3, 2008 |
| 7381655 |
Mandrel/trim alignment in SIT processing |
Jun. 3, 2008 |
| 7368394 |
Etch methods to form anisotropic features for high aspect ratio applications |
May. 6, 2008 |
| 7361588 |
Etch process for CD reduction of arc material |
Apr. 22, 2008 |
| 7361607 |
Method for multi-layer resist plasma etch |
Apr. 22, 2008 |
| 7358182 |
Method of forming an interconnect structure |
Apr. 15, 2008 |
| 7354866 |
Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor |
Apr. 8, 2008 |
| 7351666 |
Layout and process to contact sub-lithographic structures |
Apr. 1, 2008 |
| 7341952 |
Multi-layer hard mask structure for etching deep trench in substrate |
Mar. 11, 2008 |
| 7341955 |
Method for fabricating semiconductor device |
Mar. 11, 2008 |
| 7338897 |
Method of fabricating a semiconductor device having metal wiring |
Mar. 4, 2008 |
| 7335980 |
Hardmask for reliability of silicon based dielectrics |
Feb. 26, 2008 |
| 7326651 |
Method for forming damascene structure utilizing planarizing material coupled with compressive diffusion barrier material |
Feb. 5, 2008 |
| 7326650 |
Method of etching dual damascene structure |
Feb. 5, 2008 |
| 7326648 |
Semiconductor device and fabrication process of forming silicide layer on a polysilicon pattern by reducing thickness of metal layer before forming silicide layer on the polysilicon pattern |
Feb. 5, 2008 |
| RE40007 |
In-situ strip process for polysilicon etching in deep sub-micron technology |
Jan. 22, 2008 |
| 7319074 |
Method of defining polysilicon patterns |
Jan. 15, 2008 |
| 7312158 |
Method of forming pattern |
Dec. 25, 2007 |
| 7309656 |
Method for forming step channel of semiconductor device |
Dec. 18, 2007 |
| 7303949 |
High performance stress-enhanced MOSFETs using Si:C and SiGe epitaxial source/drain and method of manufacture |
Dec. 4, 2007 |
| 7300597 |
Selective etch process of a sacrificial light absorbing material (SLAM) over a dielectric material |
Nov. 27, 2007 |
| 7300883 |
Method for patterning sub-lithographic features in semiconductor manufacturing |
Nov. 27, 2007 |
| 7300884 |
Pattern forming method, underlayer film forming composition, and method of manufacturing semiconductor device |
Nov. 27, 2007 |
| 7297559 |
Method of fabricating memory and memory |
Nov. 20, 2007 |
| 7294579 |
Method for forming contact opening |
Nov. 13, 2007 |
| RE39913 |
Method to control gate CD |
Nov. 6, 2007 |
| 7282451 |
Methods of forming integrated circuit devices having metal interconnect layers therein |
Oct. 16, 2007 |
| 7282440 |
Integrated circuit contact |
Oct. 16, 2007 |
| 7282447 |
Method for an integrated circuit contact |
Oct. 16, 2007 |
| 7273812 |
Microprobe tips and methods for making |
Sep. 25, 2007 |
| 7262138 |
Organic BARC with adjustable etch rate |
Aug. 28, 2007 |
| 7259045 |
Method for fabricating a thin film transistor using a half-tone mask |
Aug. 21, 2007 |
| 7259089 |
Semiconductor device manufacturing method that includes forming a wiring pattern with a mask layer that has a tapered shape |
Aug. 21, 2007 |
| 7256129 |
Method for fabricating semiconductor device |
Aug. 14, 2007 |
| 7244644 |
Undercut and residual spacer prevention for dual stressed layers |
Jul. 17, 2007 |
| 7241634 |
Semiconductor device and method for producing the same |
Jul. 10, 2007 |
| 7223703 |
Method of forming patterns |
May. 29, 2007 |
| 7220679 |
Method for forming patterns in a semiconductor device |
May. 22, 2007 |
| 7214626 |
Etching process for decreasing mask defect |
May. 8, 2007 |
| 7211519 |
Method for manufacturing semiconductor device |
May. 1, 2007 |
| 7208405 |
Insulating film forming method capable of enhancing adhesion of silicon carbide film, etc. and semiconductor device |
Apr. 24, 2007 |
| 7205241 |
Method for manufacturing semiconductor device with contact body extended in direction of bit line |
Apr. 17, 2007 |
| 7195927 |
Process for making magnetic memory structures having different-sized memory cell layers |
Mar. 27, 2007 |
| 7192880 |
Method for line etch roughness (LER) reduction for low-k interconnect damascene trench etching |
Mar. 20, 2007 |
| 7193228 |
EUV light source optical elements |
Mar. 20, 2007 |
| 7183224 |
Liftoff process for thin photoresist |
Feb. 27, 2007 |
| 7172969 |
Method and system for etching a film stack |
Feb. 6, 2007 |
| 7169712 |
Method for manufacturing a microlens |
Jan. 30, 2007 |
| 7153780 |
Method and apparatus for self-aligned MOS patterning |
Dec. 26, 2006 |
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