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Class Information
Number: 438/735
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Differential etching of semiconductor substrate
Description: Processes directed to (a) contact only selected surface areas of the substrate with the etchant to remove a constituent part of the substrate at the selected surface areas only or (b) cause the substrate to be treated at different rates in different areas to produce a nonuniform surface.


Sub-classes under this class:

Class Number Class Name Patents
438/737 Substrate possessing multiple layers 184
438/736 Utilizing multilayered mask 254


Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
7344994 Multiple layer etch stop and etching method Mar. 18, 2008
7344997 Semiconductor substrate, semiconductor device, method for manufacturing semiconductor substrate and method for manufacturing semiconductor device Mar. 18, 2008
7341943 Post etch copper cleaning using dry plasma Mar. 11, 2008
7309654 Technique for reducing etch damage during the formation of vias and trenches in interlayer dielectrics Dec. 18, 2007
7291282 Method of fabricating a mold for imprinting a structure Nov. 6, 2007
7282447 Method for an integrated circuit contact Oct. 16, 2007
7282455 Method of producing a diffraction grating Oct. 16, 2007
7217631 Semiconductor device and method for fabricating the device May. 15, 2007
7214626 Etching process for decreasing mask defect May. 8, 2007
7208396 Permanent adherence of the back end of a wafer to an electrical component or sub-assembly Apr. 24, 2007
7205244 Patterning substrates employing multi-film layers defining etch-differential interfaces Apr. 17, 2007
7166232 Method for producing a solid body including a microstructure Jan. 23, 2007
7153710 Etching method, method of manufacturing semiconductor device, and semiconductor device Dec. 26, 2006
7141275 Imprinting lithography using the liquid/solid transition of metals and their alloys Nov. 28, 2006
7135360 Liquid crystal display device and method of fabricating the same Nov. 14, 2006
7109125 Selective fabrication of high capacitance density areas in a low dielectric constant material Sep. 19, 2006
7105457 Semiconductor device manufacturing method and apparatus used in the semiconductor device manufacturing method Sep. 12, 2006
7105436 Method for in-line monitoring of via/contact holes etch process based on test structures in semiconductor wafer manufacturing Sep. 12, 2006
7098143 Etching method using an at least semi-solid media Aug. 29, 2006
7074718 Method of fabricating a semiconductor device having a buried and enlarged contact hole Jul. 11, 2006
7064081 Semiconductor device and method for producing the same Jun. 20, 2006
7064080 Semiconductor processing method using photoresist and an antireflective coating Jun. 20, 2006
7060197 Micromechanical mass flow sensor and method for the production thereof Jun. 13, 2006
7049246 Method for selective fabrication of high capacitance density areas in a low dielectric constant material May. 23, 2006
7041604 Method of patterning surfaces while providing greater control of recess anisotropy May. 9, 2006
7029965 Semiconductor device and manufacturing method thereof Apr. 18, 2006
7015149 Simplified dual damascene process Mar. 21, 2006
7012029 Method of forming a lamination film pattern and improved lamination film pattern Mar. 14, 2006
7008547 Solid phase sensors Mar. 7, 2006
6995094 Method for deep trench etching through a buried insulator layer Feb. 7, 2006
6982228 Methods of etching a contact opening over a node location on a semiconductor substrate Jan. 3, 2006
6974778 Semiconductor device manufactured with auxillary mask and method for producing the same Dec. 13, 2005
6962878 Method to reduce photoresist mask line dimensions Nov. 8, 2005
6955988 Method of forming a cavity and SOI in a semiconductor substrate Oct. 18, 2005
6955992 One mask PT/PCMO/PT stack etching process for RRAM applications Oct. 18, 2005
6943092 Methods of manufacturing semiconductor devices Sep. 13, 2005
6936484 Method of manufacturing semiconductor device and semiconductor device Aug. 30, 2005
6933236 Method for forming pattern using argon fluoride photolithography Aug. 23, 2005
6930051 Method to fabricate multi-level silicon-based microstructures via use of an etching delay layer Aug. 16, 2005
6905943 Forming a trench to define one or more isolation regions in a semiconductor structure Jun. 14, 2005
6900139 Method for photoresist trim endpoint detection May. 31, 2005
6900123 BARC etch comprising a selective etch chemistry and a high polymerizing gas for CD control May. 31, 2005
6893938 STI formation for vertical and planar transistors May. 17, 2005
6887785 Etching openings of different depths using a single mask layer method and structure May. 3, 2005
6878638 Multi-level integrated circuit for wide-gap substrate bonding Apr. 12, 2005
6875704 Method for forming pattern using printing process Apr. 5, 2005
6869892 Method of oxidizing work pieces and oxidation system Mar. 22, 2005
6867116 Fabrication method of sub-resolution pitch for integrated circuits Mar. 15, 2005
6864182 Method of producing large-area membrane masks by dry etching Mar. 8, 2005
6858153 Integrated low K dielectrics and etch stops Feb. 22, 2005

1 2 3 4 5


 
 
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