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Class Information
Number: 438/731
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Using specified electrode/susceptor configuration (e.g., of multiple substrates using barrel-type susceptor, planar reactor configuration, etc.) to generate plasma > Producing energized gas remotely located from substrate > Using intervening shield structure
Description: Processes wherein a blocking means is interposed between the region generating the energized gas and the region in which the semiconductor substrate resides.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8691702 Method and apparatus for plasma dicing a semi-conductor wafer Apr. 8, 2014
8648448 Semiconductor device and method of shielding semiconductor die from inter-device interference Feb. 11, 2014
8568553 Method and apparatus for photomask plasma etching Oct. 29, 2013
8569180 Method and structure of wafer level encapsulation of integrated circuits with cavity Oct. 29, 2013
8486841 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof Jul. 16, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8386979 Method and apparatus to design an interconnection device in a multi-layer shielding mesh Feb. 26, 2013
8329590 Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate Dec. 11, 2012
8177992 Plasma etching apparatus May. 15, 2012
8171441 Integrated circuit devices and methods and apparatuses for designing integrated circuit devices May. 1, 2012
8166434 Integrated circuit devices and methods and apparatuses for designing integrated circuit devices Apr. 24, 2012
8161442 Integrated circuit devices and methods and apparatuses for designing integrated circuit devices Apr. 17, 2012
8122412 Shelding mesh design for an integrated circuit device Feb. 21, 2012
8101460 Semiconductor device and method of shielding semiconductor die from inter-device interference Jan. 24, 2012
8074197 Shielding mesh design for an integrated circuit device Dec. 6, 2011
7967996 Process for wafer backside polymer removal and wafer front side photoresist removal Jun. 28, 2011
7943005 Method and apparatus for photomask plasma etching May. 17, 2011
7902644 Integrated circuit package system for electromagnetic isolation Mar. 8, 2011
7645356 Method of processing wafers with resonant heating Jan. 12, 2010
7566662 Method of dry cleaning silicon surface prior to forming self-aligned nickel silicide layer Jul. 28, 2009
7479457 Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof Jan. 20, 2009
7432209 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material Oct. 7, 2008
7309646 De-fluoridation process Dec. 18, 2007
7274048 Substrate based ESD network protection for a flip chip Sep. 25, 2007
7015569 Method and apparatus for implementing a co-axial wire in a semiconductor chip Mar. 21, 2006
6991739 Method of photoresist removal in the presence of a dielectric layer having a low k-value Jan. 31, 2006
6974550 Apparatus and method for controlling the voltage applied to an electrostatic shield used in a plasma generator Dec. 13, 2005
6887340 Etch rate uniformity May. 3, 2005
6853055 Radiation shielding die carrier package Feb. 8, 2005
6822311 DC or AC electric field assisted anneal Nov. 23, 2004
6744117 High frequency semiconductor device and method of manufacture Jun. 1, 2004
6703092 Resin molded article for chamber liner Mar. 9, 2004
6666982 Protection of dielectric window in inductively coupled plasma generation Dec. 23, 2003
6656846 Apparatus for processing samples Dec. 2, 2003
6585907 Method for manufacturing a shield for an inductively-couple plasma apparatus Jul. 1, 2003
6465363 Vacuum processing method and vacuum processing apparatus Oct. 15, 2002
6436303 Film removal employing a remote plasma source Aug. 20, 2002
6387817 Plasma confinement shield May. 14, 2002
6258287 Method and apparatus for low energy electron enhanced etching of substrates in an AC or DC plasma environment Jul. 10, 2001
6245192 Gas distribution apparatus for semiconductor processing Jun. 12, 2001
6245686 Process for forming a semiconductor device and a process for operating an apparatus Jun. 12, 2001
6221782 Adjusting DC bias voltage in plasma chamber Apr. 24, 2001
6214161 Method and apparatus for anisotropic etching of substrates Apr. 10, 2001
6132566 Apparatus and method for sputtering ionized material in a plasma Oct. 17, 2000
5968275 Methods and apparatus for passivating a substrate in a plasma reactor Oct. 19, 1999
5945354 Method for reducing particles deposited onto a semiconductor wafer during plasma processing Aug. 31, 1999
5945351 Method for etching damaged zones on an edge of a semiconductor substrate, and etching system Aug. 31, 1999
5904571 Methods and apparatus for reducing charging during plasma processing May. 18, 1999
5824604 Hydrocarbon-enhanced dry stripping of photoresist Oct. 20, 1998
5811022 Inductive plasma reactor Sep. 22, 1998

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