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Class Information
Number: 438/735
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate
Description: Processes directed to (a) contact only selected surface areas of the substrate with the etchant to remove a constituent part of the substrate at the selected surface areas only or (b) cause the substrate to be treated at different rates in different areas to produce a nonuniform surface.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5943582 |
Method for forming DRAM stacked capacitor |
Aug. 24, 1999 |
| 5939741 |
Methods of forming integrated circuitry and integrated circuitry structures |
Aug. 17, 1999 |
| 5933728 |
Process for fabricating bottom electrode of capacitor |
Aug. 3, 1999 |
| 5928965 |
Method for dry-etching of silicon substrate |
Jul. 27, 1999 |
| 5922623 |
Hydrogen fluoride vapor phase selective etching method for fabricating semiconductor devices |
Jul. 13, 1999 |
| 5922621 |
Quantum semiconductor device and a fabrication process thereof |
Jul. 13, 1999 |
| 5916821 |
Method for producing sublithographic etching masks |
Jun. 29, 1999 |
| 5916822 |
Method of etching a substrate by means of chemical beams |
Jun. 29, 1999 |
| 5912187 |
Method of fabricating circuits |
Jun. 15, 1999 |
| 5904570 |
Method for polymer removal after etching |
May. 18, 1999 |
| 5895273 |
Silicon sidewall etching |
Apr. 20, 1999 |
| 5879572 |
Method of protecting silicon wafers during wet chemical etching |
Mar. 9, 1999 |
| 5877071 |
Masking methods during semiconductor device fabrication |
Mar. 2, 1999 |
| 5873948 |
Method for removing etch residue material |
Feb. 23, 1999 |
| 5871659 |
Dry etching process for semiconductor |
Feb. 16, 1999 |
| 5871870 |
Mask for forming features on a semiconductor substrate and a method for forming the mask |
Feb. 16, 1999 |
| 5869400 |
Method for dry-etching using gaseous bismuth halide compound |
Feb. 9, 1999 |
| 5853601 |
Top-via etch technique for forming dielectric membranes |
Dec. 29, 1998 |
| RE36006 |
Metal selective polymer removal |
Dec. 22, 1998 |
| 5837616 |
Dry etching method for aluminum alloy and etching gas therefor |
Nov. 17, 1998 |
| 5827783 |
Stacked capacitor having improved charge storage capacity |
Oct. 27, 1998 |
| 5811345 |
Planarization of shallow- trench- isolation without chemical mechanical polishing |
Sep. 22, 1998 |
| 5772905 |
Nanoimprint lithography |
Jun. 30, 1998 |
| 5753539 |
Method of making an integrated circuit with windowed fuse element and contact pad |
May. 19, 1998 |
| 5726085 |
Method of fabricating a dynamic random access memory (DRAM) cell capacitor using hemispherical grain (HSG) polysilicon and selective polysilicon etchback |
Mar. 10, 1998 |
| 5714039 |
Method for making sub-lithographic images by etching the intersection of two spacers |
Feb. 3, 1998 |
| 5667941 |
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
Sep. 16, 1997 |
| 5419807 |
Method of providing electrical interconnect between two layers within a silicon substrate, semiconductor apparatus, and method of forming apparatus for testing semiconductor circuitry for oper |
May. 30, 1995 |
| 5364495 |
Method of manufacturing sharp waveguide branches in integrated optical components |
Nov. 15, 1994 |
| 5348619 |
Metal selective polymer removal |
Sep. 20, 1994 |
| 5180689 |
Tapered opening sidewall with multi-step etching process |
Jan. 19, 1993 |
| 5100508 |
Method of forming fine patterns |
Mar. 31, 1992 |
| 4980314 |
Vapor processing of a substrate |
Dec. 25, 1990 |
| 4601778 |
Maskless etching of polysilicon |
Jul. 22, 1986 |
| 4536252 |
Laser-induced production of nitrosyl fluoride for etching of semiconductor surfaces |
Aug. 20, 1985 |
| 4438556 |
Method of forming doped polycrystalline silicon pattern by selective implantation and plasma etching of undoped regions |
Mar. 27, 1984 |
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