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Class Information
Number: 438/736
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate > Utilizing multilayered mask
Description: Processes wherein selected regions of the semiconductor substrate are protected from the effects of the etching gas through use of a mask composed of plural layers.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7629263 |
Semiconductor sensor production method and semiconductor sensor |
Dec. 8, 2009 |
| 7615482 |
Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength |
Nov. 10, 2009 |
| 7615496 |
Method of forming pad patterns using self-align double patterning method, pad pattern layout formed using the same, and method of forming contact holes using self-align double patterning metho |
Nov. 10, 2009 |
| 7615497 |
Forming fine pattern of semiconductor device using three mask layers and CMP of spin-on carbon layer |
Nov. 10, 2009 |
| 7611994 |
Fine patterning method for semiconductor device |
Nov. 3, 2009 |
| 7601641 |
Two step optical planarizing layer etch |
Oct. 13, 2009 |
| 7592265 |
Method of trimming a hard mask layer, method for fabricating a gate in a MOS transistor, and a stack for fabricating a gate in a MOS transistor |
Sep. 22, 2009 |
| 7589026 |
Method for fabricating a fine pattern in a semiconductor device |
Sep. 15, 2009 |
| 7573085 |
Deep trench formation in semiconductor device fabrication |
Aug. 11, 2009 |
| 7566658 |
Method for fabricating a metal interconnection using a dual damascene process and resulting semiconductor device |
Jul. 28, 2009 |
| 7563712 |
Method of forming micro pattern in semiconductor device |
Jul. 21, 2009 |
| 7560390 |
Multiple spacer steps for pitch multiplication |
Jul. 14, 2009 |
| 7560389 |
Method for fabricating semiconductor element |
Jul. 14, 2009 |
| 7557043 |
Method of fabricating the stacked structure and damascene process |
Jul. 7, 2009 |
| 7553760 |
Sub-lithographic nano interconnect structures, and method for forming same |
Jun. 30, 2009 |
| 7550383 |
Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same |
Jun. 23, 2009 |
| 7550392 |
Semiconductor device and method of manufacturing the same |
Jun. 23, 2009 |
| RE40748 |
Process for producing semiconductor device |
Jun. 16, 2009 |
| 7547640 |
Method for integrated circuit fabrication using pitch multiplication |
Jun. 16, 2009 |
| 7544623 |
Method for fabricating a contact hole |
Jun. 9, 2009 |
| 7541292 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones |
Jun. 2, 2009 |
| 7534727 |
Method for manufacturing semiconductor device |
May. 19, 2009 |
| 7534723 |
Methods of forming fine patterns, and methods of forming trench isolation layers using the same |
May. 19, 2009 |
| 7531045 |
Method for removing haze in a photo mask |
May. 12, 2009 |
| 7531456 |
Method of forming self-aligned double pattern |
May. 12, 2009 |
| 7531457 |
Method of fabricating suspended structure |
May. 12, 2009 |
| 7526856 |
Method for fabricating a magnetic head using a ferrofluid mask |
May. 5, 2009 |
| 7521308 |
Dual layer stress liner for MOSFETS |
Apr. 21, 2009 |
| 7517806 |
Integrated circuit having pairs of parallel complementary FinFETs |
Apr. 14, 2009 |
| 7510980 |
Method for manufacturing semiconductor device |
Mar. 31, 2009 |
| 7510976 |
Dielectric plasma etch process with in-situ amorphous carbon mask with improved critical dimension and etch selectivity |
Mar. 31, 2009 |
| 7507674 |
Memory device including resistance change layer as storage node and method(s) for making the same |
Mar. 24, 2009 |
| 7501071 |
Method of forming a patterned conductive structure |
Mar. 10, 2009 |
| 7485581 |
Device with gaps for capacitance reduction |
Feb. 3, 2009 |
| 7485582 |
Hardmask for improved reliability of silicon based dielectrics |
Feb. 3, 2009 |
| 7482277 |
Multilevel fabrication processing by functional regrouping of material deposition, lithography, and etching |
Jan. 27, 2009 |
| 7476623 |
Method for microstructuring flat glass substrates |
Jan. 13, 2009 |
| 7473648 |
Double exposure double resist layer process for forming gate patterns |
Jan. 6, 2009 |
| 7462566 |
Method for manufacturing semiconductor device |
Dec. 9, 2008 |
| 7463476 |
Capacitor with nanotubes and method for fabricating the same |
Dec. 9, 2008 |
| 7452825 |
Method of forming a mask structure and method of forming a minute pattern using the same |
Nov. 18, 2008 |
| 7435688 |
Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
Oct. 14, 2008 |
| 7435354 |
Treatment method for surface of photoresist layer and method for forming patterned photoresist layer |
Oct. 14, 2008 |
| 7432212 |
Methods of processing a semiconductor substrate |
Oct. 7, 2008 |
| 7427569 |
Metal etching process and rework method thereof |
Sep. 23, 2008 |
| 7425511 |
Methods for manufacturing shallow trench isolation layers of semiconductor devices |
Sep. 16, 2008 |
| 7419613 |
Method and device for plasma-etching organic material film |
Sep. 2, 2008 |
| 7410907 |
Fabricating integrated devices using embedded masks |
Aug. 12, 2008 |
| 7387969 |
Top patterned hardmask and method for patterning |
Jun. 17, 2008 |
| 7381654 |
Method for fabricating right-angle holes in a substrate |
Jun. 3, 2008 |
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