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Class Information
Number: 438/732
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Using magnet (e.g., electron cyclotron resonance, etc.)
Description: Processes wherein the a magnet is utilized in producing or confining the energized gas.










Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8685757 Method for fabricating magnetic tunnel junction Apr. 1, 2014
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8278191 Methods and systems for metal-assisted chemical etching of substrates Oct. 2, 2012
8143169 Methods for multi-stage molding of integrated circuit package Mar. 27, 2012
8129281 Plasma based photoresist removal system for cleaning post ash residue Mar. 6, 2012
7955986 Capacitively coupled plasma reactor with magnetic plasma control Jun. 7, 2011
7943518 Semiconductor chip, semiconductor mounting module, mobile communication device, and process for producing semiconductor chip May. 17, 2011
7922865 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator Apr. 12, 2011
7897516 Use of ultra-high magnetic fields in resputter and plasma etching Mar. 1, 2011
7867787 Forming inductor and transformer structures with magnetic materials using damascene processing for integrated circuits Jan. 11, 2011
7696086 Fabricating method of an interconnect structure Apr. 13, 2010
7625494 Plasma etching method and plasma etching unit Dec. 1, 2009
7615461 Method for forming shallow trench isolation of semiconductor device Nov. 10, 2009
7582569 Distributor and distributing method, plasma processing system and method, and process for fabricating LCD Sep. 1, 2009
7566652 Electrically inactive via for electromigration reliability improvement Jul. 28, 2009
7491645 Method for manufacturing a semiconductor device Feb. 17, 2009
7432166 Methods of forming a nitrogen enriched region Oct. 7, 2008
7396480 Method for front end of line fabrication Jul. 8, 2008
7341922 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus Mar. 11, 2008
7329609 Substrate processing method and substrate processing apparatus Feb. 12, 2008
7312157 Methods and apparatus for cleaning semiconductor devices Dec. 25, 2007
7183130 Magnetic random access memory and method of fabricating thereof Feb. 27, 2007
7118992 Wafer thinning using magnetic mirror plasma Oct. 10, 2006
7112536 Plasma processing system and method Sep. 26, 2006
7094706 Device and method for etching a substrate by using an inductively coupled plasma Aug. 22, 2006
7033514 Method and apparatus for micromachining using a magnetic field and plasma etching Apr. 25, 2006
6977229 Manufacturing method for semiconductor devices Dec. 20, 2005
6960528 Method of forming a nanotip array in a substrate by forming masks on portions of the substrate and etching the unmasked portions Nov. 1, 2005
6943104 Method of etching insulating film and method of forming interconnection layer Sep. 13, 2005
6933236 Method for forming pattern using argon fluoride photolithography Aug. 23, 2005
6793835 System level in-situ integrated dielectric etch process particularly useful for copper dual damascene Sep. 21, 2004
6793965 Clog resistant injection valve Sep. 21, 2004
6713401 Method for manufacturing semiconductor device Mar. 30, 2004
6673199 Shaping a plasma with a magnetic field to control etch rate uniformity Jan. 6, 2004
6653245 Method for liquid phase deposition Nov. 25, 2003
6624084 Plasma processing equipment and plasma processing method using the same Sep. 23, 2003
6613434 Method for treating polymer surface Sep. 2, 2003
6573190 Dry etching device and dry etching method Jun. 3, 2003
6563148 Semiconductor device with dummy patterns May. 13, 2003
6506687 Dry etching device and method of producing semiconductor devices Jan. 14, 2003
6500357 System level in-situ integrated dielectric etch process particularly useful for copper dual damascene Dec. 31, 2002
6488863 Plasma etching method Dec. 3, 2002
6475918 Plasma treatment apparatus and plasma treatment method Nov. 5, 2002
6461972 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow Oct. 8, 2002
6429140 Method of etching of photoresist layer Aug. 6, 2002
6376388 Dry etching with reduced damage to MOS device Apr. 23, 2002
6372654 Apparatus for fabricating a semiconductor device and method of doing the same Apr. 16, 2002
6350701 Etching system Feb. 26, 2002
6333246 Semiconductor device manufacturing method using electrostatic chuck and semiconductor device manufacturing system Dec. 25, 2001
6309979 Methods for reducing plasma-induced charging damage Oct. 30, 2001

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